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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation”. Van Laer K, Tinck S, Samara V, de Marneffe JF, Bogaerts A, Plasma sources science and technology 22, 025011 (2013). http://doi.org/10.1088/0963-0252/22/2/025011
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Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model”. Kozák T, Bogaerts A, Plasma sources science and technology 24, 015024 (2015). http://doi.org/10.1088/0963-0252/24/1/015024
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Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 22, 015017 (2013). http://doi.org/10.1088/0963-0252/22/1/015017
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Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas”. Zhang Q-Z, Liu Y-X, Jiang W, Bogaerts A, Wang Y-N, Plasma sources science and technology 22, 025014 (2013). http://doi.org/10.1088/0963-0252/22/2/025014
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Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux”. Bogaerts A, Okhrimovskyy A, Baguer N, Gijbels R, Plasma sources science and technology 14, 191 (2005). http://doi.org/10.1088/0963-0252/14/1/021
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The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
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Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating”. Tinck S, Boullart W, Bogaerts A, Plasma sources science and technology 20, 045012 (2011). http://doi.org/10.1088/0963-0252/20/4/045012
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Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model”. Georgieva V, Bogaerts A, Plasma sources science and technology 15, 368 (2006). http://doi.org/10.1088/0963-0252/15/3/010
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Reaction pathways of biomedically active species in an Ar plasma jet”. Van Gaens W, Bogaerts A, Plasma sources science and technology 23, 035015 (2014). http://doi.org/10.1088/0963-0252/23/3/035015
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Reduction of composite Ag(Br,I) grains as studied by AEM and digital image analysis techniques”. Oleshko VP, Gijbels RH, Jacob WA, , 657 (1998)
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Splitting of CO2 by vibrational excitation in non-equilibrium plasmas : a reaction kinetics model”. Kozák T, Bogaerts A, Plasma sources science and technology 23, 045004 (2014). http://doi.org/10.1088/0963-0252/23/4/045004
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Study of electron excitations in Ag(Br,I) nanocrystals by cryo-AEM techniques”. Oleshko VP, van Daele AJ, Gijbels RH, Jacob WA, , 659 (1998)
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Investigation of 50 Hz pulsed DC nitrogen plasma with active screen cage by trace rare gas optical emission spectroscopy”. Saeed A, Khan AW, Shafiq M, Jan F, Abrar M, Zaka-ul-Islam M, Zakaullah M, Plasma science &, technology 16, 324 (2014). http://doi.org/10.1088/1009-0630/16/4/05
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Modeling for a Better Understanding of Plasma-Based CO2 Conversion”. Bogaerts A, Snoeckx R, Trenchev G, Wang W In: Britun N, Silva T (eds) Plasma Chemistry and Gas Conversion. IntechOpen, Rijeka (2018).
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Engineering the electronic properties of silicene by tuning the composition of MoX2 and GaX (X = S,Se,Te) chalchogenide templates”. Scalise E, Houssa M, Cinquanta E, Grazianetti C, van den Broek B, Pourtois G, Stesmans A, Fanciulli M, Molle A, 2D materials 1, 011010 (2014). http://doi.org/10.1088/2053-1583/1/1/011010
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Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition”. Fei G, Xue-Chun L, Zhao S-X, You-Nian W, Chinese physics B 21, 075203 (2012). http://doi.org/10.1088/1674-1056/21/7/075203
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Two-dimensional hexagonal tin : ab initio geometry, stability, electronic structure and functionalization”. van den Broek B, Houssa M, Scalise E, Pourtois G, Afanas'ev VV, Stesmans A, 2D materials 1, 021004 (2014). http://doi.org/10.1088/2053-1583/1/2/021004
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Functional silicene and stanene nanoribbons compared to graphene: electronic structure and transport”. van den Broek B, Houssa M, Iordanidou K, Pourtois G, Afanas'ev VV, Stesmans A, 2D materials 3, 015001 (2016). http://doi.org/10.1088/2053-1583/3/1/015001
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Comment on 'Integral cross sections for electron impact excitation of electronic states of N2'”. Cenian A, Chernukho A, Bogaerts A, Gijbels R, Journal of physics: B : atomic and molecular physics 35, 5163 (2002). http://doi.org/10.1088/0953-4075/35/24/401
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Special issue on fundamentals of plasmasurface interactions”. Bogaerts A, Neyts EC, Rousseau A, Journal of physics: D: applied physics 47, 220301 (2014). http://doi.org/10.1088/0022-3727/47/22/220301
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Understanding plasma catalysis through modelling and simulation : a review”. Neyts EC, Bogaerts A, Journal of physics: D: applied physics 47, 224010 (2014). http://doi.org/10.1088/0022-3727/47/22/224010
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Glow discharge optical spectroscopy and mass spectrometry”. Bogaerts A John Wiley & Sons, Chichester, page 1 (2016).
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Mathematical modelling of an analytical glow discharge”. Bogaerts A, van Straaten M, Gijbels R KD Marketing Services, Milton Keynes, page 82 (1995).
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Investigation of the electron distribution functions in low pressure electron cyclotron resonance discharges”. Kaganovich I, Misina M, Bogaerts A, Gijbels R Kluwer Academic, Dordrecht, page 543 (1999).
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Modelling of radio frequency capacitively coupled plasma at intermediate pressures”. Berezhnoi S, Kaganovich I, Bogaerts A, Gijbels R Kluwer Academic, Dordrecht, page 525 (1999).
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SIMS/TOF-SIMS study of microparticles: surface analysis, imaging and quantification”. Gijbels R, Verlinden G, Geuens I London Institute of Physics, Bristol, page 331 (2000).
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Analysis and comparison of the co2 and co dielectric barrier discharge solid products”. Belov I, Paulussen S, Bogaerts A, Hakone Xv: International Symposium On High Pressure Low Temperature Plasma Chemistry: With Joint Cost Td1208 Workshop: Non-equilibrium Plasmas With Liquids For Water And Surface Treatment (2016)
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Plasma based co2 conversion: a combined modeling and experimental study”. Bogaerts A, Snoeckx R, Berthelot A, Heijkers S, Wang W, Sun S, Van Laer K, Ramakers M, Michielsen I, Uytdenhouwen Y, Meynen V, Cool P, Hakone Xv: International Symposium On High Pressure Low Temperature Plasma Chemistry: With Joint Cost Td1208 Workshop: Non-equilibrium Plasmas With Liquids For Water And Surface Treatment (2016)
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A comparative study for the inactivation of multidrug resistance bacteria using dielectric barrier discharge and nano-second pulsed plasma”. Hoon Park J, Kumar N, Hoon Park D, Yusupov M, Neyts EC, Verlackt CCW, Bogaerts A, Ho Kang M, Sup Uhm H, Ha Choi E, Attri P;, Scientific reports 5, 13849 (2015). http://doi.org/10.1038/srep13849
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