| |
Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
|
Bogaerts, A.; Gijbels, R. |
The role of fast argon ions and atoms in the ionization of argon in a direct current glow discharge: a mathematical simulation |
1995 |
Journal of applied physics |
78 |
60 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model |
1996 |
Journal of applied physics |
79 |
81 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description |
1999 |
Journal of applied physics |
86 |
50 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Modeling network for argon glow discharge plasmas with copper cathode |
2002 |
|
|
|
UA library record |
|
|
|
Bogaerts, A.; Gijbels, R. |
Modelling of a direct current glow discharge: combined models for the electrons, argon ions and metastables |
1995 |
|
|
|
UA library record |
|
|
|
Bogaerts, A.; Gijbels, R. |
Numerical modelling of analytical glow discharges |
2003 |
|
|
|
UA library record |
|
|
|
Bogaerts, A.; Gijbels, R. |
Plasma models |
1997 |
|
|
|
UA library record |
|
