Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Mortet, V.; Zhang, L.; Echert, M.; Soltani, A.; d' Haen, J.; Douheret, O.; Moreau, M.; Osswald, S.; Neyts, E.; Troadec, D.; Wagner, P.; Bogaerts, A.; Van Tendeloo, G.; Haenen, K. |
Characterization of nano-crystalline diamond films grown under continuous DC bias during plasma enhanced chemical vapor deposition |
2009 |
Materials Research Society symposium proceedings |
|
|
UA library record |
Zhang, Y.-R.; Xu, X.; Zhao, S.-X.; Bogaerts, A.; Wang, Y.-N. |
Comparison of electrostatic and electromagnetic simulations for very high frequency plasmas |
2010 |
Physics of plasmas |
17 |
30 |
UA library record; WoS full record; WoS citing articles |
Si, X.-J.; Zhao, S.-X.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulations of frequency effects on nonlinear harmonics in inductively coupled plasma |
2011 |
Physics of plasmas |
18 |
7 |
UA library record; WoS full record; WoS citing articles |
Cai, H.-bo; Yu, W.; Zhu, S.-ping; Zheng, C.-yang; Cao, L.-hua; Li, B.; Chen, Z.Y.; Bogaerts, A. |
Short-pulse laser absorption in very steep plasma density gradients |
2006 |
Physics of plasmas |
13 |
17 |
UA library record; WoS full record; WoS citing articles |
Liu, Y.H.; Chen, Z.Y.; Huang, F.; Yu, M.Y.; Wang, L.; Bogaerts, A. |
Simulation of disk- and band-like voids in dusty plasma systems |
2006 |
Physics of plasmas |
13 |
20 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Effect of small amounts of hydrogen added to argon glow discharges: hybrid Monte-Carlo-fluid model |
2002 |
Physical review : E : statistical, nonlinear, and soft matter physics |
65 |
33 |
UA library record; WoS full record; WoS citing articles |
Okhrimovskyy, A.; Bogaerts, A.; Gijbels, R. |
Electron anisotropic scattering in gases: a formula for Monte Carlo simulations |
2002 |
Physical review : E : statistical, nonlinear, and soft matter physics |
65 |
57 |
UA library record; WoS full record; WoS citing articles |
Yan, M.; Bogaerts, A.; Gijbels, R. |
Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge |
2001 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
63 |
4 |
UA library record; WoS full record; WoS citing articles |
Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Local and fast relaxation phenomena after laser-induced photodetachment in a strongly electronegative rf discharge |
2002 |
Physical review : E : statistical, nonlinear, and soft matter physics |
65 |
2 |
UA library record; WoS full record; WoS citing articles |
Aerts, R.; Somers, W.; Bogaerts, A. |
Carbon dioxide splitting in a dielectric barrier discharge plasma : a combined experimental and computational study |
2015 |
Chemsuschem |
8 |
131 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Bultinck, E.; Eckert, M.; Georgieva, V.; Mao, M.; Neyts, E.; Schwaederlé, L. |
Computer modeling of plasmas and plasma-surface interactions |
2009 |
Plasma processes and polymers |
6 |
18 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Kolev, I.; Madani, M.; Neyts, E. |
Computer simulations for processing plasmas |
2006 |
Plasma processes and polymers |
3 |
8 |
UA library record; WoS full record; WoS citing articles |
Philippaerts, A.; Goossens, S.; Vermandel, W.; Tromp, M.; Turner, S.; Geboers, J.; Van Tendeloo, G.; Jacobs, P.A.; Sels, B.F. |
Design of Ru-zeolites for hydrogen-free production of conjugated linoleic acid |
2011 |
Chemsuschem |
4 |
24 |
UA library record; WoS full record; WoS citing articles |
Ramakers, M.; Michielsen, I.; Aerts, R.; Meynen, V.; Bogaerts, A. |
Effect of argon or helium on the CO2 conversion in a dielectric barrier discharge |
2015 |
Plasma processes and polymers |
12 |
63 |
UA library record; WoS full record; WoS citing articles |
Teodoru, S.; Kusano, Y.; Bogaerts, A. |
The effect of O2 in a humid O2/N2/NOx gas mixture on NOx and N2O remediation by an atmospheric pressure dielectric barrier discharge |
2012 |
Plasma processes and polymers |
9 |
24 |
UA library record; WoS full record; WoS citing articles |
De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. |
Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge |
2011 |
Plasma processes and polymers |
8 |
70 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. |
Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation |
2014 |
Plasma processes and polymers |
11 |
1 |
UA library record; WoS full record; WoS citing articles |
Aerts, R.; Snoeckx, R.; Bogaerts, A. |
In-situ chemical trapping of oxygen in the splitting of carbon dioxide by plasma |
2014 |
Plasma processes and polymers |
11 |
29 |
UA library record; WoS full record; WoS citing articles |
Yusupov, M.; Neyts, E.C.; Verlackt, C.C.; Khalilov, U.; van Duin, A.C.T.; Bogaerts, A. |
Inactivation of the endotoxic biomolecule lipid A by oxygen plasma species : a reactive molecular dynamics study |
2015 |
Plasma processes and polymers |
12 |
18 |
UA library record; WoS full record; WoS citing articles |
Somers, W.; Dubreuil, M.F.; Neyts, E.C.; Vangeneugden, D.; Bogaerts, A. |
Incorporation of fluorescent dyes in atmospheric pressure plasma coatings for in-line monitoring of coating homogeneity |
2014 |
Plasma processes and polymers |
11 |
3 |
UA library record; WoS full record; WoS citing articles |
Aerts, R.; Tu, X.; De Bie, C.; Whitehead, J.C.; Bogaerts, A. |
An investigation into the dominant reactions for ethylene destruction in non-thermal atmospheric plasmas |
2012 |
Plasma processes and polymers |
9 |
46 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
Neyts, E.; Eckert, M.; Bogaerts, A. |
Molecular dynamics simulations of the growth of thin a-C:H films under additional ion bombardment: influence of the growth species and the Ar+ ion kinetic energy |
2007 |
Chemical vapor deposition |
13 |
14 |
UA library record; WoS full record; WoS citing articles |
Eckert, M.; Neyts, E.; Bogaerts, A. |
Molecular dynamics simulations of the sticking and etch behavior of various growth species of (ultra)nanocrystalline diamond films |
2008 |
Chemical vapor deposition |
14 |
25 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; De Schepper, P.; Bogaerts, A. |
Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas |
2013 |
Plasma processes and polymers |
10 |
3 |
UA library record; WoS full record; WoS citing articles |
Kirschhock, C.E.A.; Liang, D.; Aerts, A.; Aerts, C.A.; Kremer, S.P.B.; Jacobs, P.A.; Van Tendeloo, G.; Martens, J.A. |
On the TEM and AFM evidence of zeosil nanoslabs present during the synthesis of silicalite-1 : reply |
2004 |
Angewandte Chemie: international edition in English |
43 |
|
UA library record; WoS full record; WoS citing articles |
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. |
Particle-in-cell/Monte Carlo collisions model for the reactive sputter deposition of nitride layers |
2009 |
Plasma processes and polymers |
6 |
2 |
UA library record; WoS full record; WoS citing articles |
Kolev, I.; Bogaerts, A. |
PIC – MCC numerical simulation of a DC planar magnetron |
2006 |
Plasma processes and polymers |
3 |
27 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Yusupov, M.; Van der Paal, J.; Verlackt, C.C.W.; Neyts, E.C. |
Reactive molecular dynamics simulations for a better insight in plasma medicine |
2014 |
Plasma processes and polymers |
11 |
22 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A.; Shamiryan, D. |
Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma |
2011 |
Plasma processes and polymers |
8 |
5 |
UA library record; WoS full record; WoS citing articles |