Number of records found: 719
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Citations
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Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing”. Deng S, Verbruggen SW, Lenaerts S, Martens JA, Van den Berghe S, Devloo-Casier K, Devulder W, Dendoover J, Deduytsche D, Detavernier C, Journal of vacuum science and technology: A: vacuum surfaces and films 32, 01a123 (2014). http://doi.org/10.1116/1.4847976
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PECVD growth of carbon nanotubes : from experiment to simulation”. Neyts EC, Journal of vacuum science and technology: B: micro-electronics processing and phenomena 30, 030803 (2012). http://doi.org/10.1116/1.3702806
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Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates”. Delabie A, Sioncke S, Rip J, Van Elshocht S, Pourtois G, Mueller M, Beckhoff B, Pierloot K, Journal of vacuum science and technology: A: vacuum surfaces and films 30, 01a127 (2012). http://doi.org/10.1116/1.3664090
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Addition of yttrium into HfO2 films: microstructure and electrical properties”. Dubourdieu C, Rauwel E, Roussel H, Ducroquet F, Hollaender B, Rossell M, Van Tendeloo G, Lhostis S, Rushworth S, Journal of vacuum science and technology: A: vacuum surfaces and films 27, 503 (2009). http://doi.org/10.1116/1.3106627
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High precision determination of the elastic strain of InGaN/GaN multiple quantum wells”. Wu MF, Zhou S, Yao S, Zhao Q, Vantomme A, van Daele B, Piscopiello E, Van Tendeloo G, Tong YZ, Yang ZJ, Yu TJ, Zhang GY, Journal of vacuum science and technology: B: microelectronics and nanometer structures 22, 920 (2004). http://doi.org/10.1116/1.1715085
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Modeling of the target surface modification by reactive ion implantation during magnetron sputtering”. Depla D, Chen ZY, Bogaerts A, Ignatova V, de Gryse R, Gijbels R, Journal of vacuum science and technology: A: vacuum surfaces and films 22, 1524 (2004). http://doi.org/10.1116/1.1705641
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Comparison of As- and P-based metamorphic buffers for high performance InP heterojunction bipolar transistor and high electron mobility transistor applications”. Lubyshev D, Fastenau JM, Fang X-M, Wu Y, Doss C, Snyder A, Liu WK, Lamb MSM, Bals S, Song C, Journal of vacuum science &, technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena 22, 1565 (2004). http://doi.org/10.1116/1.1691412
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From olivine to ringwoodite : a TEM study of a complex process”. Pittarello L, Ji G, Yamaguchi A, Schryvers D, Debaille V, Claeys P, Meteoritics and Planetary Science 50, 944 (2015). http://doi.org/10.1111/maps.12441
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Combining multi-receiver electromagnetic induction and stepped frequency ground penetrating radar for industrial site investigation”. Van De Vijver E, Van Meirvenne M, Saey T, Delefortrie S, De Smedt P, De Pue J, Seuntjens P, European journal of soil science 66, 688 (2015). http://doi.org/10.1111/EJSS.12229
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Nontarget biomolecules alter macromolecular changes induced by bactericidal low-temperature plasma”. Privat-Maldonado A, Gorbanev Y, O'Connell D, Vann R, Chechik V, van der Woude MW, IEEE transactions on radiation and plasma medical sciences 2, 121 (2018). http://doi.org/10.1109/TRPMS.2017.2761405
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Detailed numerical investigation of a DC sputter magnetron”. Kolev I, Bogaerts A, IEEE transactions on plasma science 34, 886 (2006). http://doi.org/10.1109/TPS.2006.875843
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Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model”. de Bleecker K, Bogaerts A, Goedheer W, Gijbels R, IEEE transactions on plasma science 32, 691 (2004). http://doi.org/10.1109/TPS.2004.826095
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Magnetic field dependence of the normal mode spectrum of a planar complex plasma cluster”. Kong M, Ferreira WP, Partoens B, Peeters FM, IEEE transactions on plasma science 32, 569 (2004). http://doi.org/10.1109/TPS.2004.826084
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A one-dimensional fluid model for an acetylene rf discharge: a study of the plasma chemistry”. Herrebout D, Bogaerts A, Gijbels R, Goedheer WJ, Vanhulsel A, IEEE transactions on plasma science 31, 659 (2003). http://doi.org/10.1109/TPS.2003.815249
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Evolution of charged particle densities after laser-induced photodetachment in a strongly electronegative RF discharge”. Yan M, Bogaerts A, Gijbels R, IEEE transactions on plasma science 30, 132 (2002). http://doi.org/10.1109/TPS.2002.1003959
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Elemental analysis of aerosols using proton-scattering”. Nelson JW, Williams I, Johansson TB, Van Grieken RE, IEEE transactions on nuclear science Ns21, 618 (1974). http://doi.org/10.1109/TNS.1974.4327522
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Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge”. Bogaerts A, Gijbels R, IEEE transactions on plasma science 27, 1406 (1999). http://doi.org/10.1109/27.799819
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Semianalytical description of nonlocal secondary electrons in a radio-frequency capacitively coupled plasma at intermediate pressures”. Berezhnoi S, Kaganovich I, Misina M, Bogaerts A, Gijbels R, IEEE transactions plasma science 27, 1339 (1999). http://doi.org/10.1109/27.799810
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High-resolution X-ray fluorescence microtomography of homogeneous samples”. Simionovici AS, Chukalina M, Schroer C, Drakopoulos M, Snigirev A, Snigireva I, Lengeler B, Janssens K, Adams F, IEEE transactions on nuclear science 47, 2736 (2000). http://doi.org/10.1109/23.901180
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KSm(MoO4)2, an incommensurately modulated and partially disordered scheelite-like structure”. Arakcheeva A, Pattison P, Chapuis G, Rossell M, Filaretov A, Morozov V, Van Tendeloo G, Acta crystallographica: section B: structural science 64, 160 (2008). http://doi.org/10.1107/S0108768108001870
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Electron-diffraction structure refinement of Ni4Ti3 precipitates in Ni52Ti48”. Tirry W, Schryvers D, Jorissen K, Lamoen D, Acta crystallographica: section B: structural science 62, 966 (2006). http://doi.org/10.1107/S0108768106036457
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Single-layer and bilayer graphene superlattices: collimation, additional Dirac points and Dirac lines”. Barbier M, Vasilopoulos P, Peeters FM, Philosophical transactions of the Royal Society : mathematical, physical and engineering sciences 368, 5499 (2010). http://doi.org/10.1098/rsta.2010.0218
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Conversion of platelets into dislocation loops and voidite formation in type IaB diamonds”. Evans T, Kiflawi I, Luyten W, Van Tendeloo G, Woods GS, Proceedings of the Royal Society of London: series A: mathematical and physical sciences 449, 295 (1995). http://doi.org/10.1098/rspa.1995.0045
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On the coupling of magnetic moments to superconducting quantum interference devices”. Linek J, Wyszynski M, Müller B, Korinski D, Milošević, MV, Kleiner R, Koelle D, Superconductor science and technology 37, 025010 (2024). http://doi.org/10.1088/1361-6668/AD1AE9
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Electronically tunable quantum phase slips in voltage-biased superconducting rings as a base for phase-slip flux qubits”. Kenawy A, Magnus W, Milošević, MV, Sorée B, Superconductor Science &, Technology 33, 125002 (2020). http://doi.org/10.1088/1361-6668/ABB8EB
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Tilted BaHfO3 nanorod artificial pinning centres in REBCO films on inclined substrate deposited-MgO coated conductor templates”. Stafford BH, Sieger M, Ottolinger R, Meledin A, Strickland NM, Wimbush SC, Van Tendeloo G, Huehne R, Schultz L, Superconductor science and technology 30, 055002 (2017). http://doi.org/10.1088/1361-6668/AA621D
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Driven spin transitions in fluorinated single- and bilayer-graphene quantum dots”. Zebrowski DP, Peeters FM, Szafran B, Semiconductor science and technology 32, 065016 (2017). http://doi.org/10.1088/1361-6641/AA6DF4
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Power concentration determined by thermodynamic properties in complex gas mixtures : the case of plasma-based dry reforming of methane”. Biondo O, Hughes A, van der Steeg A, Maerivoet S, Loenders B, van Rooij G, Bogaerts A, Plasma sources science and technology 32, 045001 (2023). http://doi.org/10.1088/1361-6595/ACC6EC
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Investigation of 50 Hz pulsed DC nitrogen plasma with active screen cage by trace rare gas optical emission spectroscopy”. Saeed A, Khan AW, Shafiq M, Jan F, Abrar M, Zaka-ul-Islam M, Zakaullah M, Plasma science &, technology 16, 324 (2014). http://doi.org/10.1088/1009-0630/16/4/05
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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