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  Author Title Year Publication Volume Times cited Additional Links Links (up)
Kolev, I.; Bogaerts, A. Detailed numerical investigation of a DC sputter magnetron 2006 IEEE transactions on plasma science 34 28 UA library record; WoS full record; WoS citing articles doi
de Bleecker, K.; Bogaerts, A.; Goedheer, W.; Gijbels, R. Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model 2004 IEEE transactions on plasma science 32 29 UA library record; WoS full record; WoS citing articles doi
Kong, M.; Ferreira, W.P.; Partoens, B.; Peeters, F.M. Magnetic field dependence of the normal mode spectrum of a planar complex plasma cluster 2004 IEEE transactions on plasma science 32 4 UA library record; WoS full record; WoS citing articles doi
Herrebout, D.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J.; Vanhulsel, A. A one-dimensional fluid model for an acetylene rf discharge: a study of the plasma chemistry 2003 IEEE transactions on plasma science 31 26 UA library record; WoS full record; WoS citing articles doi
Yan, M.; Bogaerts, A.; Gijbels, R. Evolution of charged particle densities after laser-induced photodetachment in a strongly electronegative RF discharge 2002 IEEE transactions on plasma science 30 UA library record; WoS full record doi
Bogaerts, A.; Gijbels, R. Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge 1999 IEEE transactions on plasma science 27 15 UA library record; WoS full record; WoS citing articles doi
Berezhnoi, S.; Kaganovich, I.; Misina, M.; Bogaerts, A.; Gijbels, R. Semianalytical description of nonlocal secondary electrons in a radio-frequency capacitively coupled plasma at intermediate pressures 1999 IEEE transactions plasma science 27 7 UA library record; WoS full record; WoS citing articles doi
Saeed, A.; Khan, A.W.; Shafiq, M.; Jan, F.; Abrar, M.; Zaka-ul-Islam, M.; Zakaullah, M. Investigation of 50 Hz pulsed DC nitrogen plasma with active screen cage by trace rare gas optical emission spectroscopy 2014 Plasma science & technology 16 5 UA library record; WoS full record; WoS citing articles pdf doi
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges 2000 Plasma sources science and technology 9 21 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A. Comprehensive modelling network for dc glow discharges in argon 1999 Plasma sources science and technology 8 27 UA library record; WoS full record; WoS citing articles doi
Kozák, T.; Bogaerts, A. Splitting of CO2 by vibrational excitation in non-equilibrium plasmas : a reaction kinetics model 2014 Plasma sources science and technology 23 170 UA library record; WoS full record; WoS citing articles pdf doi
Van Gaens, W.; Bogaerts, A. Reaction pathways of biomedically active species in an Ar plasma jet 2014 Plasma sources science and technology 23 34 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas 2013 Plasma sources science and technology 22 9 UA library record; WoS full record; WoS citing articles pdf doi
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges 2013 Plasma sources science and technology 22 20 UA library record; WoS full record; WoS citing articles pdf doi
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation 2013 Plasma sources science and technology 22 13 UA library record; WoS full record; WoS citing articles pdf doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 2013 Plasma sources science and technology 22 11 UA library record; WoS full record; WoS citing articles pdf doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma 2012 Plasma sources science and technology 21 23 UA library record; WoS full record; WoS citing articles pdf doi
Bultinck, E.; Bogaerts, A. Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model 2011 Plasma sources science and technology 20 7 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles pdf doi
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations 2011 Plasma sources science and technology 20 38 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Bogaerts, A. Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition 2011 Plasma sources science and technology 20 11 UA library record; WoS full record; WoS citing articles doi
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges 2010 Plasma sources science and technology 19 116 UA library record; WoS full record; WoS citing articles pdf doi
Georgieva, V.; Bogaerts, A. Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model 2006 Plasma sources science and technology 15 35 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux 2005 Plasma sources science and technology 14 9 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces 2002 Plasma sources science and technology 11 51 UA library record; WoS full record; WoS citing articles doi
Neyts, E.; Eckert, M.; Mao, M.; Bogaerts, A. Numerical simulation of hydrocarbon plasmas for nanoparticle formation and the growth of nanostructured thin films 2009 Plasma physics and controlled fusion 51 2 UA library record; WoS full record; WoS citing articles doi
Xiaoyan, S.; Zhang, Y.-R.; Wang, Y.-N.; He, J.-X. Fluid simulation of the superimposed dual-frequency source effect in inductively coupled discharges 2021 Physics Of Plasmas 28 UA library record; WoS full record doi
Liang, Y.-S.; Xue, C.; Zhang, Y.-R.; Wang, Y.-N. Investigation of active species in low-pressure capacitively coupled N-2/Ar plasmas 2021 Physics Of Plasmas 28 UA library record; WoS full record; WoS citing articles doi
Tkachenko, D.V.; Sheridan, T.E.; Misko, V.R. Dispersion relations for circular single and double dusty plasma chains 2011 Physics of plasmas 18 7 UA library record; WoS full record; WoS citing articles doi
Si, X.-J.; Zhao, S.-X.; Xu, X.; Bogaerts, A.; Wang, Y.-N. Fluid simulations of frequency effects on nonlinear harmonics in inductively coupled plasma 2011 Physics of plasmas 18 7 UA library record; WoS full record; WoS citing articles pdf doi
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