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  Author Title Year Publication Volume Times cited Additional Links Links
Bogaerts, A.; Yusupov, M.; Van der Paal, J.; Verlackt, C.C.W.; Neyts, E.C. Reactive molecular dynamics simulations for a better insight in plasma medicine 2014 Plasma processes and polymers 11 22 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Bogaerts, A.; Shamiryan, D. Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma 2011 Plasma processes and polymers 8 5 UA library record; WoS full record; WoS citing articles doi
Baguer, N.; Neyts, E.; van Gils, S.; Bogaerts, A. Study of atmospheric MOCVD of TiO2 thin films by means of computational fluid dynamics simulations 2008 Chemical vapor deposition 14 14 UA library record; WoS full record; WoS citing articles doi
Wang, W.; Patil, B.; Heijkers, S.; Hessel, V.; Bogaerts, A. Nitrogen fixation by gliding arc plasma : better insight by chemical kinetics modelling 2017 Chemsuschem 10 42 UA library record; WoS full record; WoS citing articles pdf url doi
Bogaerts, A.; Gijbels, R. Effect of small amounts of hydrogen added to argon glow discharges: hybrid Monte-Carlo-fluid model 2002 Physical review : E : statistical, nonlinear, and soft matter physics 65 33 UA library record; WoS full record; WoS citing articles url doi
Okhrimovskyy, A.; Bogaerts, A.; Gijbels, R. Electron anisotropic scattering in gases: a formula for Monte Carlo simulations 2002 Physical review : E : statistical, nonlinear, and soft matter physics 65 57 UA library record; WoS full record; WoS citing articles url doi
Yan, M.; Bogaerts, A.; Gijbels, R. Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge 2001 Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 63 4 UA library record; WoS full record; WoS citing articles url doi
Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. Local and fast relaxation phenomena after laser-induced photodetachment in a strongly electronegative rf discharge 2002 Physical review : E : statistical, nonlinear, and soft matter physics 65 2 UA library record; WoS full record; WoS citing articles url doi
Zhang, Y.-R.; Xu, X.; Zhao, S.-X.; Bogaerts, A.; Wang, Y.-N. Comparison of electrostatic and electromagnetic simulations for very high frequency plasmas 2010 Physics of plasmas 17 30 UA library record; WoS full record; WoS citing articles pdf doi
Si, X.-J.; Zhao, S.-X.; Xu, X.; Bogaerts, A.; Wang, Y.-N. Fluid simulations of frequency effects on nonlinear harmonics in inductively coupled plasma 2011 Physics of plasmas 18 7 UA library record; WoS full record; WoS citing articles pdf doi
Cai, H.-bo; Yu, W.; Zhu, S.-ping; Zheng, C.-yang; Cao, L.-hua; Li, B.; Chen, Z.Y.; Bogaerts, A. Short-pulse laser absorption in very steep plasma density gradients 2006 Physics of plasmas 13 17 UA library record; WoS full record; WoS citing articles doi
Liu, Y.H.; Chen, Z.Y.; Huang, F.; Yu, M.Y.; Wang, L.; Bogaerts, A. Simulation of disk- and band-like voids in dusty plasma systems 2006 Physics of plasmas 13 20 UA library record; WoS full record; WoS citing articles doi
Mortet, V.; Zhang, L.; Echert, M.; Soltani, A.; d' Haen, J.; Douheret, O.; Moreau, M.; Osswald, S.; Neyts, E.; Troadec, D.; Wagner, P.; Bogaerts, A.; Van Tendeloo, G.; Haenen, K. Characterization of nano-crystalline diamond films grown under continuous DC bias during plasma enhanced chemical vapor deposition 2009 Materials Research Society symposium proceedings UA library record doi
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