List View
 |   | 
   web
Author Title Year Publication Volume Times cited Additional Links
Vandelannoote, R.; Van 't dack, L.; Gijbels, R. Trace element and micro-mineral composition of some selected anhydrite samples from the Saint Ghislain drill hole (Hainaut, Belgium) 1986 Bulletin van de Belgische Vereniging voor Geologie 95 UA library record
Gijbels, R.; van Grieken, R.; Blommaert, W.; Vandelannoote, R.; Van 't dack, L. Application of trace element analysis to geothermal waters 1977 UA library record
Gijbels, R. Chemical analysis in metal processing: overview and future needs in refined and ultrapure metals 1991 Acta technica Belgica: metallurgie 30 UA library record
Belov, I.; Paulussen, S.; Bogaerts, A. Analysis and comparison of the co2 and co dielectric barrier discharge solid products 2016 Hakone Xv: International Symposium On High Pressure Low Temperature Plasma Chemistry: With Joint Cost Td1208 Workshop: Non-equilibrium Plasmas With Liquids For Water And Surface Treatment UA library record; WoS full record
Bogaerts, A.; Snoeckx, R.; Berthelot, A.; Heijkers, S.; Wang, W.; Sun, S.; Van Laer, K.; Ramakers, M.; Michielsen, I.; Uytdenhouwen, Y.; Meynen, V.; Cool, P. Plasma based co2 conversion: a combined modeling and experimental study 2016 Hakone Xv: International Symposium On High Pressure Low Temperature Plasma Chemistry: With Joint Cost Td1208 Workshop: Non-equilibrium Plasmas With Liquids For Water And Surface Treatment UA library record; WoS full record
Kolev, S.; Bogaerts, A. A 2D model for a gliding arc discharge 2015 Plasma sources science and technology 24 34 UA library record; WoS full record; WoS citing articles
Yusupov, M.; Neyts, E.C.; Khalilov, U.; Snoeckx, R.; van Duin, A.C.T.; Bogaerts, A. Atomic-scale simulations of reactive oxygen plasma species interacting with bacterial cell walls 2012 New journal of physics 14 47 UA library record; WoS full record; WoS citing articles
Yusupov, M.; Bultinck, E.; Depla, D.; Bogaerts, A. Behavior of electrons in a dual-magnetron sputter deposition system : a Monte Carlo model 2011 New journal of physics 13 12 UA library record; WoS full record; WoS citing articles
Bultinck, E.; Bogaerts, A. Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model 2011 Plasma sources science and technology 20 7 UA library record; WoS full record; WoS citing articles
Cenian, A.; Chernukho, A.; Bogaerts, A.; Gijbels, R. Comment on 'Integral cross sections for electron impact excitation of electronic states of N2' 2002 Journal of physics: B : atomic and molecular physics 35 2 UA library record; WoS full record; WoS citing articles
Bogaerts, A. Comprehensive modelling network for dc glow discharges in argon 1999 Plasma sources science and technology 8 27 UA library record; WoS full record; WoS citing articles
Tinck, S.; Bogaerts, A. Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition 2011 Plasma sources science and technology 20 11 UA library record; WoS full record; WoS citing articles
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges 2010 Plasma sources science and technology 19 116 UA library record; WoS full record; WoS citing articles
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations 2011 Plasma sources science and technology 20 38 UA library record; WoS full record; WoS citing articles
Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis 2015 Plasma sources science and technology 24 11 UA library record; WoS full record; WoS citing articles
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma 2012 Plasma sources science and technology 21 23 UA library record; WoS full record; WoS citing articles
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges 2013 Plasma sources science and technology 22 20 UA library record; WoS full record; WoS citing articles
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges 2000 Plasma sources science and technology 9 21 UA library record; WoS full record; WoS citing articles
Scalise, E.; Houssa, M.; Cinquanta, E.; Grazianetti, C.; van den Broek, B.; Pourtois, G.; Stesmans, A.; Fanciulli, M.; Molle, A. Engineering the electronic properties of silicene by tuning the composition of MoX2 and GaX (X = S,Se,Te) chalchogenide templates 2014 2D materials 1 49 UA library record; WoS full record; WoS citing articles
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation 2013 Plasma sources science and technology 22 13 UA library record; WoS full record; WoS citing articles
Kozák, T.; Bogaerts, A. Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model 2015 Plasma sources science and technology 24 100 UA library record; WoS full record; WoS citing articles
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 2013 Plasma sources science and technology 22 11 UA library record; WoS full record; WoS citing articles
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas 2013 Plasma sources science and technology 22 9 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux 2005 Plasma sources science and technology 14 9 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Gijbels, R. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces 2002 Plasma sources science and technology 11 51 UA library record; WoS full record; WoS citing articles
Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. Modeling of a dielectric barrier discharge used as a flowing chemical reactor 2008 Journal of physics : conference series 133 6 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Aerts, R.; Snoeckx, R.; Somers, W.; Van Gaens, W.; Yusupov, M.; Neyts, E. Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications 2012 Journal of physics : conference series 399 7 UA library record; WoS full record; WoS citing articles
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles
de Bleecker, K.; Bogaerts, A.; Goedheer, W. Modelling of nanoparticle coagulation and transport dynamics in dusty silane discharges 2006 New journal of physics 8 20 UA library record; WoS full record; WoS citing articles
Van Gaens, W.; Iseni, S.; Schmidt-Bleker, A.; Weltmann, K.-D.; Reuter, S.; Bogaerts, A. Numerical analysis of the effect of nitrogen and oxygen admixtures on the chemistry of an argon plasma jet operating at atmospheric pressure 2015 New journal of physics 17 29 UA library record; WoS full record; WoS citing articles