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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Adriaens, A.; Van 't dack, L.; Adams, F.; Gijbels, R. |
A mass spectrometric study of the dissolution behavior of sanidine |
1995 |
Microchimica acta |
120 |
1 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Mathematical description of a direct current glow discharge in argon |
1996 |
Fresenius' journal of analytical chemistry |
355 |
12 |
UA library record; WoS full record; WoS citing articles |
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Adriaensen, L.; Vangaever, F.; Lenaerts, J.; Gijbels, R. |
Matrix-enhanced secondary ion mass spectrometry: the influence of MALDI matrices on molecular ion yields of thin organic films |
2005 |
Rapid communications in mass spectrometry |
19 |
24 |
UA library record; WoS full record; WoS citing articles |
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Ignatova, V.A.; Lebedev, O.I.; Watjen, U.; van Vaeck, L.; van Landuyt, J.; Gijbels, R.; Adams, F. |
Metal and composite nanocluster precipitate formation in silicon dioxide implanted with Sb+ ions |
2002 |
Journal of applied physics |
92 |
5 |
UA library record; WoS full record; WoS citing articles |
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Adriaensen, L.; Vangaever, F.; Gijbels, R. |
Metal-assisted secondary ion mass spectrometry: the influence of Ag and Au deposition on molecular ion yields |
2004 |
Analytical chemistry |
76 |
67 |
UA library record; WoS full record; WoS citing articles |
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Wu, S.; van Daele, A.; Jacob, W.; Gijbels, R.; Verbeeck, A.; de Keyzer, R. |
Microanalysis of individual silver halide microcrystals |
1993 |
Scanning microscopy |
7 |
7 |
UA library record; WoS full record; WoS citing articles |
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Poels, K.; van Vaeck, L.; Gijbels, R. |
Microprobe speciation analysis of inorganic solids by Fourier transform laser mass spectrometry |
1998 |
Analytical chemistry |
70 |
32 |
UA library record; WoS full record; WoS citing articles |
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Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. |
Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model |
2002 |
Journal of applied physics |
92 |
15 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions |
2001 |
Journal of analytical atomic spectrometry |
16 |
36 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R.; Jackson, G.P. |
Modeling of a millisecond pulsed glow discharge: investigation of the afterpeak |
2003 |
Journal of analytical atomic spectrometry |
18 |
42 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Modeling of argon direct current glow discharges and comparison with experiment: how good is the agreement? |
1998 |
Journal of analytical atomic spectrometry |
13 |
24 |
UA library record; WoS full record; WoS citing articles |
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de Witte, H.; Vandervorst, W.; Gijbels, R. |
Modeling of bombardment induced oxidation of silicon |
2001 |
Journal of applied physics |
89 |
16 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R.; Vlcek, J. |
Modeling of glow discharge optical emission spectrometry: calculation of the argon atomic optical emission spectrum |
1998 |
Spectrochimica acta: part B : atomic spectroscopy |
53 |
44 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis |
1997 |
Journal of the American Society of Mass Spectrometry |
8 |
15 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Modeling of metastable argon atoms in a direct current glow discharge |
1995 |
Physical review : A : atomic, molecular and optical physics |
52 |
98 |
UA library record; WoS full record; WoS citing articles |
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Lenaerts, J.; Verlinden, G.; Ignatova, V.A.; van Vaeck, L.; Gijbels, R.; Geuens, I. |
Modeling of the sputtering process of cubic silver halide microcrystals and its relevance in depth profiling by secondary ion-mass spectrometry (SIMS) |
2001 |
Fresenius' journal of analytical chemistry |
370 |
3 |
UA library record; WoS full record; WoS citing articles |
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Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. |
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering |
2004 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
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Neyts, E.; Bogaerts, A.; Gijbels, R.; Benedikt, J.; van de Sanden, M.C.M. |
Molecular dynamics simulation of the impact behaviour of various hydrocarbon species on DLC |
2005 |
Nuclear instruments and methods in physics research: B: beam interactions with materials and atoms |
228 |
19 |
UA library record; WoS full record; WoS citing articles |
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Neyts, E.; Bogaerts, A.; Gijbels, R.; Benedikt, J.; van den Sanden, M.C.M. |
Molecular dynamics simulations for the growth of diamond-like carbon films from low kinetic energy species |
2004 |
Diamond and related materials |
13 |
53 |
UA library record; WoS full record; WoS citing articles |
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van Ham, R.; Adriaens, A.; van Vaeck, L.; Gijbels, R.; Adams, F. |
Molecular information in static SIMS for the speciation of inorganic compounds |
2000 |
Nuclear instruments and methods in physics research: B: beam interactions with materials and atoms |
161/163 |
19 |
UA library record; WoS full record; WoS citing articles |
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Ignatova, V.A.; van Vaeck, L.; Gijbels, R.; Adams, F. |
Molecular speciation of inorganic mixtures by Fourier transform laser microprobe mass sepctrometry |
2003 |
International journal of mass spectrometry |
225 |
9 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge |
1999 |
IEEE transactions on plasma science |
27 |
15 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; van Straaten, M.; Gijbels, R. |
Monte Carlo simulation of an analytical glow discharge: motion of electrons, ions and fast neutrals in the cathode dark space |
1995 |
Spectrochimica acta: part B : atomic spectroscopy |
50 |
95 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
New developments and applications in GDMS |
1999 |
Fresenius' journal of analytical chemistry |
364 |
17 |
UA library record; WoS full record; WoS citing articles |
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van Vaeck, L.; van Espen, P.; Gijbels, R.; Baykut, G.; Laukien, F.H. |
A new electrostatic transfer line for improved transmission in Fourier transform laser microprobe mass spectrometry with external ion source |
2000 |
European mass spectrometry |
6 |
10 |
UA library record; WoS full record; WoS citing articles |
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Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Numerical investigation of ion energy distribution functions in single and dual frequency capacitively coupled plasma reactors |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
69 |
97 |
UA library record; WoS full record; WoS citing articles |
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de Bleecker, K.; Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Numerical investigation of particle formation mechanisms in silane discharges |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
69 |
74 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Numerical modelling of gas discharge plasmas for various applications |
2003 |
Vacuum: surface engineering, surface instrumentation & vacuum technology |
69 |
16 |
UA library record; WoS full record; WoS citing articles |
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Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Numerical study of Ar/CF4/N2 discharges in single and dual frequency capacitively coupled plasma reactors |
2003 |
Journal of applied physics |
94 |
90 |
UA library record; WoS full record; WoS citing articles |
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