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  Author Title Year Publication Volume Times cited Additional Links Links
Batuk, M.; Buffiere, M.; Zaghi, A.E.; Lenaers, N.; Verbist, C.; Khelifi, S.; Vleugels, J.; Meuris, M.; Hadermann, J. Effect of the burn-out step on the microstructure of the solution-processed Cu(In,Ga)Se2 solar cells 2015 Thin solid films : an international journal on the science and technology of thin and thick films 583 5 UA library record; WoS full record; WoS citing articles pdf doi
Milošević, M.M.; Tadić, M.; Peeters, F.M. Effects of lateral asymmetry on electronic structure of strained semiconductor nanorings in a magnetic field 2008 Nanotechnology 19 11 UA library record; WoS full record; WoS citing articles pdf doi
Schulze, A.; Hantschel, T.; Dathe, A.; Eyben, P.; Ke, X.; Vandervorst, W. Electrical tomography using atomic force microscopy and its application towards carbon nanotube-based interconnects 2012 Nanotechnology 23 29 UA library record; WoS full record; WoS citing articles pdf doi
Liu, Y.-X.; Zhang, Y.-R.; Bogaerts, A.; Wang, Y.-N. Electromagnetic effects in high-frequency large-area capacitive discharges : a review 2015 Journal of vacuum science and technology: A: vacuum surfaces and films 33 10 UA library record; WoS full record; WoS citing articles pdf doi
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges 2013 Plasma sources science and technology 22 20 UA library record; WoS full record; WoS citing articles pdf doi
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges 2000 Plasma sources science and technology 9 21 UA library record; WoS full record; WoS citing articles doi
Volkov, V.V.; van Heurck, C.; van Landuyt, J.; Amelinckx, S.; Zhukov, E.G.; Polulyak, E.S.; Novotortsev, V.M. Electron microscopy and X-ray study of the growth of FeCr2S4 spinel single crystals by chemical vapour transport 1993 Crystal research and technology 28 1 UA library record; WoS full record; WoS citing articles pdf doi
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation 2013 Plasma sources science and technology 22 13 UA library record; WoS full record; WoS citing articles pdf doi
Kozák, T.; Bogaerts, A. Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model 2015 Plasma sources science and technology 24 100 UA library record; WoS full record; WoS citing articles pdf url doi
Sankaran, K.; Clima, S.; Mees, M.; Adelmann, C.; Tokei, Z.; Pourtois, G. Exploring alternative metals to Cu and W for interconnects : an ab initio Insight 2014 2014 Ieee International Interconnect Technology Conference / Advanced Metallization Conference (iitc/amc) UA library record; WoS full record;
Sankaran, K.; Clima, S.; Mees, M.; Pourtois, G. Exploring alternative metals to Cu and W for interconnects applications using automated first-principles simulations 2015 ECS journal of solid state science and technology 4 19 UA library record; WoS full record; WoS citing articles url doi
Zhang, Y.-R.; Gao, F.; Li, X.-C.; Bogaerts, A.; Wang, Y.-N. Fluid simulation of the bias effect in inductive/capacitive discharges 2015 Journal of vacuum science and technology: A: vacuum surfaces and films 33 9 UA library record; WoS full record; WoS citing articles url doi
Nistor, L.C.; van Landuyt, J.; Ralchenko, V.G.; Kononenko, T.V.; Obraztsova, E.D.; Strelnitsky, V.E. Formation of diamond nanocrystals in laser-irradiated amorphous carbon films 1994 International Conference on the New Diamond Science and Technology 4 UA library record
Misko, V.R.; Zhao, H.J.; Peeters, F.M.; Oboznov, V.; Dubonos, S.V.; Grigorieva, I.V. Formation of vortex shells in mesoscopic superconducting squares 2009 Superconductor science and technology 22 14 UA library record; WoS full record; WoS citing articles doi
Aerts, R.; Tu, X.; Van Gaens, W.; Whitehead, J.C.; Bogaerts, A. Gas purification by nonthermal plasma : a case study of ethylene 2013 Environmental science and technology 47 56 UA library record; WoS full record; WoS citing articles pdf doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 2013 Plasma sources science and technology 22 11 UA library record; WoS full record; WoS citing articles pdf doi
Laffez, P.; Chen, X.Y.; Banerjee, G.; Pezeril, T.; Rossell, M.D.; Van Tendeloo, G.; Lacorre, P.; Liu, J.M.; Liu, Z.-G. Growth of La2Mo2O9 films on porous Al2O3 substrates by radio frequency magnetron sputtering 2006 Thin solid films : an international journal on the science and technology of thin and thick films 500 15 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas 2013 Plasma sources science and technology 22 9 UA library record; WoS full record; WoS citing articles pdf doi
Wu, M.F.; Zhou, S.; Yao, S.; Zhao, Q.; Vantomme, A.; van Daele, B.; Piscopiello, E.; Van Tendeloo, G.; Tong, Y.Z.; Yang, Z.J.; Yu, T.J.; Zhang, G.Y. High precision determination of the elastic strain of InGaN/GaN multiple quantum wells 2004 Journal of vacuum science and technology: B: microelectronics and nanometer structures 22 15 UA library record; WoS full record; WoS citing articles pdf doi
Mattauch, S.; Heger, G.; Michel, K.H. High resolution neutron and X-ray diffraction studies as a function of temperature and electric field of the ferroelectric phase transition of RDP 2004 Crystal research and technology 39 12 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux 2005 Plasma sources science and technology 14 9 UA library record; WoS full record; WoS citing articles doi
Peeters, F.M.; Devreese, J.T. Hot magneto-phonon and electro-phonon resonances in heterostructures 1992 Semiconductor science and technology: B 7 12 UA library record; WoS full record; WoS citing articles doi
Orlinskii, S.B.; Bogomolov, R.S.; Kiyamova, A.M.; Yavkin, B.V.; Mamin, G.M.; Turner, S.; Van Tendeloo, G.; Shiryaev, A.A.; Vlasov, I.I.; Shenderova, O. Identification of substitutional nitrogen and surface paramagnetic centers in nanodiamond of dynamic synthesis by electron paramagnetic resonance 2011 Nanoscience and nanotechnology letters 3 14 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Naylor, J.; Hatcher, M.; Jones, W.J.; Mason, R. Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment 1998 Journal of vacuum science and technology: A: vacuum surfaces and films 16 12 UA library record; WoS full record; WoS citing articles doi
Mahieu, S.; Ghekiere, P.; de Winter, G.; Depla, D.; de Gryse, R.; Lebedev, O.I.; Van Tendeloo, G. Influence of the Ar/O2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering 2005 Thin solid films : an international journal on the science and technology of thin and thick films 484 23 UA library record; WoS full record; WoS citing articles pdf doi
van Renterghem, W.; Goessens, C.; Schryvers, D.; van Landuyt, J.; Bollen, D.; de Keyzer, R.; van Roost, C. Influence of twinning on the morphology of AgBr and AgCl microcrystals 2001 The journal of imaging science and technology 45 UA library record; WoS full record; WoS citing articles
Saeed, A.; Khan, A.W.; Shafiq, M.; Jan, F.; Abrar, M.; Zaka-ul-Islam, M.; Zakaullah, M. Investigation of 50 Hz pulsed DC nitrogen plasma with active screen cage by trace rare gas optical emission spectroscopy 2014 Plasma science & technology 16 5 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Gijbels, R. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces 2002 Plasma sources science and technology 11 51 UA library record; WoS full record; WoS citing articles doi
Verbist, K.; Lebedev, O.I.; Van Tendeloo, G.; Verhoeven, M.A.J.; Rijnders, A.J.H.M.; Blank, D.H.A. Low- or high-angle Ar ion-beam etching to create ramp-type Josephson junctions 1996 Superconductor science and technology 9 10 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.; Bogaerts, A.; de Meyer, M.; van Gils, S. Macroscale computer simulations to investigate the chemical vapor deposition of thin metal-oxide films 2007 Surface and coatings technology 201 5 UA library record; WoS full record; WoS citing articles doi
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