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Comprehensive description of a Grimm-type glow discharge source used for optical emission spectrometry: a mathematical simulation”. Bogaerts A, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 53, 437 (1998). http://doi.org/10.1016/S0584-8547(97)00148-1
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Description of the thermalization process of the sputtered atoms in a glow discharge using a 3-dimensional Monte Carlo method”. Bogaerts A, van Straaten M, Gijbels R, Journal of applied physics 77, 1868 (1995). http://doi.org/10.1063/1.358887
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Effects of adding hydrogen to an argon glow discharge: overview of relevant processes and some qualitative explanations”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 15, 441 (2000). http://doi.org/10.1039/a909779a
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The glow discharge: an exciting plasma”. Bogaerts A, Journal of analytical atomic spectrometry 14, 1375 (1999). http://doi.org/10.1039/a900772e
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Hybrid Monte Carlo-fluid model for a microsecond pulsed glow discharge”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 15, 895 (2000). http://doi.org/10.1039/b003398g
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Hybrid Monte Carlo-fluid model of a direct current glow discharge”. Bogaerts A, Gijbels R, Goedheer W, Journal of applied physics 78, 2233 (1995). http://doi.org/10.1063/1.360139
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Improved hybrid Monte Carlo-fluid model for the electrical characteristics in an analytical radiofrequency glow discharge in argon”. Bogaerts A, Gijbels R, Goedheer W, Journal of analytical atomic spectrometry 16, 750 (2001). http://doi.org/10.1039/b103768b
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Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 16, 239 (2001). http://doi.org/10.1039/b009289o
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Modeling of argon direct current glow discharges and comparison with experiment: how good is the agreement?”.Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 13, 945 (1998). http://doi.org/10.1039/a800329g
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Modeling of glow discharge optical emission spectrometry: calculation of the argon atomic optical emission spectrum”. Bogaerts A, Gijbels R, Vlcek J, Spectrochimica acta: part B : atomic spectroscopy 53, 1517 (1998). http://doi.org/10.1016/S0584-8547(98)00139-6
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Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge”. Bogaerts A, Yan M, Gijbels R, Goedheer W, Journal of applied physics 86, 2990 (1999). http://doi.org/10.1063/1.371159
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Monte Carlo simulation of an analytical glow discharge: motion of electrons, ions and fast neutrals in the cathode dark space”. Bogaerts A, van Straaten M, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 50, 179 (1995). http://doi.org/10.1016/0584-8547(94)00117-E
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The role of fast argon ions and atoms in the ionization of argon in a direct current glow discharge: a mathematical simulation”. Bogaerts A, Gijbels R, Journal of applied physics 78, 6427 (1995). http://doi.org/10.1063/1.360526
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Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model”. Bogaerts A, Gijbels R, Journal of applied physics 79, 1279 (1996). http://doi.org/10.1063/1.361023
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Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description”. Bogaerts A, Gijbels R, Journal of applied physics 86, 4124 (1999). http://doi.org/10.1063/1.371337
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Similarities and differences between direct current and radio-frequency glow discharges: a mathematical simulation”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 15, 1191 (2000). http://doi.org/10.1039/b000519n
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Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4”. Yan M, Bogaerts A, Gijbels R, Goedheer WJ, Journal of applied physics 87, 3628 (2000). http://doi.org/10.1063/1.372392
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Two-dimensional model of a direct current glow discharge : description of the argon metastable atoms, sputtered atoms and ions”. Bogaerts A, Gijbels R, Analytical chemistry 68, 2676 (1996). http://doi.org/10.1021/ac951206z
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Two-dimensional model of a direct current glow discharge: description of the electrons, argon ions and fast argon atoms”. Bogaerts A, Gijbels R, Goedheer WJ, Analytical chemistry 68, 2296 (1996). http://doi.org/10.1021/ac9510651
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Effect of small amounts of hydrogen added to argon glow discharges: hybrid Monte-Carlo-fluid model”. Bogaerts A, Gijbels R, Physical review : E : statistical, nonlinear, and soft matter physics 65, 056402 (2002). http://doi.org/10.1103/PhysRevE.65.056402
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Electron anisotropic scattering in gases: a formula for Monte Carlo simulations”. Okhrimovskyy A, Bogaerts A, Gijbels R, Physical review : E : statistical, nonlinear, and soft matter physics 65, 037402 (2002). http://doi.org/10.1103/PhysRevE.65.037402
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Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment”. Bogaerts A, Naylor J, Hatcher M, Jones WJ, Mason R, Journal of vacuum science and technology: A: vacuum surfaces and films 16, 2400 (1998). http://doi.org/10.1116/1.581359
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Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge”. Yan M, Bogaerts A, Gijbels R, Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 63 (2001). http://doi.org/10.1103/PhysRevE.63.026405
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Local and fast relaxation phenomena after laser-induced photodetachment in a strongly electronegative rf discharge”. Yan M, Bogaerts A, Gijbels R, Goedheer WJ, Physical review : E : statistical, nonlinear, and soft matter physics 65, 016408 (2002). http://doi.org/10.1103/PhysRevE.65.016408
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Modeling of metastable argon atoms in a direct current glow discharge”. Bogaerts A, Gijbels R, Physical review : A : atomic, molecular and optical physics 52, 3743 (1995). http://doi.org/10.1103/PhysRevA.52.3743
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Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge”. Bogaerts A, Gijbels R, IEEE transactions on plasma science 27, 1406 (1999). http://doi.org/10.1109/27.799819
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Semianalytical description of nonlocal secondary electrons in a radio-frequency capacitively coupled plasma at intermediate pressures”. Berezhnoi S, Kaganovich I, Misina M, Bogaerts A, Gijbels R, IEEE transactions plasma science 27, 1339 (1999). http://doi.org/10.1109/27.799810
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Comprehensive modelling network for dc glow discharges in argon”. Bogaerts A, Plasma sources science and technology 8, 210 (1999). http://doi.org/10.1088/0963-0252/8/2/003
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
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