| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Chen, Z.; Kong, M.; Milošević, M.V.; Wu, Y. |
Ground state configurations of two-dimensional plasma crystals under long-range attractive particle interaction force |
2003 |
Physica scripta |
67 |
4 |
UA library record; WoS full record; WoS citing articles |
| Yuan, X.; Yu, W.; Yu, M.Y.; Chen, Z.Y.; Liu, J.R.; Lu, P.X.; Li, R.X.; Qian, L.J.; Lu, B.D. |
Long-distance channeling and focusing of lasers in plasmas |
2002 |
Physica scripta |
66 |
2 |
UA library record; WoS full record; WoS citing articles |
| Chen, Z.; Yu, M.Y.; Luo, H. |
Molecular dynamics simulation of dust clusters in plasmas |
2005 |
Physica scripta |
71 |
13 |
UA library record; WoS full record; WoS citing articles |
| Chen, Z.; Feng, X.; Xu, Y.; Yu, M.Y. |
Optical bistability and multistability in four-level systems |
2003 |
Physica scripta |
68 |
8 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R.; Grozeva, M.; Sabotinov, N. |
Investigation of laser output power saturation in the He-Cu+ IR hollow cathode discharge laser by experiments and numerical modeling |
2003 |
Physica scripta |
T105 |
|
UA library record; WoS full record; WoS citing articles |
| Martin, J.M.L.; El-Yazal, J.; François, J.P.; Gijbels, R. |
The structure and energetics of B3N2, B2N3, and BN4: symmetry breaking effects in B3N2 |
1995 |
Molecular physics |
85 |
19 |
UA library record; WoS full record; WoS citing articles |
| Martin, J.M.L.; Slanina, Z.; François, J.P.; Gijbels, R. |
The structure, energetics, and harmonic vibrations of B3N and BN3 |
1994 |
Molecular physics |
82 |
19 |
UA library record; WoS full record; WoS citing articles |
| Adriaens, A.; Van 't dack, L.; Adams, F.; Gijbels, R. |
A mass spectrometric study of the dissolution behavior of sanidine |
1995 |
Microchimica acta |
120 |
1 |
UA library record; WoS full record; WoS citing articles |
| Van 't dack, L.; Gijbels, R.; Walker, C.T. |
Modern developments and applications in microbeam analysis: proceedings of the 10th Workshop of the European Microbeam Analysis Society (EMAS), Antwerp, Belgium, May 6-10, 2007 |
2008 |
Microchimica acta |
161 |
1 |
UA library record; WoS full record; WoS citing articles |
| Ignatova, V.A.; Lebedev, O.I.; Wätjen, U.; van Vaeck, L.; van Landuyt, J.; Gijbels, R.; Adams, F. |
Observation of Sb203 nanocrystals in SiO2 after Sb ion implantation |
2002 |
Microchimica acta |
139 |
3 |
UA library record; WoS full record; WoS citing articles |
| Hardy, A.; Van Elshocht, S.; De Dobbelaere, C.; Hadermann, J.; Pourtois, G.; De Gendt, S.; Afanas'ev, V.V.; Van Bael, M.K. |
Properties and thermal stability of solution processed ultrathin, high-k bismuth titanate (Bi2Ti2O7) films |
2012 |
Materials research bulletin |
47 |
|
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Bultinck, E.; Kolev, I.; Schwaederlé, L.; van Aeken, K.; Buyle, G.; Depla, D. |
Computer modelling of magnetron discharges |
2009 |
Journal of physics: D: applied physics |
42 |
32 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Eckert, M.; Mao, M.; Neyts, E. |
Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials |
2011 |
Journal of physics: D: applied physics |
44 |
25 |
UA library record; WoS full record; WoS citing articles |
| Neyts, E.C.; Yusupov, M.; Verlackt, C.C.; Bogaerts, A. |
Computer simulations of plasmabiomolecule and plasmatissue interactions for a better insight in plasma medicine |
2014 |
Journal of physics: D: applied physics |
47 |
28 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Tillocher, T.; Dussart, R.; Bogaerts, A. |
Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study |
2015 |
Journal of physics: D: applied physics |
48 |
9 |
UA library record; WoS full record; WoS citing articles |
| Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. |
Densification of thin a-C: H films grown from low-kinetic energy hydrocarbon radicals under the influence of H and C particle fluxes: a molecular dynamics study |
2006 |
Journal of physics: D: applied physics |
39 |
3 |
UA library record; WoS full record; WoS citing articles |
| Bultinck, E.; Bogaerts, A. |
The effect of the magnetic field strength on the sheath region of a dc magnetron discharge |
2008 |
Journal of physics: D: applied physics |
41 |
16 |
UA library record; WoS full record; WoS citing articles |
| Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Fluid modelling of an atmospheric pressure dielectric barrier discharge in cylindrical geometry |
2009 |
Journal of physics: D: applied physics |
42 |
29 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 1 : transient behaviour of electrodynamics and power deposition |
2012 |
Journal of physics: D: applied physics |
45 |
57 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 2 : radial uniformity of the plasma characteristics |
2012 |
Journal of physics: D: applied physics |
45 |
15 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Y.-R.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in Ar/CF4 capacitively coupled plasmas |
2012 |
Journal of physics: D: applied physics |
45 |
8 |
UA library record; WoS full record; WoS citing articles |
| Van der Paal, J.; Aernouts, S.; van Duin, A.C.T.; Neyts, E.C.; Bogaerts, A. |
Interaction of O and OH radicals with a simple model system for lipids in the skin barrier : a reactive molecular dynamics investigation for plasma medicine |
2013 |
Journal of physics: D: applied physics |
46 |
36 |
UA library record; WoS full record; WoS citing articles |
| Mao, M.; Bogaerts, A. |
Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system : the effect of different gas mixtures |
2010 |
Journal of physics: D: applied physics |
43 |
52 |
UA library record; WoS full record; WoS citing articles |
| Mao, M.; Bogaerts, A. |
Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma-enhanced CVD system : the effect of processing parameters |
2010 |
Journal of physics: D: applied physics |
43 |
17 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Boullart, W.; Bogaerts, A. |
Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments |
2009 |
Journal of physics: D: applied physics |
42 |
23 |
UA library record; WoS full record; WoS citing articles |
| Van Gaens, W.; Bogaerts, A. |
Kinetic modelling for an atmospheric pressure argon plasma jet in humid air |
2013 |
Journal of physics: D: applied physics |
46 |
115 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Y.; Jiang, W.; Bogaerts, A. |
Kinetic simulation of direct-current driven microdischarges in argon at atmospheric pressure |
2014 |
Journal of physics: D: applied physics |
47 |
10 |
UA library record; WoS full record; WoS citing articles |
| Mao, M.; Benedikt, J.; Consoli, A.; Bogaerts, A. |
New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
47 |
UA library record; WoS full record; WoS citing articles |
| Gul, B.; Tinck, S.; De Schepper, P.; Aman-ur-Rehman; Bogaerts, A. |
Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching |
2015 |
Journal of physics: D: applied physics |
48 |
7 |
UA library record; WoS full record; WoS citing articles |
| Mao, M.; Wang, Y.N.; Bogaerts, A. |
Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications |
2011 |
Journal of physics: D: applied physics |
44 |
20 |
UA library record; WoS full record; WoS citing articles |
