Author |
Title |
Year |
Publication ![sorted by Publication field, descending order (down)](img/sort_desc.gif) |
Volume |
Times cited |
Additional Links |
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
Zhang, Y.-R.; Xu, X.; Zhao, S.-X.; Bogaerts, A.; Wang, Y.-N. |
Comparison of electrostatic and electromagnetic simulations for very high frequency plasmas |
2010 |
Physics of plasmas |
17 |
30 |
UA library record; WoS full record; WoS citing articles |
Si, X.-J.; Zhao, S.-X.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulations of frequency effects on nonlinear harmonics in inductively coupled plasma |
2011 |
Physics of plasmas |
18 |
7 |
UA library record; WoS full record; WoS citing articles |
Zhang, Q.-Z.; Zhao, S.-X.; Jiang, W.; Wang, Y.-N. |
Separate control between geometrical and electrical asymmetry effects in capacitively coupled plasmas |
2012 |
Journal of physics: D: applied physics |
45 |
20 |
UA library record; WoS full record; WoS citing articles |
Zhao, S.-X.; Zhang, Y.-R.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Bulk plasma fragmentation in a C4F8 inductively coupled plasma : a hybrid modelling study |
2015 |
Journal of applied physics |
117 |
11 |
UA library record; WoS full record; WoS citing articles |
Zhao, S.-X.; Gao, F.; Wang, Y.-P.; Wang, Y.-N.; Bogaerts, A. |
Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled plasma |
2015 |
Journal of applied physics |
118 |
1 |
UA library record; WoS full record; WoS citing articles |
Fei, G.; Xue-Chun, L.; Zhao, S.-X.; You-Nian, W. |
Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition |
2012 |
Chinese physics B |
21 |
11 |
UA library record; WoS full record; WoS citing articles |