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Plasma Technology: An Emerging Technology for Energy Storage”. Bogaerts A, Neyts EC, ACS energy letters 3, 1013 (2018). http://doi.org/10.1021/acsenergylett.8b00184
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Ensemble-Based Molecular Simulation of Chemical Reactions under Vibrational Nonequilibrium”. Bal KM, Bogaerts A, Neyts EC, Journal Of Physical Chemistry Letters 11, 401 (2020). http://doi.org/10.1021/acs.jpclett.9b03356
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Elucidating the effects of gas flow rate on an SF6inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation”. Tinck S, Tillocher T, Dussart R, Neyts EC, Bogaerts A, Journal of physics: D: applied physics 49, 385201 (2016). http://doi.org/10.1088/0022-3727/49/38/385201
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