Home
<<
1
>>
List View
|
Citations
|
Details
Author
Title
Year
Publication
Volume
Times cited
Additional Links
Tinck, S.
;
De Schepper, P.
;
Bogaerts, A.
Numerical investigation of SiO
2
coating deposition in wafer processing reactors with SiCl
4
/O
2
/Ar inductively coupled plasmas
2013
Plasma processes and polymers
10
3
UA library record
;
WoS full record
;
WoS citing articles