| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Autrique, D.; Clair, G.; L'Hermite, D.; Alexiades, V.; Bogaerts, A.; Rethfeld, B. |
The role of mass removal mechanisms in the onset of ns-laser induced plasma formation |
2013 |
Journal of applied physics |
114 |
31 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model |
1996 |
Journal of applied physics |
79 |
81 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description |
1999 |
Journal of applied physics |
86 |
50 |
UA library record; WoS full record; WoS citing articles |
| Baguer, N.; Bogaerts, A.; Gijbels, R. |
Role of the fast Ar atoms, Ar+ ions and metastable Ar atoms in a hollow cathode glow discharge: study by a hybrid model |
2003 |
Journal of applied physics |
94 |
19 |
UA library record; WoS full record; WoS citing articles |
| de Bleecker, K.; Bogaerts, A.; Goedheer, W. |
Role of the thermophoretic force on the transport of nanoparticles in dusty silane plasmas |
2005 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
71 |
25 |
UA library record; WoS full record; WoS citing articles |
| Depla, D.; Li, X.Y.; Mahieu, S.; van Aeken, K.; Leroy, W.P.; Haemers, J.; de Gryse, R.; Bogaerts, A. |
Rotating cylindrical magnetron sputtering: simulation of the reactive process |
2010 |
Journal of applied physics |
107 |
15 |
UA library record; WoS full record; WoS citing articles |
| Martin, J.M.L.; François, J.P.; Gijbels, R. |
The rotational partition function of the symmetric top and the effect of K doubling thereon |
1991 |
Chemical physics letters |
187 |
6 |
UA library record; WoS full record; WoS citing articles |
| Clima, S.; Sankaran, K.; Chen, Y.Y.; Fantini, A.; Celano, U.; Belmonte, A.; Zhang, L.; Goux, L.; Govoreanu, B.; Degraeve, R.; Wouters, D.J.; Jurczak, M.; Vandervorst, W.; Gendt, S.D.; Pourtois, G.; |
RRAMs based on anionic and cationic switching : a short overview |
2014 |
Physica status solidi: rapid research letters |
8 |
28 |
UA library record; WoS full record; WoS citing articles |
| Phung, Q.M.; Vancoillie, S.; Delabie, A.; Pourtois, G.; Pierloot, K. |
Ruthenocene and cyclopentadienyl pyrrolyl ruthenium as precursors for ruthenium atomic layer deposition : a comparative study of dissociation enthalpies |
2012 |
Theoretical chemistry accounts : theory, computation, and modeling |
131 |
5 |
UA library record; WoS full record; WoS citing articles |
| Adriaensen, L.; Vangaever, F.; Lenaerts, J.; Gijbels, R. |
S-SIMS and MetA-SIMS study of organic additives in thin polymer coatings |
2006 |
Applied surface science |
252 |
3 |
UA library record; WoS full record; WoS citing articles |
| van Straaten, M.; Vertes, A.; Gijbels, R. |
Sample erosion studies in a glow discharge ionization cell |
1991 |
Spectrochimica acta |
46b |
|
UA library record |
| Gijbels, R.; Oleshko, V. |
Scanning microanalysis |
1998 |
|
|
|
UA library record |
| Oleshko, V.; Gijbels, R. |
Scanning microanalysis |
1997 |
|
|
|
UA library record |
| Oleshko, V.; Gijbels, R. |
Scanning microanalysis |
1997 |
|
|
|
UA library record |
| Oleshko, V.; Gijbels, R. |
Scanning microanalysis |
1996 |
|
|
|
UA library record |
| Duan, Z.L.; Chen, Z.Y.; Zhang, J.T.; Feng, X.L.; Xu, Z.Z. |
Scheme for the generation of entangled atomic state in cavity QED |
2004 |
European physical journal : D : atomic, molecular and optical physics |
30 |
4 |
UA library record; WoS full record; WoS citing articles |
| Lenaerts, J.; van Vaeck, L.; Gijbels, R. |
Secondary ion formation of low molecular weight organic dyes in time-of-flight static secondary ion mass spectrometry |
2003 |
Rapid communications in mass spectrometry |
17 |
10 |
UA library record; WoS full record; WoS citing articles |
| Baguer, N.; Bogaerts, A.; Gijbels, R. |
A self-consistent mathematical model of a hollow cathode glow discharge |
1999 |
|
|
|
UA library record; WoS full record; |
| Khalilov, U.; Pourtois, G.; van Duin, A.C.T.; Neyts, E.C. |
Self-limiting oxidation in small-diameter Si nanowires |
2012 |
Chemistry of materials |
24 |
45 |
UA library record; WoS full record; WoS citing articles |
| Berezhnoi, S.; Kaganovich, I.; Misina, M.; Bogaerts, A.; Gijbels, R. |
Semianalytical description of nonlocal secondary electrons in a radio-frequency capacitively coupled plasma at intermediate pressures |
1999 |
IEEE transactions plasma science |
27 |
7 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Q.-Z.; Zhao, S.-X.; Jiang, W.; Wang, Y.-N. |
Separate control between geometrical and electrical asymmetry effects in capacitively coupled plasmas |
2012 |
Journal of physics: D: applied physics |
45 |
20 |
UA library record; WoS full record; WoS citing articles |
| Cai, H.-bo; Yu, W.; Zhu, S.-ping; Zheng, C.-yang; Cao, L.-hua; Li, B.; Chen, Z.Y.; Bogaerts, A. |
Short-pulse laser absorption in very steep plasma density gradients |
2006 |
Physics of plasmas |
13 |
17 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Similarities and differences between direct current and radio-frequency glow discharges: a mathematical simulation |
2000 |
Journal of analytical atomic spectrometry |
15 |
25 |
UA library record; WoS full record; WoS citing articles |
| de Witte, H.; Conard, T.; Vandervorst, W.; Gijbels, R. |
SIMS analysis of oxynitrides: evidence for nitrogen diffusion induced by oxygen flooding |
2000 |
Surface and interface analysis |
29 |
4 |
UA library record; WoS full record; WoS citing articles |
| Gijbels, R.; Verlinden, G.; Geuens, I. |
SIMS/TOF-SIMS study of microparticles: surface analysis, imaging and quantification |
2000 |
|
|
|
UA library record; WoS full record; |
| Lindner, H.; Murtazin, A.; Groh, S.; Niemax, K.; Bogaerts, A. |
Simulation and experimental studies on plasma temperature, flow velocity, and injector diameter effects for an inductively coupled plasma |
2011 |
Analytical chemistry |
83 |
34 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Boullart, W.; Bogaerts, A. |
Simulation of an Ar/Cl2 inductively coupled plasma: study of the effect of bias, power and pressure and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
31 |
UA library record; WoS full record; WoS citing articles |
| Liu, Y.H.; Chen, Z.Y.; Huang, F.; Yu, M.Y.; Wang, L.; Bogaerts, A. |
Simulation of disk- and band-like voids in dusty plasma systems |
2006 |
Physics of plasmas |
13 |
20 |
UA library record; WoS full record; WoS citing articles |
| Herrebout, D.; Bogaerts, A.; Goedheer, W.; Dekempeneer, E.; Gijbels, R. |
Simulation of plasma processes in plasma assisted CVD reactors |
1999 |
|
|
|
UA library record; WoS full record; |
| Tinck, S.; Bogaerts, A.; Shamiryan, D. |
Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma |
2011 |
Plasma processes and polymers |
8 |
5 |
UA library record; WoS full record; WoS citing articles |
