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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Eckert, M.; Neyts, E.; Bogaerts, A. |
Molecular dynamics simulations of the sticking and etch behavior of various growth species of (ultra)nanocrystalline diamond films |
2008 |
Chemical vapor deposition |
14 |
25 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Martín, A.; Bordel, N.; Pereiro, R.; Bogaerts, A. |
Monte Carlo analysis of the electron thermalization process in the afterglow of a microsecond dc pulsed glow discharge |
2008 |
Spectrochimica acta: part B : atomic spectroscopy |
63 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Liu, Y.H.; Neyts, E.; Bogaerts, A. |
Monte Carlo method for simulations of adsorbed atom diffusion on a surface |
2006 |
Diamond and related materials |
15 |
5 |
UA library record; WoS full record; WoS citing articles |
|
|
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Bogaerts, A.; Gijbels, R. |
Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge |
1999 |
IEEE transactions on plasma science |
27 |
15 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; van Straaten, M.; Gijbels, R. |
Monte Carlo simulation of an analytical glow discharge: motion of electrons, ions and fast neutrals in the cathode dark space |
1995 |
Spectrochimica acta: part B : atomic spectroscopy |
50 |
95 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Lindner, H.; Bogaerts, A. |
Multi-element model for the simulation of inductively coupled plasmas : effects of helium addition to the central gas stream |
2011 |
Spectrochimica acta: part B : atomic spectroscopy |
66 |
28 |
UA library record; WoS full record; WoS citing articles |
|
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Liu, Y.H.; Chen, Z.Y.; Yu, M.Y.; Bogaerts, A. |
Multiple void formation in plasmas containing multispecies charged grains |
2006 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
74 |
21 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bleiner, D.; Bogaerts, A. |
Multiplicity and contiguity of ablation mechanisms in laser-assisted analytical micro-sampling |
2006 |
Spectrochimica acta: part B : atomic spectroscopy |
61 |
48 |
UA library record; WoS full record; WoS citing articles |
|
|
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Bogaerts, A.; Chen, Z. |
Nanosecond laser ablation of Cu: modeling of the expansion in He background gas, and comparison with expansion in vacuum |
2004 |
Journal of analytical atomic spectrometry |
19 |
39 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Georgieva, V.; Bogaerts, A. |
Negative ion behavior in single- and dual-frequency plasma etching reactors: particle-in-cell/Monte Carlo collision study |
2006 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
73 |
7 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
New developments and applications in GDMS |
1999 |
Fresenius' journal of analytical chemistry |
364 |
17 |
UA library record; WoS full record; WoS citing articles |
|
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Khalilov, U.; Pourtois, G.; Huygh, S.; van Duin, A.C.T.; Neyts, E.C.; Bogaerts, A. |
New mechanism for oxidation of native silicon oxide |
2013 |
The journal of physical chemistry: C : nanomaterials and interfaces |
117 |
24 |
UA library record; WoS full record; WoS citing articles |
|
|
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Mao, M.; Benedikt, J.; Consoli, A.; Bogaerts, A. |
New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
47 |
UA library record; WoS full record; WoS citing articles |
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Van Gaens, W.; Iseni, S.; Schmidt-Bleker, A.; Weltmann, K.-D.; Reuter, S.; Bogaerts, A. |
Numerical analysis of the effect of nitrogen and oxygen admixtures on the chemistry of an argon plasma jet operating at atmospheric pressure |
2015 |
New journal of physics |
17 |
29 |
UA library record; WoS full record; WoS citing articles |
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Van Gaens, W.; Bruggeman, P.J.; Bogaerts, A. |
Numerical analysis of the NO and O generation mechanism in a needle-type plasma jet |
2014 |
New journal of physics |
16 |
34 |
UA library record; WoS full record; WoS citing articles |
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Jiang, W.; Zhang, Y.; Bogaerts, A. |
Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors |
2014 |
New journal of physics |
16 |
|
UA library record; WoS full record; WoS citing articles |
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Gul, B.; Tinck, S.; De Schepper, P.; Aman-ur-Rehman; Bogaerts, A. |
Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching |
2015 |
Journal of physics: D: applied physics |
48 |
7 |
UA library record; WoS full record; WoS citing articles |
|
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|
Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Numerical investigation of ion energy distribution functions in single and dual frequency capacitively coupled plasma reactors |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
69 |
97 |
UA library record; WoS full record; WoS citing articles |
|
|
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de Bleecker, K.; Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Numerical investigation of particle formation mechanisms in silane discharges |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
69 |
74 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; De Schepper, P.; Bogaerts, A. |
Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas |
2013 |
Plasma processes and polymers |
10 |
3 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Herrebout, D.; Kolev, I.; Madani, M.; Neyts, E. |
Numerical modeling for a better understanding of gas discharge plasmas |
2005 |
High temperature material processes |
9 |
1 |
UA library record; WoS full record; WoS citing articles |
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|
Bogaerts, A.; Gijbels, R. |
Numerical modelling of gas discharge plasmas for various applications |
2003 |
Vacuum: surface engineering, surface instrumentation & vacuum technology |
69 |
16 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Kolev, I.; Bogaerts, A. |
Numerical models of the planar magnetron glow discharges |
2004 |
Contributions to plasma physics |
44 |
22 |
UA library record; WoS full record; WoS citing articles |
|
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Lindner, H.; Autrique, D.; Pisonero, J.; Günther, D.; Bogaerts, A. |
Numerical simulation analysis of flow patterns and particle transport in the HEAD laser ablation cell with respect to inductively coupled plasma spectrometry |
2010 |
Journal of analytical atomic spectrometry |
25 |
16 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Georgieva, V.; Bogaerts, A. |
Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics |
2005 |
Journal of applied physics |
98 |
75 |
UA library record; WoS full record; WoS citing articles |
|
|
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Neyts, E.; Eckert, M.; Mao, M.; Bogaerts, A. |
Numerical simulation of hydrocarbon plasmas for nanoparticle formation and the growth of nanostructured thin films |
2009 |
Plasma physics and controlled fusion |
51 |
2 |
UA library record; WoS full record; WoS citing articles |
|
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Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Numerical study of Ar/CF4/N2 discharges in single and dual frequency capacitively coupled plasma reactors |
2003 |
Journal of applied physics |
94 |
90 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Mao, M.; Wang, Y.N.; Bogaerts, A. |
Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications |
2011 |
Journal of physics: D: applied physics |
44 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Neyts, E.C.; Bogaerts, A. |
Numerical study of the size-dependent melting mechanisms of nickel nanoclusters |
2009 |
The journal of physical chemistry: C : nanomaterials and interfaces |
113 |
|
UA library record; WoS full record; WoS citing articles |
|
|
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Kolev, I.; Bogaerts, A. |
Numerical study of the sputtering in a dc magnetron |
2009 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
27 |
66 |
UA library record; WoS full record; WoS citing articles |
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