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Towards upgrading of wastewater resources to microbial protein : volatile fatty acids impacting growth kinetics and yield of purple bacteria”. Alloul A, Vlaeminck SE, , 2 p. T2 (2017)
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Uneven distribution of inorganic pollutants in marine air originating from ocean-going ships”. Bencs L, Horemans B, Buczyńska AJ, Van Grieken R, Environmental pollution 222, 226 (2017). http://doi.org/10.1016/J.ENVPOL.2016.12.052
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Ureolytic activity and its regulation in vibrio campbellii and vibrio harveyi in relation to nitrogen recovery from human urine”. Defoirdt T, Vlaeminck SE, Sun X, Boon N, Clauwaert P, Environmental science and technology 51, 13335 (2017). http://doi.org/10.1021/ACS.EST.7B03829
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Valley filtering in graphene due to substrate-induced mass potential”. da Costa DR, Chaves A, Farias GA, Peeters FM, Journal of physics : condensed matter 29, 215502 (2017). http://doi.org/10.1088/1361-648X/AA6B24
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Water and process parameters as controllers for the ammonia to nitrite oxidation rate ratio in activated sludge”. Han M, Seuntjens D, Al-Omari A, Takacs I, Meerburg F, Murthy S, Vlaeminck SE, De Clippeleir H, , 3 p. T2 (2017)
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Water treatment unit breadboard : ground test facility for the recycling of urine and shower water for one astronaut”. de Paepe J, Lindeboom REF, Vanoppen M, Alonso Farinas B, Coessens W, Abbas A, Christiaens M, Dotremont C, Beckers H, Lamaze B, Demey D, Rabaey K, Clauwaert P, Verliefde ARD, Vlaeminck SE, , 2 p. T2 (2017)
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The work function of few-layer graphene”. Leenaerts O, Partoens B, Peeters FM, Volodin A, van Haesendonck C, Journal of physics : condensed matter 29, 035003 (2017). http://doi.org/10.1088/0953-8984/29/3/035003
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Epitaxial CVD growth of ultra-thin Si passivation layers on strained Ge fin structures”. Loo R, Arimura H, Cott D, Witters L, Pourtois G, Schulze A, Douhard B, Vanherle W, Eneman G, Richard O, Favia P, Mitard J, Mocuta D, Langer R, Collaert N, Semiconductor Process Integration 10 , 241 (2017). http://doi.org/10.1149/08004.0241ECST
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Probing the intrinsic limitations of the contact resistance of metal/semiconductor interfaces through atomistic simulations”. Pourtois G, Dabral A, Sankaran K, Magnus W, Yu H, de de Meux AJ, Lu AKA, Clima S, Stokbro K, Schaekers M, Houssa M, Collaert N, Horiguchi N, Semiconductors, Dielectrics, And Metals For Nanoelectronics 15: In Memory Of Samares Kar , 303 (2017). http://doi.org/10.1149/08001.0303ECST
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