Number of records found: 4750
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Citations
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Long-distance channeling and focusing of lasers in plasmas”. Yuan X, Yu W, Yu MY, Chen ZY, Liu JR, Lu PX, Li RX, Qian LJ, Lu BD, Physica scripta 66, 381 (2002). http://doi.org/10.1238/Physica.Regular.066a00381
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Macroscale computer simulations to investigate the chemical vapor deposition of thin metal-oxide films”. Neyts E, Bogaerts A, de Meyer M, van Gils S, Surface and coatings technology 201, 8838 (2007). http://doi.org/10.1016/j.surfcoat.2007.04.102
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Mass spectrometric analysis of inorganic solids: GDMS and other methods”. Gijbels R, van Straaten M, Bogaerts A, Advances in mass spectrometry 13, 241 (1995)
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Mechanisms for the trimethylaluminum reaction in aluminum oxide atomic layer deposition on sulfur passivated germanium”. Delabie A, Sioncke S, Rip J, van Elshocht S, Caymax M, Pourtois G, Pierloot K, The journal of physical chemistry: C : nanomaterials and interfaces 115, 17523 (2011). http://doi.org/10.1021/jp206070y
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Modeling adatom surface processes during crystal growth: a new implementation of the Metropolis Monte Carlo algorithm”. Eckert M, Neyts E, Bogaerts A, CrystEngComm 11, 1597 (2009). http://doi.org/10.1039/b822973m
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Modeling and experimental study of trichloroethylene abatement with a negative direct current corona discharge”. Vandenbroucke AM, Aerts R, Van Gaens W, De Geyter N, Leys C, Morent R, Bogaerts A, Plasma chemistry and plasma processing 35, 217 (2015). http://doi.org/10.1007/s11090-014-9584-7
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Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model”. Herrebout D, Bogaerts A, Yan M, Gijbels R, Goedheer W, Vanhulsel A, Journal of applied physics 92, 2290 (2002). http://doi.org/10.1063/1.1500789
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Modeling of a dielectric barrier discharge used as a flowing chemical reactor”. Petrović, D, Martens T, van Dijk J, Brok WJM, Bogaerts A, Journal of physics : conference series 133, 012023 (2008). http://doi.org/10.1088/1742-6596/133/1/012023
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Modeling of gas discharge plasmas: What can we learn from it?”.Bogaerts A, de Bleecker K, Kolev I, Madani M, Surface and coatings technology 200, 62 (2005). http://doi.org/10.1016/j.surfcoat.2005.02.057
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Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge”. Bogaerts A, Yan M, Gijbels R, Goedheer W, Journal of applied physics 86, 2990 (1999). http://doi.org/10.1063/1.371159
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Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications”. Bogaerts A, Aerts R, Snoeckx R, Somers W, Van Gaens W, Yusupov M, Neyts E, Journal of physics : conference series 399, 012011 (2012). http://doi.org/10.1088/1742-6596/399/1/012011
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Modeling of the plasma chemistry and plasmasurface interactions in reactive plasmas”. Bogaerts A, De Bie C, Eckert M, Georgieva V, Martens T, Neyts E, Tinck S, Pure and applied chemistry 82, 1283 (2010). http://doi.org/10.1351/PAC-CON-09-09-20
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Modeling PECVD growth of nanostructured carbon materials”. Neyts E, Bogaerts A, van de Sanden MCM, High temperature material processes 13, 399 (2009). http://doi.org/10.1615/HighTempMatProc.v13.i3-4.120
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Modeling study on the influence of the pressure on a dielectric barrier discharge microplasma”. Martens T, Bogaerts A, Brok WJM, van der Mullen JJAM, Journal of analytical atomic spectrometry 22, 1003 (2007). http://doi.org/10.1039/b704903j
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Molecular dynamics simulation of dust clusters in plasmas”. Chen Z, Yu MY, Luo H, Physica scripta 71, 638 (2005). http://doi.org/10.1088/0031-8949/71/6/010
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Molecular dynamics simulation of the impact behaviour of various hydrocarbon species on DLC”. Neyts E, Bogaerts A, Gijbels R, Benedikt J, van de Sanden MCM, Nuclear instruments and methods in physics research: B: beam interactions with materials and atoms 228, 315 (2005). http://doi.org/10.1016/j.nimb.2004.10.063
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Molecular dynamics simulations for the growth of diamond-like carbon films from low kinetic energy species”. Neyts E, Bogaerts A, Gijbels R, Benedikt J, van den Sanden MCM, Diamond and related materials 13, 1873 (2004). http://doi.org/10.1016/j.diamond.2004.05.011
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Molecular dynamics simulations of Cl+ etching on a Si(100) surface”. Gou F, Neyts E, Eckert M, Tinck S, Bogaerts A, Journal of applied physics 107, 113305 (2010). http://doi.org/10.1063/1.3361038
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Molecular dynamics simulations of the growth of thin a-C:H films under additional ion bombardment: influence of the growth species and the Ar+ ion kinetic energy”. Neyts E, Eckert M, Bogaerts A, Chemical vapor deposition 13, 312 (2007). http://doi.org/10.1002/cvde.200606551
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Molecular dynamics simulations of the sticking and etch behavior of various growth species of (ultra)nanocrystalline diamond films”. Eckert M, Neyts E, Bogaerts A, Chemical vapor deposition 14, 213 (2008). http://doi.org/10.1002/cvde.200706657
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Monte Carlo simulation of an analytical glow discharge: motion of electrons, ions and fast neutrals in the cathode dark space”. Bogaerts A, van Straaten M, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 50, 179 (1995). http://doi.org/10.1016/0584-8547(94)00117-E
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Multiple void formation in plasmas containing multispecies charged grains”. Liu YH, Chen ZY, Yu MY, Bogaerts A, Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 74, 056401 (2006). http://doi.org/10.1103/PhysRevE.74.056401
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New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments”. Mao M, Benedikt J, Consoli A, Bogaerts A, Journal of physics: D: applied physics 41 (2008). http://doi.org/10.1088/0022-3727/41/22/225201
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Numerical modeling for a better understanding of gas discharge plasmas”. Bogaerts A, de Bleecker K, Georgieva V, Herrebout D, Kolev I, Madani M, Neyts E, High temperature material processes 9, 321 (2005). http://doi.org/10.1615/HighTempMatProc.v9.i3.10
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Numerical simulation of hydrocarbon plasmas for nanoparticle formation and the growth of nanostructured thin films”. Neyts E, Eckert M, Mao M, Bogaerts A, Plasma physics and controlled fusion 51, 124034 (2009). http://doi.org/10.1088/0741-3335/51/12/124034
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Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications”. Mao M, Wang YN, Bogaerts A, Journal of physics: D: applied physics 44, 435202 (2011). http://doi.org/10.1088/0022-3727/44/43/435202
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Occurrence of gas flow rotational motion inside the ICP torch : a computational and experimental study”. Aghaei M, Flamigni L, Lindner H, Günther D, Bogaerts A, Journal of analytical atomic spectrometry 29, 249 (2014). http://doi.org/10.1039/c3ja50302j
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On the effect of centrifugal stretching on the rotational partition function of an asymmetric top”. Martin JML, François JP, Gijbels R, The journal of chemical physics 95, 8374 (1991)
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On the heat formation of C8 and higher carbon clusters (letter to the editor)”. Martin JML, François JP, Gijbels R, The journal of chemical physics 95, 9420 (1991)
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On the low-temperature growth mechanism of single walled carbon nanotubes in plasma enhanced chemical vapor deposition”. Shariat M, Shokri B, Neyts EC, Chemical physics letters 590, 131 (2013). http://doi.org/10.1016/j.cplett.2013.10.061
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