Vereecke, G.; De Coster, H.; Van Alphen, S.; Carolan, P.; Bender, H.; Willems, K.; Ragnarsson, L.-A.; Van Dorpe, P.; Horiguchi, N.; Holsteyns, F. |
Wet etching of TiN in 1-D and 2-D confined nano-spaces of FinFET transistors |
2018 |
Microelectronic engineering |
200 |
|
UA library record; WoS full record; WoS citing articles |