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  Author Title Year Publication Volume Times cited Additional Links Links (down)
Deylgat, E.; Chen, E.; Sorée, B.; Vandenberghe, W.G. Quantum transport study of contact resistance of edge- and top-contacted two-dimensional materials 2023 International Conference on Simulation of Semiconductor Processes and Devices : [proceedings] T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 27-29, 2023, Kobe, Japan UA library record; WoS full record pdf doi
Reyntjens, P.D.; Tiwari, S.; Van de Put, M.L.; Sorée, B.; Vandenberghe, W.G. Ab-initio study of magnetically intercalated Tungsten diselenide 2020 International Conference on Simulation of Semiconductor Processes and Devices : [proceedings] T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 23-OCT 06, 2020 UA library record; WoS full record pdf doi
Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Herrebout, D.; Kolev, I.; Madani, M.; Neyts, E. Numerical modeling for a better understanding of gas discharge plasmas 2005 High temperature material processes 9 1 UA library record; WoS full record; WoS citing articles doi
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. Modeling PECVD growth of nanostructured carbon materials 2009 High temperature material processes 13 UA library record; WoS full record; WoS citing articles doi
de Bleecker, K.; Bogaerts, A. Modeling of the synthesis and subsequent growth of nanoparticles in dusty plasmas 2007 High temperature material processes 11 UA library record; WoS full record doi
Tiwari, S.; Van de Put, M.L.; Sorée, B.; Vandenberghe, W.G. Ab initio modeling of few-layer dilute magnetic semiconductors 2021 International Conference on Simulation of Semiconductor Processes and Devices : [proceedings] T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 27-29, 2021, Dallas, TX UA library record; WoS full record pdf doi
Tiwari, S.; Van de Put, M.L.; Sorée, B.; Vandenberghe, W.G. Carrier transport in a two-dimensional topological insulator nanoribbon in the presence of vacancy defects 2018 International Conference on Simulation of Semiconductor Processes and Devices : [proceedings] T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 24-26, 2018, Austin, TX UA library record; WoS full record; WoS citing articles pdf doi
Tirez, K.; Vanhoof, C.; Bronders, J.; Seuntjens, P.; Bleux, N.; Berghmans, P.; De Brucker, N.; Vanhaecke, F. Do ICP-MS based methods fulfill the EU monitoring requirements for the determination of elements in our environment? 2015 Environmental science : processes & impacts 17 UA library record; WoS full record; WoS citing articles doi
Van de Vijver, E.; Van Meirvenne, M.; Vandenhaute, L.; Delefortrie, S.; De Smedt, P.; Saey, T.; Seuntjens, P. Urban soil exploration through multi-receiver electromagnetic induction and stepped-frequency ground penetrating radar 2015 Environmental science : processes & impacts 17 UA library record; WoS full record; WoS citing articles doi
Cagno, S.; Hellemans, K.; Lind, O.C.; Skipperud, L.; Janssens, K.; Salbu, B. LA-ICP-MS for Pu source identification at Mayak PA, the Urals, Russia 2014 Environmental science : processes & impacts 16 10 UA library record; WoS full record; WoS citing articles doi
Boënne, W.; Desmet, N.; Van Looy, S.; Seuntjens, P. Use of online water quality monitoring for assessing the effects of WWTP overflows in rivers 2014 Environmental science : processes & impacts 16 UA library record; WoS full record; WoS citing articles doi
Chwiej, T.; Bednarek, S.; Adamowski, J.; Szafran, B.; Peeters, F.M. Coulomb-interaction driven anomaly in the Stark effect for an exciton in vertically coupled quantum dots 2005 Journal of luminescence T2 – 6th International Conference on Excitonic Processes in Condensed Matter, (EXCON 04), JUL 06-09, 2004, Cracow, POLAND 112 10 UA library record; WoS full record; WoS citing articles doi
Bruynseels, F.; Van Grieken, R. Recombination reactions and geometry effects in laser microprobe mass analysis studied with 12C/13C bilayers 1986 International journal of mass spectrometry and ion processes 74 UA library record; WoS full record; WoS citing articles doi
Vos, L.; Van Grieken, R. Influence of spark generator parameters in the analysis of graphite-electrodes by spark source-mass spectrometry 1984 International journal of mass spectrometry and ion processes 55 UA library record; WoS full record; WoS citing articles pdf doi
Vos, L.; Van Grieken, R. Influence of ion-source geometry in spark source-mass spectrometric analysis 1984 International journal of mass spectrometry and ion processes 59 UA library record; WoS full record; WoS citing articles pdf doi
Vos, L.; Van Grieken, R. Influence of ion energy-distributions and matrix effects on spark source-mass spectrometric analysis 1983 International journal of mass spectrometry and ion processes 51 UA library record; WoS full record; WoS citing articles pdf doi
Chai, Z.-N.; Wang, X.-C.; Yusupov, M.; Zhang, Y.-T. Unveiling the interaction mechanisms of cold atmospheric plasma and amino acids by machine learning 2024 Plasma processes and polymers UA library record; WoS full record pdf doi
Van der Paal, J.; Fridman, G.; Bogaerts, A. Ceramide cross-linking leads to pore formation: Potential mechanism behind CAP enhancement of transdermal drug delivery 2019 Plasma processes and polymers 16 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.C.; Bal, K.M. Effect of electric fields on plasma catalytic hydrocarbon oxidation from atomistic simulations 2017 Plasma processes and polymers 14 2 UA library record; WoS full record; WoS citing articles pdf doi
Aerts, R.; Snoeckx, R.; Bogaerts, A. In-situ chemical trapping of oxygen in the splitting of carbon dioxide by plasma 2014 Plasma processes and polymers 11 29 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Yusupov, M.; Van der Paal, J.; Verlackt, C.C.W.; Neyts, E.C. Reactive molecular dynamics simulations for a better insight in plasma medicine 2014 Plasma processes and polymers 11 22 UA library record; WoS full record; WoS citing articles pdf doi
Somers, W.; Dubreuil, M.F.; Neyts, E.C.; Vangeneugden, D.; Bogaerts, A. Incorporation of fluorescent dyes in atmospheric pressure plasma coatings for in-line monitoring of coating homogeneity 2014 Plasma processes and polymers 11 3 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation 2014 Plasma processes and polymers 11 1 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; De Schepper, P.; Bogaerts, A. Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas 2013 Plasma processes and polymers 10 3 UA library record; WoS full record; WoS citing articles pdf doi
Teodoru, S.; Kusano, Y.; Bogaerts, A. The effect of O2 in a humid O2/N2/NOx gas mixture on NOx and N2O remediation by an atmospheric pressure dielectric barrier discharge 2012 Plasma processes and polymers 9 24 UA library record; WoS full record; WoS citing articles pdf doi
Aerts, R.; Tu, X.; De Bie, C.; Whitehead, J.C.; Bogaerts, A. An investigation into the dominant reactions for ethylene destruction in non-thermal atmospheric plasmas 2012 Plasma processes and polymers 9 46 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Bogaerts, A. Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) 2012 Plasma processes and polymers 9 5 UA library record; WoS full record; WoS citing articles pdf doi
De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge 2011 Plasma processes and polymers 8 70 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Bogaerts, A.; Shamiryan, D. Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma 2011 Plasma processes and polymers 8 5 UA library record; WoS full record; WoS citing articles doi
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. Particle-in-cell/Monte Carlo collisions model for the reactive sputter deposition of nitride layers 2009 Plasma processes and polymers 6 2 UA library record; WoS full record; WoS citing articles doi
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