Jalabert, D.; Pelloux-Gervais, D.; Béché, A.; Hartmann, J.M.; Gergaud, P.; Rouvière, J.L.; Canut, B. |
Depth strain profile with sub-nm resolution in a thin silicon film using medium energy ion scattering |
2012 |
Physica Status Solidi A-Applications And Materials Science |
209 |
3 |
UA library record; WoS full record; WoS citing articles |