|
Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
Buschmann, V.; Rodewald, M.; Fuess, H.; Van Tendeloo, G.; Schäffer, C. |
High resolution electron microscopy study of molecular beam epitaxy grown CoSi2/Si1-xGex/Si(100) heterostructurs |
1999 |
Journal of applied physics |
85 |
6 |
UA library record; WoS full record; WoS citing articles |
|
|
Buschmann, V.; Rodewald, M.; Fuess, H.; Van Tendeloo, G.; Schaffer, C. |
Hetero-epitaxial growth of CoSi2 thin films on Si(100) : template effects and epitaxial orientations |
1998 |
Journal of crystal growth |
191 |
6 |
UA library record; WoS full record; WoS citing articles |
|