Author |
Title ![sorted by Title field, ascending order (up)](img/sort_asc.gif) |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Yusupov, M.; Bultinck, E.; Depla, D.; Bogaerts, A. |
Behavior of electrons in a dual-magnetron sputter deposition system : a Monte Carlo model |
2011 |
New journal of physics |
13 |
12 |
UA library record; WoS full record; WoS citing articles |
Mahieu, S.; Ghekiere, P.; de Winter, G.; de Gryse, R.; Depla, D.; Van Tendeloo, G.; Lebedev, O.I. |
Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering |
2006 |
Surface and coatings technology |
200 |
36 |
UA library record; WoS full record; WoS citing articles |
Mahieu, S.; Ghekiere, P.; de Winter, G.; de Gryse, R.; Depla, D.; Lebedev, O.I. |
Biaxially aligned yttria stabilized zirconia and titanium nitride layers deposited by unbalanced magnetron sputtering |
2005 |
Diffusion and defect data : solid state data : part B : solid state phenomena
T2 – 2nd International Conference on Texture and Anisotropy of Polycrystals, JUL 07-09, 2004, Metz, FRANCE |
105 |
|
UA library record; WoS full record; WoS citing articles |
Saraiva, M.; Georgieva, V.; Mahieu, S.; van Aeken, K.; Bogaerts, A.; Depla, D. |
Compositional effects on the growth of Mg(M)O films |
2010 |
Journal of applied physics |
107 |
|
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Bultinck, E.; Kolev, I.; Schwaederlé, L.; van Aeken, K.; Buyle, G.; Depla, D. |
Computer modelling of magnetron discharges |
2009 |
Journal of physics: D: applied physics |
42 |
32 |
UA library record; WoS full record; WoS citing articles |
Chen, Z.Y.; Bogaerts, A.; Depla, D.; Ignatova, V. |
Dynamic Monte Carlo simulation for reactive sputtering of aluminium |
2003 |
Nuclear instruments and methods in physics research: B |
207 |
20 |
UA library record; WoS full record; WoS citing articles |
Yusupov, M.; Bultinck, E.; Depla, D.; Bogaerts, A. |
Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system |
2011 |
Applied physics letters |
98 |
4 |
UA library record; WoS full record; WoS citing articles |
Ghekiere, P.; Mahieu, S.; De Winter, G.; De Gryse, R.; Depla, D.; Lebedev, O.I. |
Growth mechanism of biaxially aligned magnesium oxide deposited by unbalanced magnetron sputtering |
2005 |
Diffusion and defect data : solid state data : part B : solid state phenomena
T2 – 2nd International Conference on Texture and Anisotropy of Polycrystals, JUL 07-09, 2004, Metz, FRANCE |
105 |
5 |
UA library record; WoS full record; WoS citing articles |
Saraiva, M.; Chen, H.; Leroy, W.P.; Mahieu, S.; Jehanathan, N.; Lebedev, O.; Georgieva, V.; Persoons, R.; Depla, D. |
Influence of Al content on the properties of MgO grown by reactive magnetron sputtering |
2009 |
Plasma processes and polymers |
6 |
13 |
UA library record; WoS full record; WoS citing articles |
Mahieu, S.; Ghekiere, P.; de Winter, G.; Depla, D.; de Gryse, R.; Lebedev, O.I.; Van Tendeloo, G. |
Influence of the Ar/O2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering |
2005 |
Thin solid films : an international journal on the science and technology of thin and thick films |
484 |
23 |
UA library record; WoS full record; WoS citing articles |
Mahieu, S.; Ghekiere, P.; de Winter, G.; Heirwegh, S.; Depla, D.; de Gryse, R.; Lebedev, O.I.; Van Tendeloo, G. |
Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers |
2005 |
Journal of crystal growth |
279 |
41 |
UA library record; WoS full record; WoS citing articles |
Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. |
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering |
2004 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. |
Particle-in-cell/Monte Carlo collisions model for the reactive sputter deposition of nitride layers |
2009 |
Plasma processes and polymers |
6 |
2 |
UA library record; WoS full record; WoS citing articles |
Bercx, M.; Mayda, S.; Depla, D.; Partoens, B.; Lamoen, D. |
Plasmonic effects in the neutralization of slow ions at a metallic surface |
2023 |
Contributions to Plasma Physics |
|
|
UA library record; WoS full record |
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. |
Reactive sputter deposition of TiNx films, simulated with a particle-in-cell/Monte Carlo collisions model |
2009 |
New journal of physics |
11 |
23 |
UA library record; WoS full record; WoS citing articles |
Depla, D.; Li, X.Y.; Mahieu, S.; van Aeken, K.; Leroy, W.P.; Haemers, J.; de Gryse, R.; Bogaerts, A. |
Rotating cylindrical magnetron sputtering: simulation of the reactive process |
2010 |
Journal of applied physics |
107 |
15 |
UA library record; WoS full record; WoS citing articles |
Yusupov, M.; Saraiva, M.; Depla, D.; Bogaerts, A. |
Sputter deposition of MgxAlyOz thin films in a dual-magnetron device : a multi-species Monte Carlo model |
2012 |
New journal of physics |
14 |
2 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Saraiva, M.; Jehanathan, N.; Lebelev, O.I.; Depla, D.; Bogaerts, A. |
Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments |
2009 |
Journal of physics: D: applied physics |
42 |
37 |
UA library record; WoS full record; WoS citing articles |
Bultinck, E.; Kolev, I.; Bogaerts, A.; Depla, D. |
The importance of an external circuit in a particle-in-cell/Monte Carlo collisions model for a direct current planar magnetron |
2008 |
Journal of applied physics |
103 |
29 |
UA library record; WoS full record; WoS citing articles |
Jehanathan, N.; Georgieva, V.; Saraiva, M.; Depla, D.; Bogaerts, A.; Van Tendeloo, G. |
The influence of Cr and Y on the micro structural evolution of Mg―Cr―O and Mg―Y―O thin films |
2011 |
Thin solid films : an international journal on the science and technology of thin and thick films |
519 |
4 |
UA library record; WoS full record; WoS citing articles |
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. |
The origin of Bohm diffusion, investigated by a comparison of different modelling methods |
2010 |
Journal of physics: D: applied physics |
43 |
16 |
UA library record; WoS full record; WoS citing articles |
Lamas, J.S.; Leroy, W.P.; Lu, Y.-G.; Verbeeck, J.; Van Tendeloo, G.; Depla, D. |
Using the macroscopic scale to predict the nano-scale behavior of YSZ thin films |
2014 |
Surface and coatings technology |
238 |
8 |
UA library record; WoS full record; WoS citing articles |