Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Lindner, H.; Bogaerts, A. |
Multi-element model for the simulation of inductively coupled plasmas : effects of helium addition to the central gas stream |
2011 |
Spectrochimica acta: part B : atomic spectroscopy |
66 |
28 |
UA library record; WoS full record; WoS citing articles |
Liu, Y.H.; Chen, Z.Y.; Yu, M.Y.; Bogaerts, A. |
Multiple void formation in plasmas containing multispecies charged grains |
2006 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
74 |
21 |
UA library record; WoS full record; WoS citing articles |
Bleiner, D.; Bogaerts, A. |
Multiplicity and contiguity of ablation mechanisms in laser-assisted analytical micro-sampling |
2006 |
Spectrochimica acta: part B : atomic spectroscopy |
61 |
48 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Chen, Z. |
Nanosecond laser ablation of Cu: modeling of the expansion in He background gas, and comparison with expansion in vacuum |
2004 |
Journal of analytical atomic spectrometry |
19 |
39 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A. |
Negative ion behavior in single- and dual-frequency plasma etching reactors: particle-in-cell/Monte Carlo collision study |
2006 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
73 |
7 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
New developments and applications in GDMS |
1999 |
Fresenius' journal of analytical chemistry |
364 |
17 |
UA library record; WoS full record; WoS citing articles |
Khalilov, U.; Pourtois, G.; Huygh, S.; van Duin, A.C.T.; Neyts, E.C.; Bogaerts, A. |
New mechanism for oxidation of native silicon oxide |
2013 |
The journal of physical chemistry: C : nanomaterials and interfaces |
117 |
24 |
UA library record; WoS full record; WoS citing articles |
Mao, M.; Benedikt, J.; Consoli, A.; Bogaerts, A. |
New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
47 |
UA library record; WoS full record; WoS citing articles |
Van Gaens, W.; Iseni, S.; Schmidt-Bleker, A.; Weltmann, K.-D.; Reuter, S.; Bogaerts, A. |
Numerical analysis of the effect of nitrogen and oxygen admixtures on the chemistry of an argon plasma jet operating at atmospheric pressure |
2015 |
New journal of physics |
17 |
29 |
UA library record; WoS full record; WoS citing articles |
Van Gaens, W.; Bruggeman, P.J.; Bogaerts, A. |
Numerical analysis of the NO and O generation mechanism in a needle-type plasma jet |
2014 |
New journal of physics |
16 |
34 |
UA library record; WoS full record; WoS citing articles |
Jiang, W.; Zhang, Y.; Bogaerts, A. |
Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors |
2014 |
New journal of physics |
16 |
|
UA library record; WoS full record; WoS citing articles |
Gul, B.; Tinck, S.; De Schepper, P.; Aman-ur-Rehman; Bogaerts, A. |
Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching |
2015 |
Journal of physics: D: applied physics |
48 |
7 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Numerical investigation of ion energy distribution functions in single and dual frequency capacitively coupled plasma reactors |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
69 |
97 |
UA library record; WoS full record; WoS citing articles |
de Bleecker, K.; Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Numerical investigation of particle formation mechanisms in silane discharges |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
69 |
74 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; De Schepper, P.; Bogaerts, A. |
Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas |
2013 |
Plasma processes and polymers |
10 |
3 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Herrebout, D.; Kolev, I.; Madani, M.; Neyts, E. |
Numerical modeling for a better understanding of gas discharge plasmas |
2005 |
High temperature material processes |
9 |
1 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Numerical modelling of gas discharge plasmas for various applications |
2003 |
Vacuum: surface engineering, surface instrumentation & vacuum technology |
69 |
16 |
UA library record; WoS full record; WoS citing articles |
Kolev, I.; Bogaerts, A. |
Numerical models of the planar magnetron glow discharges |
2004 |
Contributions to plasma physics |
44 |
22 |
UA library record; WoS full record; WoS citing articles |
Lindner, H.; Autrique, D.; Pisonero, J.; Günther, D.; Bogaerts, A. |
Numerical simulation analysis of flow patterns and particle transport in the HEAD laser ablation cell with respect to inductively coupled plasma spectrometry |
2010 |
Journal of analytical atomic spectrometry |
25 |
16 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A. |
Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics |
2005 |
Journal of applied physics |
98 |
75 |
UA library record; WoS full record; WoS citing articles |
Neyts, E.; Eckert, M.; Mao, M.; Bogaerts, A. |
Numerical simulation of hydrocarbon plasmas for nanoparticle formation and the growth of nanostructured thin films |
2009 |
Plasma physics and controlled fusion |
51 |
2 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Numerical study of Ar/CF4/N2 discharges in single and dual frequency capacitively coupled plasma reactors |
2003 |
Journal of applied physics |
94 |
90 |
UA library record; WoS full record; WoS citing articles |
Mao, M.; Wang, Y.N.; Bogaerts, A. |
Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications |
2011 |
Journal of physics: D: applied physics |
44 |
20 |
UA library record; WoS full record; WoS citing articles |
Neyts, E.C.; Bogaerts, A. |
Numerical study of the size-dependent melting mechanisms of nickel nanoclusters |
2009 |
The journal of physical chemistry: C : nanomaterials and interfaces |
113 |
|
UA library record; WoS full record; WoS citing articles |
Kolev, I.; Bogaerts, A. |
Numerical study of the sputtering in a dc magnetron |
2009 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
27 |
66 |
UA library record; WoS full record; WoS citing articles |
Aghaei, M.; Flamigni, L.; Lindner, H.; Günther, D.; Bogaerts, A. |
Occurrence of gas flow rotational motion inside the ICP torch : a computational and experimental study |
2014 |
Journal of analytical atomic spectrometry |
29 |
21 |
UA library record; WoS full record; WoS citing articles |
Eckert, M.; Neyts, E.; Bogaerts, A. |
On the reaction behaviour of hydrocarbon species at diamond (1 0 0) and (1 1 1) surfaces: a molecular dynamics investigation |
2008 |
Journal of physics: D: applied physics |
41 |
17 |
UA library record; WoS full record; WoS citing articles |
Martens, T.; Brok, W.J.M.; van Dijk, J.; Bogaerts, A. |
On the regime transitions during the formation of an atmospheric pressure dielectric barrier glow discharge |
2009 |
Journal of physics: D: applied physics |
42 |
21 |
UA library record; WoS full record; WoS citing articles |
Herrebout, D.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J.; Vanhulsel, A. |
A one-dimensional fluid model for an acetylene rf discharge: a study of the plasma chemistry |
2003 |
IEEE transactions on plasma science |
31 |
26 |
UA library record; WoS full record; WoS citing articles |
de Bleecker, K.; Herrebout, D.; Bogaerts, A.; Gijbels, R.; Descamps, P. |
One-dimensional modelling of a capacitively coupled rf plasma in silane/helium, including small concentrations of O2 and N2 |
2003 |
Journal of physics: D: applied physics |
36 |
|
UA library record; WoS full record; WoS citing articles |