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Tinck, S.
;
Tillocher, T.
;
Dussart, R.
;
Neyts, E.C.
;
Bogaerts, A.
Elucidating the effects of gas flow rate on an SF
6
inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation
2016
Journal of physics: D: applied physics
49
1
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;
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