| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Sankaran, K.; Clima, S.; Mees, M.; Pourtois, G. |
Exploring alternative metals to Cu and W for interconnects applications using automated first-principles simulations |
2015 |
ECS journal of solid state science and technology |
4 |
19 |
UA library record; WoS full record; WoS citing articles |
| Pourtois, G.; Lauwers, A.; Kittl, J.; Pantisano, L.; Sorée, B.; De Gendt, S.; Magnus, W.; Heyns, A.; Maex, K. |
First-principle calculations on gate/dielectric interfaces : on the origin of work function shifts |
2005 |
Microelectronic engineering |
80 |
31 |
UA library record; WoS full record; WoS citing articles |
| Martin, J.M.L.; François, J.P.; Gijbels, R. |
First principles computation of thermo-chemical properties beyond the harmonic approximation: 1: method and application to the water molecule and its isotopomers |
1992 |
The journal of chemical physics |
96 |
59 |
UA library record; WoS full record; WoS citing articles |
| Martin, J.M.L.; François, J.P.; Gijbels, R. |
First principles computation of thermo-chemical properties beyond the harmonic approximation: 2: application to the amino radical and its isotopomers |
1992 |
The journal of chemical physics |
97 |
22 |
UA library record; WoS full record; WoS citing articles |
| van den Broek, B.; Houssa, M.; Scalise, E.; Pourtois, G.; Afanas'ev, V.V.; Stesmans, A. |
First-principles electronic functionalization of silicene and germanene by adatom chemisorption |
2014 |
Applied surface science |
291 |
32 |
UA library record; WoS full record; WoS citing articles |
| Sankaran, K.; Pourtois, G.; Degraeve, R.; Zahid, M.B.; Rignanese, G.-M.; Van Houdt, J. |
First-principles modeling of intrinsic and extrinsic defects in \gamma-Al2O3 |
2010 |
Applied physics letters |
97 |
12 |
UA library record; WoS full record; WoS citing articles |
| Clima, S.; Chen, Y.Y.; Degraeve, R.; Mees, M.; Sankaran, K.; Govoreanu, B.; Jurczak, M.; De Gendt, S.; Pourtois, G. |
First-principles simulation of oxygen diffusion in HfOx : role in the resistive switching mechanism |
2012 |
Applied physics letters |
100 |
63 |
UA library record; WoS full record; WoS citing articles |
| Scalise, E.; Houssa, M.; Pourtois, G.; Afanas'ev, V.V.; Stesmans, A. |
First-principles study of strained 2D MoS2 |
2014 |
Physica. E: Low-dimensional systems and nanostructures |
56 |
72 |
UA library record; WoS full record; WoS citing articles |
| De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. |
Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge |
2011 |
Plasma processes and polymers |
8 |
70 |
UA library record; WoS full record; WoS citing articles |
| Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Fluid modelling of an atmospheric pressure dielectric barrier discharge in cylindrical geometry |
2009 |
Journal of physics: D: applied physics |
42 |
29 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Y.-R.; Gao, F.; Li, X.-C.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the bias effect in inductive/capacitive discharges |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
9 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 1 : transient behaviour of electrodynamics and power deposition |
2012 |
Journal of physics: D: applied physics |
45 |
57 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 2 : radial uniformity of the plasma characteristics |
2012 |
Journal of physics: D: applied physics |
45 |
15 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Y.-R.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in Ar/CF4 capacitively coupled plasmas |
2012 |
Journal of physics: D: applied physics |
45 |
8 |
UA library record; WoS full record; WoS citing articles |
| Si, X.-J.; Zhao, S.-X.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulations of frequency effects on nonlinear harmonics in inductively coupled plasma |
2011 |
Physics of plasmas |
18 |
7 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Neyts, E.C.; Bogaerts, A. |
Fluorinesilicon surface reactions during cryogenic and near room temperature etching |
2014 |
The journal of physical chemistry: C : nanomaterials and interfaces |
118 |
11 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. |
Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation |
2014 |
Plasma processes and polymers |
11 |
1 |
UA library record; WoS full record; WoS citing articles |
| Neyts, E.C.; Bogaerts, A. |
Formation of endohedral Ni@C60 and exohedral NiC60 metallofullerene complexes by simulated ion implantation |
2009 |
Carbon |
47 |
15 |
UA library record; WoS full record; WoS citing articles |
| Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. |
Formation of single layer graphene on nickel under far-from-equilibrium high flux conditions |
2013 |
Nanoscale |
5 |
25 |
UA library record; WoS full record; WoS citing articles |
| Vande Velde, C.; Bultinck, E.; Tersago, K.; van Alsenoy, C.; Blockhuys, F. |
From anisole to 1,2,4,5-tetramethoxybenzene: theoretical study of the factors that determine the conformation of methoxy groups on a benzene ring |
2007 |
International journal of quantum chemistry |
107 |
14 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Fundamental aspects and applications of glow discharge spectrometric techniques |
1998 |
Spectrochimica acta: part B : atomic spectroscopy |
53 |
49 |
UA library record; WoS full record; WoS citing articles |
| Gamez, G.; Bogaerts, A.; Andrade, F.; Hieftje, G.M. |
Fundamental studies on a planar-cathode direct current glow discharge: part 1: characterization via laser scattering techniques |
2004 |
Spectrochimica acta: part B : atomic spectroscopy |
59 |
24 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R.; Gamez, G.; Hieftje, G.M. |
Fundamental studies on a planar-cathode direct current glow discharge: part 2: numerical modeling and comparison with laser scattering experiments |
2004 |
Spectrochimica acta: part B : atomic spectroscopy |
59 |
26 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Neyts, E.; Gijbels, R.; van der Mullen, J. |
Gas discharge plasmas and their applications |
2002 |
Spectrochimica acta: part B : atomic spectroscopy |
57 |
462 |
UA library record; WoS full record; WoS citing articles |
| Aerts, R.; Tu, X.; Van Gaens, W.; Whitehead, J.C.; Bogaerts, A. |
Gas purification by nonthermal plasma : a case study of ethylene |
2013 |
Environmental science and technology |
47 |
56 |
UA library record; WoS full record; WoS citing articles |
| Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A. |
The glow discharge: an exciting plasma |
1999 |
Journal of analytical atomic spectrometry |
14 |
29 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Chen, Z.; Gijbels, R. |
Glow discharge modelling: from basic understanding towards applications |
2003 |
Surface and interface analysis |
35 |
14 |
UA library record; WoS full record; WoS citing articles |
| Angeli, J.; Bengtson, A.; Bogaerts, A.; Hoffmann, V.; Hodoroaba, V.-D.; Steers, E. |
Glow discharge optical emission spectrometry: moving towards reliable thin film analysis: a short review |
2003 |
Journal of analytical atomic spectrometry |
18 |
75 |
UA library record; WoS full record; WoS citing articles |
| Mortet, V.; Zhang, L.; Eckert, M.; D'Haen, J.; Soltani, A.; Moreau, M.; Troadec, D.; Neyts, E.; De Jaeger, J.C.; Verbeeck, J.; Bogaerts, A.; Van Tendeloo, G.; Haenen, K.; Wagner, P. |
Grain size tuning of nanocrystalline chemical vapor deposited diamond by continuous electrical bias growth : experimental and theoretical study |
2012 |
Physica status solidi : A : applications and materials science |
209 |
31 |
UA library record; WoS full record; WoS citing articles |
