Author |
Title |
Year |
Publication ![sorted by Publication field, descending order (down)](img/sort_desc.gif) |
Volume |
Times cited |
Additional Links |
Moiseeva, E.O.; Trashin, S.; Korostei, Y.S.; Khan, S.U.; Kosov, A.D.; De Wael, K.; Dubinina, T.V.; Tomilova, L.G. |
Electrochemical and spectroelectrochemical studies of tert-butyl-substituted aluminum phthalocyanine |
2021 |
Polyhedron |
200 |
|
UA library record; WoS full record; WoS citing articles |
van Oeffelen, L.; Van Roy, W.; Idrissi, H.; Charlier, D.; Lagae, L.; Borghs, G. |
Ion current rectification, limiting and overlimiting conductances in nanopores |
2015 |
PLoS ONE |
10 |
11 |
UA library record; WoS full record; WoS citing articles |
Duarte-Neto, P.; Stosic, B.; Stosic, T.; Lessa, R.; Milošević, M.V.; Stanley, H.E. |
Multifractal properties of a closed contour : a peek beyond the shape analysis |
2014 |
PLoS ONE |
9 |
6 |
UA library record; WoS full record; WoS citing articles |
Kamaraj, B.; Bogaerts, A. |
Structure and function of p53-DNA complexes with inactivation and rescue mutations : a molecular dynamics simulation study |
2015 |
PLoS ONE |
10 |
|
UA library record; WoS full record; WoS citing articles |
Domingos, J.L.C.; Peeters, F.M.; Ferreira, W.P. |
Self-assembly and clustering of magnetic peapod-like rods with tunable directional interaction |
2018 |
PLoS ONE |
13 |
|
UA library record; WoS full record; WoS citing articles |
Mannaerts, D.; Faes, E.; Cos, P.; Briedé, J.J.; Gyselaers, W.; Cornette, J.; Gorbanev, Y.; Bogaerts, A.; Spaanderman, M.; Van Craenenbroeck, E.; Jacquemyn, Y.; Torrens, C. |
Oxidative stress in healthy pregnancy and preeclampsia is linked to chronic inflammation, iron status and vascular function |
2018 |
PLoS ONE |
13 |
15 |
UA library record; WoS full record; WoS citing articles |
Smits, M.; Vanpachtenbeke, F.; Horemans, B.; De Wael, K.; Hauchecorne, B.; Van Langenhove, H.; Demeestere, K.; Lenaerts, S. |
Effect of operating and sampling conditions on the exhaust gas composition of small-scale power generators |
2012 |
PLoS ONE |
7 |
5 |
UA library record; WoS full record; WoS citing articles |
Tilleman, L.; De Henau, S.; Pauwels, M.; Nagy, N.; Pintelon, I.; Braeckman, B.P.; De Wael, K.; Van Doorslaer, S.; Adriaensen, D.; Timmermans, J.-P.; Moens, L.; Dewilde, S. |
An N-myristoylated globin with a redox-sensing function that regulates the defecation cycle in Caenorhabditis elegans |
2012 |
PLoS ONE |
7 |
6 |
UA library record; WoS full record; WoS citing articles |
Wambacq, E.; Alloul, A.; Grunert, O.; Carrette, J.; Vermeir, P.; Spanoghe, J.; Sakarika, M.; Vlaeminck, S.E.; Haesaert, G. |
Aerobes and phototrophs as microbial organic fertilizers : exploring mineralization, fertilization and plant protection features |
2022 |
PLoS ONE |
17 |
|
UA library record; WoS full record; WoS citing articles |
Gielis, J.; Caratelli, D.; Fougerolle, Y.; Ricci, P.E.; Tavkelidze, I.; Gerats, T. |
Universal natural shapes : from unifying shape description to simple methods for shape analysis and boundary value problems |
2012 |
PLoS ONE |
7 |
|
UA library record; WoS full record; WoS citing articles |
Bjørnåvold, A.; David, M.; Mermet-Bijon, V.; Beaumais, O.; Crastes dit Sourd, R.; Van Passel, S.; Martinet, V. |
To tax or to ban? A discrete choice experiment to elicit public preferences for phasing out glyphosate use in agriculture |
2023 |
PLoS ONE |
18 |
|
UA library record; WoS full record; WoS citing articles |
Borah, R.; Kumar, A.; Samantaray, M.; Desai, A.; Tseng, F.-G. |
Photothermal heating of Au nanorods and nanospheres : temperature characteristics and strength of convective forces |
2023 |
Plasmonics |
18 |
|
UA library record; WoS full record; WoS citing articles |
Kolev, S.; Bogaerts, A. |
A 2D model for a gliding arc discharge |
2015 |
Plasma sources science and technology |
24 |
34 |
UA library record; WoS full record; WoS citing articles |
Bultinck, E.; Bogaerts, A. |
Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model |
2011 |
Plasma sources science and technology |
20 |
7 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A. |
Comprehensive modelling network for dc glow discharges in argon |
1999 |
Plasma sources science and technology |
8 |
27 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. |
Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges |
2010 |
Plasma sources science and technology |
19 |
116 |
UA library record; WoS full record; WoS citing articles |
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. |
Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations |
2011 |
Plasma sources science and technology |
20 |
38 |
UA library record; WoS full record; WoS citing articles |
Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. |
Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis |
2015 |
Plasma sources science and technology |
24 |
11 |
UA library record; WoS full record; WoS citing articles |
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. |
Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges |
2013 |
Plasma sources science and technology |
22 |
20 |
UA library record; WoS full record; WoS citing articles |
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
Kozák, T.; Bogaerts, A. |
Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model |
2015 |
Plasma sources science and technology |
24 |
100 |
UA library record; WoS full record; WoS citing articles |
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. |
Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux |
2005 |
Plasma sources science and technology |
14 |
9 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A. |
Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model |
2006 |
Plasma sources science and technology |
15 |
35 |
UA library record; WoS full record; WoS citing articles |