| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| de Witte, H.; Vandervorst, W.; Gijbels, R. |
Modeling of bombardment induced oxidation of silicon |
2001 |
Journal of applied physics |
89 |
16 |
UA library record; WoS full record; WoS citing articles |
| Chang, K.; Peeters, F.M. |
Asymmetric stark shifts in InGaAs/GaAs near-surface quantum wells: the image charge effect |
2000 |
Journal of applied physics |
88 |
20 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R.; Serikov, V.V. |
Calculation of gas heating in direct current argon glow discharges |
2000 |
Journal of applied physics |
87 |
63 |
UA library record; WoS full record; WoS citing articles |
| Reijniers, J.; Peeters, F.M. |
Diffusive transport in the hybrid Hall effect device |
2000 |
Journal of applied physics |
87 |
12 |
UA library record; WoS full record; WoS citing articles |
| Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4 |
2000 |
Journal of applied physics |
87 |
14 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Hybrid modeling of a capacitively coupled radio frequency glow discharge in argon: combined Monte Carlo and fluid model |
1999 |
Japanese journal of applied physics |
38 |
45 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description |
1999 |
Journal of applied physics |
86 |
50 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
| Pokatilov, E.P.; Fomin, V.M.; Balaban, S.N.; Gladilin, V.N.; Klimin, S.N.; Devreese, J.T.; Magnus, W.; Schoenmaker, W.; Collaert, N.; van Rossum, M.; de Meyer, K. |
Distribution of fields and charge carriers in cylindrical nanosize silicon-based metal-oxide-semiconductor structures |
1999 |
Journal Of Applied Physics |
85 |
16 |
UA library record; WoS full record; WoS citing articles |
| Buschmann, V.; Rodewald, M.; Fuess, H.; Van Tendeloo, G.; Schäffer, C. |
High resolution electron microscopy study of molecular beam epitaxy grown CoSi2/Si1-xGex/Si(100) heterostructurs |
1999 |
Journal of applied physics |
85 |
6 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R.; Vlcek, J. |
Collisional-radiative model for an argon glow discharge |
1998 |
Journal of applied physics |
84 |
138 |
UA library record; WoS full record; WoS citing articles |
| Bruggeman, P.J.; Bogaerts, A.; Pouvesle, J.M.; Robert, E.; Szili, E.J. |
Plasma–liquid interactions |
2021 |
Journal Of Applied Physics |
130 |
|
UA library record |
