toggle visibility
Search within Results:
Display Options:
Number of records found: 38

Select All    Deselect All
 | 
Citations
 | 
   print
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
toggle visibility
Relative sensitivity factors in glow discharge mass spectrometry: the role of charge transfer ionization”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 11, 841 (1996). http://doi.org/10.1039/ja9961100841
toggle visibility
Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis”. Bogaerts A, Gijbels R, Journal of the American Society of Mass Spectrometry 8, 1021 (1997). http://doi.org/10.1016/S1044-0305(97)00120-7
toggle visibility
Modeling network for argon glow discharge plasmas with copper cathode”. Bogaerts A, Gijbels R Nova, New York, page 1 (2002).
toggle visibility
Modeling network for argon glow discharges: the output cannot be better than the input”. Bogaerts A, Gijbels R American Institute of Physics, Melville, N.Y., page 49 (2000).
toggle visibility
Modelling of a direct current glow discharge: combined models for the electrons, argon ions and metastables”. Bogaerts A, Gijbels R, , 292 (1995)
toggle visibility
Numerical modelling of analytical glow discharges”. Bogaerts A, Gijbels R Wiley, Chichester, page 155 (2003).
toggle visibility
Plasma models”. Bogaerts A, Gijbels R Wiley, New York, page 176 (1997).
toggle visibility
Select All    Deselect All
 | 
Citations
 | 
   print

Save Citations:
Export Records: