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Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI)”. Tinck S, Bogaerts A, Plasma processes and polymers 9, 522 (2012). http://doi.org/10.1002/ppap.201100093
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Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge”. De Bie C, Verheyde B, Martens T, van Dijk J, Paulussen S, Bogaerts A, Plasma processes and polymers 8, 1033 (2011). http://doi.org/10.1002/ppap.201100027
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Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma”. Tinck S, Bogaerts A, Shamiryan D, Plasma processes and polymers 8, 490 (2011). http://doi.org/10.1002/ppap.201000189
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Particle-in-cell/Monte Carlo collisions model for the reactive sputter deposition of nitride layers”. Bultinck E, Mahieu S, Depla D, Bogaerts A, Plasma processes and polymers 6, S784 (2009). http://doi.org/10.1002/ppap.200931904
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Computer modeling of plasmas and plasma-surface interactions”. Bogaerts A, Bultinck E, Eckert M, Georgieva V, Mao M, Neyts E, Schwaederlé, L, Plasma processes and polymers 6, 295 (2009). http://doi.org/10.1002/ppap.200800207
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PIC –, MCC numerical simulation of a DC planar magnetron”. Kolev I, Bogaerts A, Plasma processes and polymers 3, 127 (2006). http://doi.org/10.1002/ppap.200500118
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Computer simulations for processing plasmas”. Bogaerts A, de Bleecker K, Georgieva V, Kolev I, Madani M, Neyts E, Plasma processes and polymers 3, 110 (2006). http://doi.org/10.1002/ppap.200500065
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Study of atmospheric MOCVD of TiO2 thin films by means of computational fluid dynamics simulations”. Baguer N, Neyts E, van Gils S, Bogaerts A, Chemical vapor deposition 14, 339 (2008). http://doi.org/10.1002/cvde.200806708
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Molecular dynamics simulations of the sticking and etch behavior of various growth species of (ultra)nanocrystalline diamond films”. Eckert M, Neyts E, Bogaerts A, Chemical vapor deposition 14, 213 (2008). http://doi.org/10.1002/cvde.200706657
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Molecular dynamics simulations of the growth of thin a-C:H films under additional ion bombardment: influence of the growth species and the Ar+ ion kinetic energy”. Neyts E, Eckert M, Bogaerts A, Chemical vapor deposition 13, 312 (2007). http://doi.org/10.1002/cvde.200606551
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Numerical models of the planar magnetron glow discharges”. Kolev I, Bogaerts A, Contributions to plasma physics 44, 582 (2004). http://doi.org/10.1002/ctpp.200410085
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Design of Ru-zeolites for hydrogen-free production of conjugated linoleic acid”. Philippaerts A, Goossens S, Vermandel W, Tromp M, Turner S, Geboers J, Van Tendeloo G, Jacobs PA, Sels BF, Chemsuschem 4, 757 (2011). http://doi.org/10.1002/cssc.201100015
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Unprecedented shape selectivity in hydrogenation of triacylglycerol molecules with Pt/ZSM-5 zeolite”. Philippaerts A, Paulussen S, Breesch A, Turner S, Lebedev OI, Van Tendeloo G, Sels B, Jacobs P, Angewandte Chemie: international edition in English 50, 3947 (2011). http://doi.org/10.1002/anie.201007513
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Kirschhock CEA, Liang D, Aerts A, Aerts CA, Kremer SPB, Jacobs PA, Van Tendeloo G, Martens JA (2004) On the TEM and AFM evidence of zeosil nanoslabs present during the synthesis of silicalite-1 : reply. Weinheim, 4562–4564
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Tiling silicalite-1 nanoslabs into 3D mosaics”. Kremer SPB, Kirschhock CEA, Aerts A, Villani K, Martens JA, Lebedev OI, Van Tendeloo G, Advanced materials 15, 1705 (2003). http://doi.org/10.1002/adma.200305266
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Use of microscopic XRF for non-destructive analysis in art an archaeometry”. Janssens K, Vittiglio G, Deraedt I, Aerts A, Vekemans B, Vincze L, Wei F, de Ryck I, Schalm O, Adams F, Rindby A, Knöchel A, Simionovici AS, Snigirev A, X-ray spectrometry 29, 73 (2000). http://doi.org/10.1002/(SICI)1097-4539(200001/02)29:1<73::AID-XRS416>3.3.CO;2-D
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Analysis of nonconducting materials by dc glow discharge spectrometry”. Bogaerts A, Schelles W, van Grieken R Wiley, Chichester, page 293 (2003).
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Calculation of crater profiles on a flat cathode in a direct current glow discharge, and comparison with experiment”. Bogaerts A, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 52, 765 (1997)
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Cluster issue on plasma modelling”. van Dijk J, Kroesen GMW, Bogaerts A London (2009).
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Colloquium Spectroscopicum Internationale 34: a collection of papers presented at the Colloquium Spectroscopicum Internationale, Antwerp, Belgium, 4-9 September 2005”. Janssens K, Bogaerts A, van Grieken R Elsevier, Amsterdam (2006).
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Colloquium Spectroscopicum Internationale 34 (CSI 34), Antwerp, Belgium, 4-9 September 2005”. Bogaerts A, Janssens K, van Grieken R Elsevier, Amsterdam (2006).
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Comparison of argon and neon as discharge gases in a direct current glow discharge: a mathematical simulation”. Bogaerts A, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 52, 553 (1997)
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Comprehensive three-dimensional modeling network for a dc glow discharge plasma”. Bogaerts A, Gijbels R, Plasma physics reports 24, 573 (1998)
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Computer simulation of an analytical direct current glow discharge in argon: influence of the cell dimensions on the plasma quantities”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 12, 751 (1997)
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Description of the plasma chemistry in an atmospheric pressure CH4 dielectric barrier discharge using a two dimensional fluid model”. De Bie C, Martens T, van Dijk J, van der Mullen JJAM, Bogaerts A, , 13 (2009)
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An extended RF methane plasma 1D fluid model of interest in deposition of diamond-like carbon layers”. Herrebout D, Bogaerts A, Yan M, Goedheer W, Dekempeneer E, Gijbels R, , 399 (2000)
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Glow discharge mass spectrometry, methods”. Bogaerts A Academic Press, San Diego, Calif., page 669 (2000).
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Glow discharge optical spectroscopy and mass spectrometry”. Steiner RE, Barshick CM, Bogaerts A Wiley, Chichester, page 1 (2009).
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Glow discharges in emission and mass spectrometry”. Jakubowski N, Bogaerts A, Hoffmann V Blackwell, Sheffield (2003).
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Improving dielectric barrier discharge efficiency by optimizing voltage profiles”. Martens T, Brok WJM, van Dijk J, Bogaerts A, , 95 (2009)
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