Home
<<
1
>>
List View
|
Citations
|
Details
Author
Title
Year
Publication
Volume
Times cited
Additional Links
Mao, M.
;
Wang, Y.N.
;
Bogaerts, A.
Numerical study of the plasma chemistry in inductively coupled SF
6
and SF
6
/AR plasmas used for deep silicon etching applications
2011
Journal of physics: D: applied physics
44
20
UA library record
;
WoS full record
;
WoS citing articles