Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Milants, K.; Verheyden, J.; Barancira, T.; Deweerd, W.; Pattyn, H.; Bukshpan, S.; Williamson, D.L.; Vermeiren, F.; Van Tendeloo, G.; Vlekken, C.; Libbrecht, S.; van Haesendonck, C. |
Size distribution and magnetic behavior of lead inclusions in silicon single crystals |
1997 |
Journal of applied physics |
81 |
8 |
UA library record; WoS full record; WoS citing articles |
Chu, D.P.; Peeters, F.M.; Kolodinski, S.; Roca, E. |
Theoretical investigation of CoSi2/Si1-xGex detectors: influence of a Si tunneling barrier on the electro-optical characteristics |
1996 |
Journal of applied physics |
79 |
3 |
UA library record; WoS full record; WoS citing articles |
Herrebout, D.; Bogaerts, A.; Yan, M.; Goedheer, W.; Dekempeneer, E.; Gijbels, R. |
1D fluid model for an rf methane plasma of interest in deposition of diamond-like carbon layers |
2001 |
Journal of applied physics |
90 |
83 |
UA library record; WoS full record; WoS citing articles |
Chang, K.; Peeters, F.M. |
Asymmetric stark shifts in InGaAs/GaAs near-surface quantum wells: the image charge effect |
2000 |
Journal of applied physics |
88 |
20 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R.; Serikov, V.V. |
Calculation of gas heating in direct current argon glow discharges |
2000 |
Journal of applied physics |
87 |
63 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R.; Vlcek, J. |
Collisional-radiative model for an argon glow discharge |
1998 |
Journal of applied physics |
84 |
138 |
UA library record; WoS full record; WoS citing articles |
Ivanov, V.; Proshina, O.; Rakhimova, T.; Rakhimov, A.; Herrebout, D.; Bogaerts, A. |
Comparison of a one-dimensional particle-in-cell-Monte Carlo model and a one-dimensional fluid model for a CH4/H2 capacitively coupled radio frequency discharge |
2002 |
Journal of applied physics |
91 |
26 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; van Straaten, M.; Gijbels, R. |
Description of the thermalization process of the sputtered atoms in a glow discharge using a 3-dimensional Monte Carlo method |
1995 |
Journal of applied physics |
77 |
87 |
UA library record; WoS full record; WoS citing articles |
Reijniers, J.; Peeters, F.M. |
Diffusive transport in the hybrid Hall effect device |
2000 |
Journal of applied physics |
87 |
12 |
UA library record; WoS full record; WoS citing articles |
Pokatilov, E.P.; Fomin, V.M.; Balaban, S.N.; Gladilin, V.N.; Klimin, S.N.; Devreese, J.T.; Magnus, W.; Schoenmaker, W.; Collaert, N.; van Rossum, M.; de Meyer, K. |
Distribution of fields and charge carriers in cylindrical nanosize silicon-based metal-oxide-semiconductor structures |
1999 |
Journal Of Applied Physics |
85 |
16 |
UA library record; WoS full record; WoS citing articles |
Buschmann, V.; Rodewald, M.; Fuess, H.; Van Tendeloo, G.; Schäffer, C. |
High resolution electron microscopy study of molecular beam epitaxy grown CoSi2/Si1-xGex/Si(100) heterostructurs |
1999 |
Journal of applied physics |
85 |
6 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Hybrid Monte Carlo-fluid model of a direct current glow discharge |
1995 |
Journal of applied physics |
78 |
117 |
UA library record; WoS full record; WoS citing articles |
Teodorescu, V.; Nistor, L.; Bender, H.; Steegen, A.; Lauwers, A.; Maex, K.; van Landuyt, J. |
In situ transmission electron microscopy study of Ni silicide phases formed on (001) Si active lines |
2001 |
Journal of applied physics |
90 |
97 |
UA library record; WoS full record; WoS citing articles |
Das, A.; Gordon, I.; Wagner, P.; Cannaerts, M.; Moshchalkov, V.V.; Bruynseraede, Y.; Schuddinck, W.; Van Tendeloo, G.; Borghs, G. |
Influence of the morphology on the magneto-transport properties of laser-ablated ultrathin La0.7Ba0.3MnO3 films |
2001 |
Journal of applied physics |
90 |
2 |
UA library record; WoS full record; WoS citing articles |
Hai, G.-Q.; Studart, N.; Peeters, F.M.; Koenraad, P.M.; Wolter, J.H. |
Intersubband-coupling and screening effects on the electron transport in a quasi-two-dimensional δ-doped semiconductor system |
1996 |
Journal of applied physics |
80 |
40 |
UA library record; WoS full record; WoS citing articles |
Laffez, P.; Van Tendeloo, G.; Seshadri, R.; Hervieu, M.; Martin, C.; Maignan, A.; Raveau, B. |
Microstructural and physical properties of layered manganite oxides related to the magnetoresistive perovskites |
1996 |
Journal of applied physics |
80 |
36 |
UA library record; WoS full record; WoS citing articles |
de Witte, H.; Vandervorst, W.; Gijbels, R. |
Modeling of bombardment induced oxidation of silicon |
2001 |
Journal of applied physics |
89 |
16 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
Gryse, O.D.; Clauws, P.; van Landuyt, J.; Lebedev, O.; Claeys, C.; Simoen, E.; Vanhellemont, J. |
Oxide phase determination in silicon using infrared spectroscopy and transmission electron microscopy techniques |
2002 |
Journal of applied physics |
91 |
27 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
The role of fast argon ions and atoms in the ionization of argon in a direct current glow discharge: a mathematical simulation |
1995 |
Journal of applied physics |
78 |
60 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model |
1996 |
Journal of applied physics |
79 |
81 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description |
1999 |
Journal of applied physics |
86 |
50 |
UA library record; WoS full record; WoS citing articles |
Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4 |
2000 |
Journal of applied physics |
87 |
14 |
UA library record; WoS full record; WoS citing articles |
Bernaerts, D.; Van Tendeloo, G.; Amelinckx, S.; Hevesi, K.; Gensterblum, G.; Yu, L.M.; Pireaux, J.J.; Grey, F.; Bohr, J. |
Structural defects and epitaxial rotation of C60 and C70 (111) films on GeS(001) |
1996 |
Journal of applied physics |
80 |
6 |
UA library record; WoS full record; WoS citing articles |
Lebedev, O.I.; Hamet, J.F.; Van Tendeloo, G.; Beaumont, V.; Raveau, B. |
Structure and properties of the YBa2Cu3O7-x/LaAlO3 superlattices |
2001 |
Journal of applied physics |
90 |
13 |
UA library record; WoS full record; WoS citing articles |
Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. |
Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model |
2002 |
Journal of applied physics |
92 |
15 |
UA library record; WoS full record; WoS citing articles |
Cornelissens, Y.G.; Peeters, F.M. |
Response function of a Hall magnetosensor in the diffusive regime |
2002 |
Journal of applied physics |
92 |
24 |
UA library record; WoS full record; WoS citing articles |
Ignatova, V.A.; Lebedev, O.I.; Watjen, U.; van Vaeck, L.; van Landuyt, J.; Gijbels, R.; Adams, F. |
Metal and composite nanocluster precipitate formation in silicon dioxide implanted with Sb+ ions |
2002 |
Journal of applied physics |
92 |
5 |
UA library record; WoS full record; WoS citing articles |
Tadić, M.; Peeters, F.M.; Janssens, K.L.; Korkusinski, M.; Hawrylak, P. |
Strain and band edges in single and coupled cylindrical InAs/GaAs and InP/InGaP self-assembled quantum dots |
2002 |
Journal of applied physics |
92 |
73 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Hybrid modeling network for a helium-argon-copper hollow cathode discharge used for laser applications |
2002 |
Journal of applied physics |
92 |
24 |
UA library record; WoS full record; WoS citing articles |