|
Author |
Title ![sorted by Title field, ascending order (up)](img/sort_asc.gif) |
Year |
Publication |
Volume |
Times cited |
Additional Links |
|
Bogaerts, A.; Gijbels, R. |
Two-dimensional model of a direct current glow discharge : description of the argon metastable atoms, sputtered atoms and ions |
1996 |
Analytical chemistry |
68 |
57 |
UA library record; WoS full record; WoS citing articles |
|
Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Two-dimensional model of a direct current glow discharge: description of the electrons, argon ions and fast argon atoms |
1996 |
Analytical chemistry |
68 |
70 |
UA library record; WoS full record; WoS citing articles |
|
Charlier, E.; van Doorselaer, M.; Gijbels, R.; de Keyzer, R.; Geuens, I. |
Unveiling the composition of sulphur sensitization specks by their interactions with TAI |
2000 |
Journal Of Imaging Science And Technology |
44 |
16 |
UA library record; WoS full record; WoS citing articles |
|
Conard, T.; de Witte, H.; Loo, R.; Verheyen, P.; Vandervorst, W.; Caymax, M.; Gijbels, R. |
XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers |
1999 |
Thin solid films : an international journal on the science and technology of thin and thick films |
343/344 |
1 |
UA library record; WoS full record; WoS citing articles |
|
de Witte, H.; Conard, T.; Sporken, R.; Gouttebaron, R.; Magnee, R.; Vandervorst, W.; Caudano, R.; Gijbels, R. |
XPS study of ion induced oxidation of silicon with and without oxygen flooding |
2000 |
|
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UA library record |