| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Hervieu; Van Tendeloo, G.; Michel; Pelloquin; Raveau |
Mixed layers in copper based superconducting materials |
1996 |
Microscopy, microanalysis, microstructures |
7 |
2 |
UA library record; WoS full record; WoS citing articles |
| Isaeva, A.A.; Makarevich, O.N.; Kutznetsov, A.N.; Doert, T.; Abakumov, A.M.; Van Tendeloo, G. |
Mixed tellurides Ni3-xGaTe2 (0\leq x\leq0.65): crystal and electronic structures, properties, and nickel deficiency effects on vacancy ordering |
2010 |
European journal of inorganic chemistry |
|
8 |
UA library record; WoS full record; WoS citing articles |
| Lieberman, C.M.; Filatov, A.S.; Wei, Z.; Rogachev, A.Y.; Abakumov, A.M.; Dikarev, E.V. |
Mixed-valent, heteroleptic homometallic diketonates as templates for the design of volatile heterometallic precursors |
2015 |
Chemical science |
6 |
13 |
UA library record; WoS full record; WoS citing articles |
| Daniel, P.; Barbey, L.; Groult, D.; Nguyen, N.; Van Tendeloo, G.; Raveau, B. |
Mixed valent iron oxides with the 0201-1201 intergrowth structure: (Pb1-xTlx)Sr4Fe2O9 (0≤x≤1) |
1994 |
European journal of solid state and inorganic chemistry |
31 |
12 |
UA library record; WoS full record; WoS citing articles |
| Dixon, E.; Hadermann, J.; Ramos, S.; Goodwin, A.L.; Hayward, M.A. |
Mn(I) in an extended oxide : the synthesis and characterization of La1-xCaxMnO2+\delta (0.6\leq x\leq1) |
2011 |
Journal of the American Chemical Society |
133 |
33 |
UA library record; WoS full record; WoS citing articles |
| Bougrioua, Z.; Farvacque, J.-L.; Moerman, I.; Demeester, P.; Harris, J.J.; Lee, K.; Van Tendeloo, G.; Lebedev, O.; Trush, E.J. |
Mobility collapse in undoped and Si-doped GaN grown by LP-MOVPE |
1999 |
Physica status solidi: B: basic research |
216 |
13 |
UA library record; WoS full record; WoS citing articles |
| Xu, Y.; Jia, D.-J.; Chen, Z.; Gao, Y.; Li, F.-S. |
The mode-deviation effect of trapped spinor bose gas beyond mean field theory |
2004 |
International journal of modern physics: B: condensed matter physics, statistical physics, applied physics |
18 |
1 |
UA library record; WoS full record; WoS citing articles |
| van den Broek, W.; Van Aert, S.; van Dyck, D. |
A model based atomic resolution tomographic algorithm |
2009 |
Ultramicroscopy |
109 |
17 |
UA library record; WoS full record; WoS citing articles |
| Eckert, M.; Neyts, E.; Bogaerts, A. |
Modeling adatom surface processes during crystal growth: a new implementation of the Metropolis Monte Carlo algorithm |
2009 |
CrystEngComm |
11 |
15 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Y.-R.; Tinck, S.; De Schepper, P.; Wang, Y.-N.; Bogaerts, A. |
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
3 |
UA library record; WoS full record; WoS citing articles |
| Vandenbroucke, A.M.; Aerts, R.; Van Gaens, W.; De Geyter, N.; Leys, C.; Morent, R.; Bogaerts, A. |
Modeling and experimental study of trichloroethylene abatement with a negative direct current corona discharge |
2015 |
Plasma chemistry and plasma processing |
35 |
9 |
UA library record; WoS full record; WoS citing articles |
| Magnus, W.; Brosens, F.; Sorée, B. |
Modeling drive currents and leakage currents : a dynamic approach |
2009 |
Journal of computational electronics |
8 |
4 |
UA library record; WoS full record; WoS citing articles |
| Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. |
Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model |
2002 |
Journal of applied physics |
92 |
15 |
UA library record; WoS full record; WoS citing articles |
| Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Modeling of a dielectric barrier discharge used as a flowing chemical reactor |
2008 |
Journal of physics : conference series |
133 |
6 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions |
2001 |
Journal of analytical atomic spectrometry |
16 |
36 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R.; Jackson, G.P. |
Modeling of a millisecond pulsed glow discharge: investigation of the afterpeak |
2003 |
Journal of analytical atomic spectrometry |
18 |
42 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Modeling of argon direct current glow discharges and comparison with experiment: how good is the agreement? |
1998 |
Journal of analytical atomic spectrometry |
13 |
24 |
UA library record; WoS full record; WoS citing articles |
| de Witte, H.; Vandervorst, W.; Gijbels, R. |
Modeling of bombardment induced oxidation of silicon |
2001 |
Journal of applied physics |
89 |
16 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; de Bleecker, K.; Kolev, I.; Madani, M. |
Modeling of gas discharge plasmas: What can we learn from it? |
2005 |
Surface and coatings technology |
200 |
11 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R.; Vlcek, J. |
Modeling of glow discharge optical emission spectrometry: calculation of the argon atomic optical emission spectrum |
1998 |
Spectrochimica acta: part B : atomic spectroscopy |
53 |
44 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis |
1997 |
Journal of the American Society of Mass Spectrometry |
8 |
15 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Kolev, I. |
Modeling of magnetron and glow discharges |
2002 |
Le vide: science, technique et applications |
57 |
|
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Modeling of metastable argon atoms in a direct current glow discharge |
1995 |
Physical review : A : atomic, molecular and optical physics |
52 |
98 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Aerts, R.; Snoeckx, R.; Somers, W.; Van Gaens, W.; Yusupov, M.; Neyts, E. |
Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications |
2012 |
Journal of physics : conference series |
399 |
7 |
UA library record; WoS full record; WoS citing articles |
| de Bleecker, K.; Bogaerts, A.; Goedheer, W. |
Modeling of the formation and transport of nanoparticles in silane plasmas |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
70 |
31 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; De Bie, C.; Eckert, M.; Georgieva, V.; Martens, T.; Neyts, E.; Tinck, S. |
Modeling of the plasma chemistry and plasmasurface interactions in reactive plasmas |
2010 |
Pure and applied chemistry |
82 |
13 |
UA library record; WoS full record; WoS citing articles |
| Lenaerts, J.; Verlinden, G.; Ignatova, V.A.; van Vaeck, L.; Gijbels, R.; Geuens, I. |
Modeling of the sputtering process of cubic silver halide microcrystals and its relevance in depth profiling by secondary ion-mass spectrometry (SIMS) |
2001 |
Fresenius' journal of analytical chemistry |
370 |
3 |
UA library record; WoS full record; WoS citing articles |
| de Bleecker, K.; Bogaerts, A. |
Modeling of the synthesis and subsequent growth of nanoparticles in dusty plasmas |
2007 |
High temperature material processes |
11 |
|
UA library record; WoS full record |
| Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. |
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering |
2004 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
