Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Bogaerts, A.; Gijbels, R. |
Numerical modelling of analytical glow discharges |
2003 |
|
|
|
UA library record |
Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Mathematical description of a direct current glow discharge in argon |
1996 |
Fresenius' journal of analytical chemistry |
355 |
12 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
New developments and applications in GDMS |
1999 |
Fresenius' journal of analytical chemistry |
364 |
17 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Three-dimensional modeling of a direct current glow discharge in argon: is it better than one-dimensional modeling? |
1997 |
Fresenius' journal of analytical chemistry |
359 |
9 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis |
1997 |
Journal of the American Society of Mass Spectrometry |
8 |
15 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Modeling of glow discharges: what can we learn from it? |
1997 |
Analytical chemistry A-pages |
69 |
|
UA library record |
Bogaerts, A.; Gijbels, R. |
Modeling of radio-frequency and direct current glow discharges in argon |
2000 |
Journal of technical physics |
41 |
|
UA library record |