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Author
Title
Year
Publication
Volume
Times cited
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Tinck, S.
;
Boullart, W.
;
Bogaerts, A.
Investigation of etching and deposition processes of Cl
2
/O
2
/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments
2009
Journal of physics: D: applied physics
42
23
UA library record
;
WoS full record
;
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