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Author
Title
Year
Publication
Volume
Times cited
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Tinck, S.
;
Boullart, W.
;
Bogaerts, A.
Modeling Cl
2
/O
2
/Ar inductively coupled plasmas used for silicon etching : effects of SiO
2
chamber wall coating
2011
Plasma sources science and technology
20
22
UA library record
;
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;
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