Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Bogaerts, A.; Gijbels, R. |
Mathematical description of a direct current glow discharge in argon |
1996 |
Fresenius' journal of analytical chemistry |
355 |
12 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A. |
Mathematical modeling of a direct current glow discharge in argon |
1996 |
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|
UA library record |
Bogaerts, A.; van Straaten, M.; Gijbels, R. |
Mathematical modelling of an analytical glow discharge |
1995 |
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|
UA library record |
Khalilov, U.; Bogaerts, A.; Neyts, E.C. |
Microscopic mechanisms of vertical graphene and carbon nanotube cap nucleation from hydrocarbon growth precursors |
2014 |
Nanoscale |
6 |
21 |
UA library record; WoS full record; WoS citing articles |
Eckert, M.; Neyts, E.; Bogaerts, A. |
Modeling adatom surface processes during crystal growth: a new implementation of the Metropolis Monte Carlo algorithm |
2009 |
CrystEngComm |
11 |
15 |
UA library record; WoS full record; WoS citing articles |
Zhang, Y.-R.; Tinck, S.; De Schepper, P.; Wang, Y.-N.; Bogaerts, A. |
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
3 |
UA library record; WoS full record; WoS citing articles |
Vandenbroucke, A.M.; Aerts, R.; Van Gaens, W.; De Geyter, N.; Leys, C.; Morent, R.; Bogaerts, A. |
Modeling and experimental study of trichloroethylene abatement with a negative direct current corona discharge |
2015 |
Plasma chemistry and plasma processing |
35 |
9 |
UA library record; WoS full record; WoS citing articles |
Neyts, E.; Mao, M.; Eckert, M.; Bogaerts, A. |
Modeling aspects of plasma-enhanced chemical vapor deposition of carbon-based materials |
2012 |
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|
UA library record |
Bogaerts, A.; Gijbels, R. |
Modeling network for argon glow discharge plasmas with copper cathode |
2002 |
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|
UA library record |
Bogaerts, A.; Gijbels, R. |
Modeling network for argon glow discharges: the output cannot be better than the input |
2000 |
|
|
1 |
UA library record; WoS full record; WoS citing articles |
Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. |
Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model |
2002 |
Journal of applied physics |
92 |
15 |
UA library record; WoS full record; WoS citing articles |
Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Modeling of a dielectric barrier discharge used as a flowing chemical reactor |
2008 |
Journal of physics : conference series |
133 |
6 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions |
2001 |
Journal of analytical atomic spectrometry |
16 |
36 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R.; Jackson, G.P. |
Modeling of a millisecond pulsed glow discharge: investigation of the afterpeak |
2003 |
Journal of analytical atomic spectrometry |
18 |
42 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Modeling of argon direct current glow discharges and comparison with experiment: how good is the agreement? |
1998 |
Journal of analytical atomic spectrometry |
13 |
24 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; de Bleecker, K.; Kolev, I.; Madani, M. |
Modeling of gas discharge plasmas: What can we learn from it? |
2005 |
Surface and coatings technology |
200 |
11 |
UA library record; WoS full record; WoS citing articles |
Gijbels, R.; Bogaerts, A. |
Modeling of glow discharge ion sources for mass spectrometry: potentials and limitations |
1997 |
Spectroscopy |
9 |
|
UA library record |
Bogaerts, A.; Gijbels, R.; Vlcek, J. |
Modeling of glow discharge optical emission spectrometry: calculation of the argon atomic optical emission spectrum |
1998 |
Spectrochimica acta: part B : atomic spectroscopy |
53 |
44 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis |
1997 |
Journal of the American Society of Mass Spectrometry |
8 |
15 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Modeling of glow discharges: what can we learn from it? |
1997 |
Analytical chemistry A-pages |
69 |
|
UA library record |
Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Kolev, I. |
Modeling of magnetron and glow discharges |
2002 |
Le vide: science, technique et applications |
57 |
|
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Modeling of metastable argon atoms in a direct current glow discharge |
1995 |
Physical review : A : atomic, molecular and optical physics |
52 |
98 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Aerts, R.; Snoeckx, R.; Somers, W.; Van Gaens, W.; Yusupov, M.; Neyts, E. |
Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications |
2012 |
Journal of physics : conference series |
399 |
7 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Modeling of radio-frequency and direct current glow discharges in argon |
2000 |
Journal of technical physics |
41 |
|
UA library record |
de Bleecker, K.; Bogaerts, A.; Goedheer, W. |
Modeling of the formation and transport of nanoparticles in silane plasmas |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
70 |
31 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Kolev, I.; Buyle, G. |
Modeling of the magnetron discharge |
2008 |
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|
UA library record |
Bogaerts, A.; De Bie, C.; Eckert, M.; Georgieva, V.; Martens, T.; Neyts, E.; Tinck, S. |
Modeling of the plasma chemistry and plasmasurface interactions in reactive plasmas |
2010 |
Pure and applied chemistry |
82 |
13 |
UA library record; WoS full record; WoS citing articles |
de Bleecker, K.; Bogaerts, A. |
Modeling of the synthesis and subsequent growth of nanoparticles in dusty plasmas |
2007 |
High temperature material processes |
11 |
|
UA library record; WoS full record |
Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. |
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering |
2004 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
22 |
13 |
UA library record; WoS full record; WoS citing articles |