List View
 |   | 
   web
Author Title Year Publication Volume Times cited Additional Links
Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis 2015 Plasma sources science and technology 24 11 UA library record; WoS full record; WoS citing articles
Berdiyorov, G.; Harrabi, K.; Maneval, J.P.; Peeters, F.M. Effect of pinning on the response of superconducting strips to an external pulsed current 2015 Superconductor science and technology 28 19 UA library record; WoS full record; WoS citing articles
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma 2012 Plasma sources science and technology 21 23 UA library record; WoS full record; WoS citing articles
Milošević, M.M.; Tadić, M.; Peeters, F.M. Effects of lateral asymmetry on electronic structure of strained semiconductor nanorings in a magnetic field 2008 Nanotechnology 19 11 UA library record; WoS full record; WoS citing articles
Schulze, A.; Hantschel, T.; Dathe, A.; Eyben, P.; Ke, X.; Vandervorst, W. Electrical tomography using atomic force microscopy and its application towards carbon nanotube-based interconnects 2012 Nanotechnology 23 29 UA library record; WoS full record; WoS citing articles
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges 2013 Plasma sources science and technology 22 20 UA library record; WoS full record; WoS citing articles
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges 2000 Plasma sources science and technology 9 21 UA library record; WoS full record; WoS citing articles
Dixit, H.; Tandon, N.; Cottenier, S.; Saniz, R.; Lamoen, D.; Partoens, B.; van Speybroeck, V.; Waroquier, M. Electronic structure and band gap of zinc spinel oxides beyond LDA : ZnAl2O4, ZnGa2O4 and ZnIn2O4 2011 New journal of physics 13 98 UA library record; WoS full record; WoS citing articles
Scalise, E.; Houssa, M.; Cinquanta, E.; Grazianetti, C.; van den Broek, B.; Pourtois, G.; Stesmans, A.; Fanciulli, M.; Molle, A. Engineering the electronic properties of silicene by tuning the composition of MoX2 and GaX (X = S,Se,Te) chalchogenide templates 2014 2D materials 1 49 UA library record; WoS full record; WoS citing articles
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation 2013 Plasma sources science and technology 22 13 UA library record; WoS full record; WoS citing articles
Kozák, T.; Bogaerts, A. Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model 2015 Plasma sources science and technology 24 100 UA library record; WoS full record; WoS citing articles
Escoffier, W.; Grigorieva, I.V.; Misko, V.R.; Baelus, B.J.; Peeters, F.M.; Vinnikov, L.Y.; Dubnos, S. Formation of vortex clusters and giant vortices in mesoscopic superconducting disks with strong disorder 2008 Journal of physics : conference series 97 UA library record; WoS full record
Misko, V.R.; Zhao, H.J.; Peeters, F.M.; Oboznov, V.; Dubonos, S.V.; Grigorieva, I.V. Formation of vortex shells in mesoscopic superconducting squares 2009 Superconductor science and technology 22 14 UA library record; WoS full record; WoS citing articles
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 2013 Plasma sources science and technology 22 11 UA library record; WoS full record; WoS citing articles
Engbarth, M.; Milošević, M.V.; Bending, S.J.; Nasirpouri, F. Geometry-guided flux behaviour in superconducting Pb microcrystals 2009 Journal of physics : conference series 150 1 UA library record
Kapra, A.V.; Misko, V.R.; Vodolazov, D.Y.; Peeters, F.M. The guidance of vortex-antivortex pairs by in-plane magnetic dipoles in a superconducting finite-size film 2011 Superconductor science and technology 24 28 UA library record; WoS full record; WoS citing articles
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas 2013 Plasma sources science and technology 22 9 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux 2005 Plasma sources science and technology 14 9 UA library record; WoS full record; WoS citing articles
Nistor, L.; Bender, H.; van Landuyt, J.; Nemeth, S.; Boeve, H.; De Boeck, J.; Borghs, G. HREM investigation of a Fe/GaN/Fe tunnel junction 2001 Institute of physics conference series T2 – Royal-Microscopical-Society Conference on Microscopy of Semiconducting, Materials, MAR 25-29, 2001, Univ of Oxford, Oxford, England UA library record; WoS full record;
Berdiyorov, G.R.; Savel'ev, S.E.; Kusmartsev, F.V.; Peeters, F.M. In-phase motion of Josephson vortices in stacked SNS Josephson junctions : effect of ordered pinning 2013 Superconductor science and technology 26 5 UA library record; WoS full record; WoS citing articles
Silhanek, A.V.; Leo, A.; Grimaldi, G.; Berdiyorov, G.R.; Milošević, M.V.; Nigro, A.; Pace, S.; Verellen, N.; Gillijns, W.; Metlushko, V.; Ilić, B.; Zhu, X.; Moshchalkov, V.V.; Influence of artificial pinning on vortex lattice instability in superconducting films 2012 New journal of physics 14 40 UA library record; WoS full record; WoS citing articles
Molina, L.; Egoavil, R.; Turner, S.; Thersleff, T.; Verbeeck, J.; Holzapfel, B.; Eibl, O.; Van Tendeloo, G. Interlayer structure in YBCO-coated conductors prepared by chemical solution deposition 2013 Superconductor science and technology 26 11 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Gijbels, R. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces 2002 Plasma sources science and technology 11 51 UA library record; WoS full record; WoS citing articles
Verbist, K.; Lebedev, O.I.; Van Tendeloo, G.; Verhoeven, M.A.J.; Rijnders, A.J.H.M.; Blank, D.H.A. Low- or high-angle Ar ion-beam etching to create ramp-type Josephson junctions 1996 Superconductor science and technology 9 10 UA library record; WoS full record; WoS citing articles
Masir, M.R.; Vasilopoulos, P.; Peeters, F.M. Magnetic Kronig-Penney model for Dirac electrons in single-layer graphene 2009 New journal of physics 11 89 UA library record; WoS full record; WoS citing articles
Verbist, K.; Lebedev, O.I.; Verhoeven, M.A.J.; Winchern, R.; Rijnders, A.J.H.M.; Blank, D.H.A.; Tafuri, F.; Bender, H.; Van Tendeloo, G. Microstructure of YBa2Cu3O7-\delta Josephson junctions in relation to their properties 1998 Superconductor science and technology 11 UA library record; WoS full record; WoS citing articles
Vasiliev, A.L.; Van Tendeloo, G.; Boikov, Y.; Olsson, E.; Ivanov, S. Microstructure of YBa2Cu3O7-x films on buffered Si for microelectronic applications 1997 Superconductor science and technology 10 2 UA library record; WoS full record; WoS citing articles
Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. Modeling of a dielectric barrier discharge used as a flowing chemical reactor 2008 Journal of physics : conference series 133 6 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Aerts, R.; Snoeckx, R.; Somers, W.; Van Gaens, W.; Yusupov, M.; Neyts, E. Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications 2012 Journal of physics : conference series 399 7 UA library record; WoS full record; WoS citing articles
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles