| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| van Cleempoel, A.; Joutsensaari, J.; Kauppinen, E.; Gijbels, R.; Claeys, M. |
Aerosol synthesis and characterization of ultrafine fullerene particles |
1998 |
Fullerene science and technology |
6 |
3 |
UA library record; WoS full record; WoS citing articles |
| Vandelannoote, R.; Blommaert, W.; Gijbels, R.; van Grieken, R. |
Analysis of geothermal waters by spark source mass spectrometry |
1981 |
Fresenius' Zeitschrift für analytische Chemie |
309 |
8 |
UA library record |
| Bogaerts, A.; Temelkov, K.A.; Vuchkov, N.K.; Gijbels, R. |
Calculation of rate constants for asymmetric charge transfer, and their effect on relative sensitivity factors in glow discharge mass spectrometry |
2007 |
Spectrochimica acta: part B : atomic spectroscopy |
62 |
28 |
UA library record; WoS full record; WoS citing articles |
| Gijbels, R. |
Chemical analysis in metal processing: overview and future needs in refined and ultrapure metals |
1991 |
Acta technica Belgica: metallurgie |
30 |
|
UA library record |
| Pentcheva, E.N.; Petrov, P.S.; Veldeman, E.; Van 't dack, L.; Gijbels, R. |
Comportement hydrogéochimique des éléments traces au cours de l'interaction eau – roche en milieu alcalin |
1990 |
Doklady Bolgarskoi Akademii Nauk |
43 |
|
UA library record |
| Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. |
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering |
2004 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
| Martin, J.M.L.; François, J.P.; Gijbels, R. |
On the structure, stability and infrared spectrum of B2N, B2N+, B2N-, BO, B2O and B2N2 |
1992 |
Chemical physics letters |
193 |
42 |
UA library record; WoS full record; WoS citing articles |
| Martin, J.M.L.; François, J.P.; Gijbels, R. |
Accurate ab initio quartic force fields and thermochemistry of FNO and CINO |
1994 |
The journal of physical chemistry |
98 |
21 |
UA library record; WoS full record; WoS citing articles |
| Adriaensen, L.; Vangaever, F.; Lenaerts, J.; Gijbels, R. |
Comparative study of organic dyes with time-of-flight static secondary ion mass spectrometry and related techniques |
2005 |
Journal of mass spectrometry |
40 |
4 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Comparison of argon and neon as discharge gases in a direct current glow discharge: a mathematical simulation |
1997 |
Spectrochimica acta: part B : atomic spectroscopy |
52 |
13 |
UA library record; WoS full record; WoS citing articles |
| de Witte, H.; de Gendt, S.; Douglas, M.; Conard, T.; Kenis, K.; Mertens, P.W.; Vandervorst, W.; Gijbels, R. |
Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on wafer surfaces |
2000 |
Journal of the electrochemical society |
147 |
14 |
UA library record; WoS full record; WoS citing articles |
| Martin, J.M.L.; François, J.P.; Gijbels, R. |
First principles computation of thermo-chemical properties beyond the harmonic approximation: 2: application to the amino radical and its isotopomers |
1992 |
The journal of chemical physics |
97 |
22 |
UA library record; WoS full record; WoS citing articles |
| Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. |
Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model |
2002 |
Journal of applied physics |
92 |
15 |
UA library record; WoS full record; WoS citing articles |
| de Witte, H.; Vandervorst, W.; Gijbels, R. |
Modeling of bombardment induced oxidation of silicon |
2001 |
Journal of applied physics |
89 |
16 |
UA library record; WoS full record; WoS citing articles |
| Lenaerts, J.; Verlinden, G.; Ignatova, V.A.; van Vaeck, L.; Gijbels, R.; Geuens, I. |
Modeling of the sputtering process of cubic silver halide microcrystals and its relevance in depth profiling by secondary ion-mass spectrometry (SIMS) |
2001 |
Fresenius' journal of analytical chemistry |
370 |
3 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge |
1999 |
IEEE transactions on plasma science |
27 |
15 |
UA library record; WoS full record; WoS citing articles |
| Martin, J.M.L.; Taylor, P.R.; François, J.P.; Gijbels, R. |
Ab initio study of the spectroscopy, kinetics, and thermochemistry of the C2N and CN2 molecules |
1994 |
Chemical physics letters |
226 |
46 |
UA library record; WoS full record; WoS citing articles |
| Cai, Z.L.; Martin, J.M.L.; François, J.P.; Gijbels, R. |
Ab initio study of the X2\Sigma+ and A 2\Pi states of the SiN radical |
1996 |
Chemical physics letters |
252 |
28 |
UA library record; WoS full record; WoS citing articles |
| Geuens, I.; Gijbels, R.; Jacob, W.A.; Verbeeck, A.; de Keyzer, R. |
Analysis of silver halide microcrystals using different modes of a scanning transmission electron microscope and digital image processing |
1992 |
The journal of imaging science and technology |
36 |
10 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Calculation of crater profiles on a flat cathode in a direct current glow discharge, and comparison with experiment |
1997 |
Spectrochimica acta: part B : atomic spectroscopy |
52 |
42 |
UA library record; WoS full record; WoS citing articles |
| Struyf, H.; van Vaeck, L.; Kennis, P.; Gijbels, R.; van Grieken, R. |
Chemical characterization of neo-ceramic powders by time-of-flight and Fourier transform laser microprobe mass spectrometry |
1996 |
Rapid communications in mass spectrometry |
10 |
11 |
UA library record; WoS full record; WoS citing articles |
| Okhrimovskyy, A.; Bogaerts, A.; Gijbels, R. |
Incorporating the gas flow in a numerical model of rf discharges in methane |
2004 |
Journal of applied physics |
96 |
11 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
| Oleshko, V.P.; Brichkin, S.B.; Gijbels, R.; Jacob, W.A.; Razumov, V.F. |
Observation of exciton states in silver halide nanoparticles by cryo-electron spectroscopic imaging and electron energy-loss spectroscopy |
1997 |
Mendeleev communications |
7 |
5 |
UA library record; WoS full record; WoS citing articles |
| Martin, J.M.L.; François, J.P.; Gijbels, R. |
Potential energy surface of B4 and the total atomization energies of B2, B3 and B4 |
1992 |
Chemical physics letters |
189 |
50 |
UA library record; WoS full record; WoS citing articles |
| van Vaeck, L.; Vanroy, W.; Gijbels, R. |
Laser ionization mass-spectrometry for the characterization of solid materials |
1992 |
Analusis : chimie analytique, méthodes physiques d'analyse, composition de la matière |
20 |
|
UA library record; WoS full record; |
| Adriaensen, L.; Vangaever, F.; Lenaerts, J.; Gijbels, R. |
Matrix-enhanced secondary ion mass spectrometry: the influence of MALDI matrices on molecular ion yields of thin organic films |
2005 |
Rapid communications in mass spectrometry |
19 |
24 |
UA library record; WoS full record; WoS citing articles |
| Ignatova, V.A.; Lebedev, O.I.; Watjen, U.; van Vaeck, L.; van Landuyt, J.; Gijbels, R.; Adams, F. |
Metal and composite nanocluster precipitate formation in silicon dioxide implanted with Sb+ ions |
2002 |
Journal of applied physics |
92 |
5 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description |
1999 |
Journal of applied physics |
86 |
50 |
UA library record; WoS full record; WoS citing articles |
| Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4 |
2000 |
Journal of applied physics |
87 |
14 |
UA library record; WoS full record; WoS citing articles |
