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Highly selective gas separation membrane using in situ amorphised metal-organic frameworks”. Kertik A, Wee LH, Pfannmöller M, Bals S, Martens JA, Vankelecom IFJ, Energy &, environmental science 10, 2342 (2017). http://doi.org/10.1039/C7EE01872J
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Synthesis of Li-Rich NMC : a comprehensive study”. Pimenta V, Sathiya M, Batuk D, Abakumov AM, Giaume D, Cassaignon S, Larcher D, Tarascon J-M, Chemistry of materials 29, 9923 (2017). http://doi.org/10.1021/ACS.CHEMMATER.7B03230
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Formation of a conducting LaAlO3/SrTiO3 interface studied by low-energy electron reflection during growth”. van der Torren AJH, Liao Z, Xu C, Gauquelin N, Yin C, Aarts J, van der Molen SJ, Physical Review Materials 1, 075001 (2017). http://doi.org/10.1103/PhysRevMaterials.1.075001
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Phosphatidylserine flip-flop induced by oxidation of the plasma membrane: a better insight by atomic scale modeling”. Razzokov J, Yusupov M, Vanuytsel S, Neyts EC, Bogaerts A, Plasma processes and polymers 14, 1700013 (2017). http://doi.org/10.1002/ppap.201700013
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Quantification by aberration corrected (S)TEM of boundaries formed by symmetry breaking phase transformations”. Schryvers D, Salje EKH, Nishida M, De Backer A, Idrissi H, Van Aert S, Ultramicroscopy 176, 194 (2017). http://doi.org/10.1016/j.ultramic.2016.12.022
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Postsynthetic high-alumina zeolite crystal engineering in organic free hyper-alkaline media”. Van Tendeloo L, Wangermez W, Vandekerkhove A, Willhammar T, Bals S, Maes A, Martens JA, Kirschhock CEA, Breynaert E, Chemistry of materials 29, 629 (2017). http://doi.org/10.1021/ACS.CHEMMATER.6B04052
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Gel-based morphological design of zirconium metal-organic frameworks”. Bueken B, Van Velthoven N, Willhammar T, Stassin T, Stassen I, Keen DA, Baron GV, Denayer JFM, Ameloot R, Bals S, De Vos D, Bennett TD, Chemical science 8, 3939 (2017). http://doi.org/10.1039/C6SC05602D
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Probing the intrinsic limitations of the contact resistance of metal/semiconductor interfaces through atomistic simulations”. Pourtois G, Dabral A, Sankaran K, Magnus W, Yu H, de de Meux AJ, Lu AKA, Clima S, Stokbro K, Schaekers M, Houssa M, Collaert N, Horiguchi N, Semiconductors, Dielectrics, And Metals For Nanoelectronics 15: In Memory Of Samares Kar , 303 (2017). http://doi.org/10.1149/08001.0303ECST
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Epitaxial CVD growth of ultra-thin Si passivation layers on strained Ge fin structures”. Loo R, Arimura H, Cott D, Witters L, Pourtois G, Schulze A, Douhard B, Vanherle W, Eneman G, Richard O, Favia P, Mitard J, Mocuta D, Langer R, Collaert N, Semiconductor Process Integration 10 , 241 (2017). http://doi.org/10.1149/08004.0241ECST
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