Number of records found: 1296
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Citations
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Monte Carlo simulation of an analytical glow discharge: motion of electrons, ions and fast neutrals in the cathode dark space”. Bogaerts A, van Straaten M, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 50, 179 (1995). http://doi.org/10.1016/0584-8547(94)00117-E
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The role of fast argon ions and atoms in the ionization of argon in a direct current glow discharge: a mathematical simulation”. Bogaerts A, Gijbels R, Journal of applied physics 78, 6427 (1995). http://doi.org/10.1063/1.360526
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Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model”. Bogaerts A, Gijbels R, Journal of applied physics 79, 1279 (1996). http://doi.org/10.1063/1.361023
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Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description”. Bogaerts A, Gijbels R, Journal of applied physics 86, 4124 (1999). http://doi.org/10.1063/1.371337
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Similarities and differences between direct current and radio-frequency glow discharges: a mathematical simulation”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 15, 1191 (2000). http://doi.org/10.1039/b000519n
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Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4”. Yan M, Bogaerts A, Gijbels R, Goedheer WJ, Journal of applied physics 87, 3628 (2000). http://doi.org/10.1063/1.372392
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Structures and thermochemistry of B3N3 and B4N4”. Martin JML, El-Yazal J, François JP, Gijbels R, Chemical physics letters 232, 289 (1995). http://doi.org/10.1016/0009-2614(94)01336-T
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Surface analysis of halide distributions in complex AgX microcrystals by imaging time-of-flight SIMS (TOF-SIMS)”. Verlinden G, Gijbels R, Geuens I, de Keyzer R, Journal of analytical atomic spectrometry 14, 429 (1999). http://doi.org/10.1039/a807276k
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Three-dimensional chemical characterization of complex silver halide microcrystals by scanning ion microprobe mass analysis”. Verlinden G, Janssens G, Gijbels R, van Espen P, Geuens I, Analytical chemistry 69, 3773 (1997). http://doi.org/10.1021/ac970010r
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Two-dimensional model of a direct current glow discharge : description of the argon metastable atoms, sputtered atoms and ions”. Bogaerts A, Gijbels R, Analytical chemistry 68, 2676 (1996). http://doi.org/10.1021/ac951206z
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Two-dimensional model of a direct current glow discharge: description of the electrons, argon ions and fast argon atoms”. Bogaerts A, Gijbels R, Goedheer WJ, Analytical chemistry 68, 2296 (1996). http://doi.org/10.1021/ac9510651
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XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers”. Conard T, de Witte H, Loo R, Verheyen P, Vandervorst W, Caymax M, Gijbels R, Thin solid films : an international journal on the science and technology of thin and thick films 343/344, 583 (1999). http://doi.org/10.1016/S0040-6090(99)00122-4
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Effect of small amounts of hydrogen added to argon glow discharges: hybrid Monte-Carlo-fluid model”. Bogaerts A, Gijbels R, Physical review : E : statistical, nonlinear, and soft matter physics 65, 056402 (2002). http://doi.org/10.1103/PhysRevE.65.056402
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Electron anisotropic scattering in gases: a formula for Monte Carlo simulations”. Okhrimovskyy A, Bogaerts A, Gijbels R, Physical review : E : statistical, nonlinear, and soft matter physics 65, 037402 (2002). http://doi.org/10.1103/PhysRevE.65.037402
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Electron Boltzmann kinetic equation averaged over fast electron bouncing and pitch-angle scattering for fast modeling of electron cyclotron resonance discharge”. Kaganovich I, Misina M, Berezhnoi S, Gijbels R, Physical review : E : statistical, nonlinear, and soft matter physics 61, 1875 (2000). http://doi.org/10.1103/PhysRevE.61.1875
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Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment”. Bogaerts A, Naylor J, Hatcher M, Jones WJ, Mason R, Journal of vacuum science and technology: A: vacuum surfaces and films 16, 2400 (1998). http://doi.org/10.1116/1.581359
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Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge”. Yan M, Bogaerts A, Gijbels R, Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 63 (2001). http://doi.org/10.1103/PhysRevE.63.026405
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Local and fast relaxation phenomena after laser-induced photodetachment in a strongly electronegative rf discharge”. Yan M, Bogaerts A, Gijbels R, Goedheer WJ, Physical review : E : statistical, nonlinear, and soft matter physics 65, 016408 (2002). http://doi.org/10.1103/PhysRevE.65.016408
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Modeling of metastable argon atoms in a direct current glow discharge”. Bogaerts A, Gijbels R, Physical review : A : atomic, molecular and optical physics 52, 3743 (1995). http://doi.org/10.1103/PhysRevA.52.3743
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Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on wafer surfaces”. de Witte H, de Gendt S, Douglas M, Conard T, Kenis K, Mertens PW, Vandervorst W, Gijbels R, Journal of the electrochemical society 147, 13 (2000). http://doi.org/10.1149/1.1393457
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Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge”. Bogaerts A, Gijbels R, IEEE transactions on plasma science 27, 1406 (1999). http://doi.org/10.1109/27.799819
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Semianalytical description of nonlocal secondary electrons in a radio-frequency capacitively coupled plasma at intermediate pressures”. Berezhnoi S, Kaganovich I, Misina M, Bogaerts A, Gijbels R, IEEE transactions plasma science 27, 1339 (1999). http://doi.org/10.1109/27.799810
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Comprehensive modelling network for dc glow discharges in argon”. Bogaerts A, Plasma sources science and technology 8, 210 (1999). http://doi.org/10.1088/0963-0252/8/2/003
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
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New developments and applications in GDMS”. Bogaerts A, Gijbels R, Fresenius' journal of analytical chemistry 364, 367 (1999). http://doi.org/10.1007/s002160051352
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Recent trends in solids mass spectrometry: GDMS and other methods”. Gijbels R, Bogaerts A, Fresenius' journal of analytical chemistry 359, 326 (1997). http://doi.org/10.1007/s002160050581
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SIMS analysis of oxynitrides: evidence for nitrogen diffusion induced by oxygen flooding”. de Witte H, Conard T, Vandervorst W, Gijbels R, Surface and interface analysis 29, 761 (2000). http://doi.org/10.1002/1096-9918(200011)29:11<761::AID-SIA926>3.0.CO;2-F
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Three-dimensional modeling of a direct current glow discharge in argon: is it better than one-dimensional modeling?”.Bogaerts A, Gijbels R, Fresenius' journal of analytical chemistry 359, 331 (1997). http://doi.org/10.1007/s002160050582
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Calculation of the gas flow and its effect on the plasma characteristics for a modified Grimm-type glow discharge cell”. Bogaerts A, Okhrimovskyy A, Gijbels R, Journal of analytical atomic spectrometry 17, 1076 (2002). http://doi.org/10.1039/b200746k
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