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  Author Title Year Publication Volume Times cited Additional Links Links (down)
Tinck, S.; Bogaerts, A. Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) 2012 Plasma processes and polymers 9 5 UA library record; WoS full record; WoS citing articles pdf doi
De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge 2011 Plasma processes and polymers 8 70 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Bogaerts, A.; Shamiryan, D. Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma 2011 Plasma processes and polymers 8 5 UA library record; WoS full record; WoS citing articles doi
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. Particle-in-cell/Monte Carlo collisions model for the reactive sputter deposition of nitride layers 2009 Plasma processes and polymers 6 2 UA library record; WoS full record; WoS citing articles doi
Saraiva, M.; Chen, H.; Leroy, W.P.; Mahieu, S.; Jehanathan, N.; Lebedev, O.; Georgieva, V.; Persoons, R.; Depla, D. Influence of Al content on the properties of MgO grown by reactive magnetron sputtering 2009 Plasma processes and polymers 6 13 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Bultinck, E.; Eckert, M.; Georgieva, V.; Mao, M.; Neyts, E.; Schwaederlé, L. Computer modeling of plasmas and plasma-surface interactions 2009 Plasma processes and polymers 6 18 UA library record; WoS full record; WoS citing articles doi
Kolev, I.; Bogaerts, A. PIC – MCC numerical simulation of a DC planar magnetron 2006 Plasma processes and polymers 3 27 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Kolev, I.; Madani, M.; Neyts, E. Computer simulations for processing plasmas 2006 Plasma processes and polymers 3 8 UA library record; WoS full record; WoS citing articles doi
Kolev, I.; Bogaerts, A. Numerical models of the planar magnetron glow discharges 2004 Contributions to plasma physics 44 22 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Comprehensive three-dimensional modeling network for a dc glow discharge plasma 1998 Plasma physics reports 24 8 UA library record; WoS full record; WoS citing articles
Hervieu, M.; Michel, C.; Martin, C.; Huvé, M.; Van Tendeloo, G.; Maignan, A.; Pelloquin, D.; Goutenoire, F.; Raveau, B. Mécanismes de la non-stoechiométrie dans les nouveaux supraconducteurs à haute Tc 1994 Journal de physique: 3: applied physics, materials science, fluids, plasma and instrumentation 4 UA library record; WoS full record;
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