“Atomic Layer Deposition of Pt Nanoparticles within the Cages of MIL-101: A Mild and Recyclable Hydrogenation Catalyst”. Leus K, Dendooven J, Tahir N, Ramachandran R, Meledina M, Turner S, Van Tendeloo G, Goeman J, Van der Eycken J, Detavernier C, Van Der Voort P, Nanomaterials 6, 45 (2016). http://doi.org/10.3390/nano6030045
Abstract: We present the in situ synthesis of Pt nanoparticles within MIL-101-Cr (MIL = Materials Institute Lavoisier) by means of atomic layer deposition (ALD). The obtained Pt@MIL-101 materials were characterized by means of N2 adsorption and X-ray powder diffraction (XRPD) measurements, showing that the structure of the metal organic framework was well preserved during the ALD deposition. X-ray fluorescence (XRF) and transmission electron microscopy (TEM) analysis confirmed the deposition of highly dispersed Pt nanoparticles with sizes determined by the MIL-101-Cr pore sizes and with an increased Pt loading for an increasing number of ALD cycles. The Pt@MIL-101 material was examined as catalyst in the hydrogenation of different linear and cyclic olefins at room temperature, showing full conversion for each substrate. Moreover, even under solvent free conditions, full conversion of the substrate was observed. A high concentration test has been performed showing that the Pt@MIL-101 is stable for a long reaction time without loss of activity, crystallinity and with very low Pt leaching.
Keywords: A1 Journal article; Engineering sciences. Technology; Electron microscopy for materials research (EMAT)
Impact Factor: 3.553
Times cited: 19
DOI: 10.3390/nano6030045
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“3D porous nanostructured platinum prepared using atomic layer deposition”. Pulinthanathu Sree S, Dendooven J, Geerts L, Ramachandran RK, Javon E, Ceyssens F, Breynaert E, Kirschhock CEA, Puers R, Altantzis T, Van Tendeloo G, Bals S, Detavernier C, Martens JA, Journal of materials chemistry A : materials for energy and sustainability 5, 19007 (2017). http://doi.org/10.1039/C7TA03257A
Abstract: A robust and easy to handle 3D porous platinum structure was created via replicating the 3D channel system
of an ordered mesoporous silica material using atomic layer deposition (ALD) over micrometer distances.
After ALD of Pt in the silica material, the host template was digested using hydrogen fluoride (HF). A fully
connected ordered Pt nanostructure was obtained with morphology and sizes corresponding to that of
the pores of the host matrix, as revealed with high-resolution scanning transmission electron
microscopy and electron tomography. The Pt nanostructure consisted of hexagonal Pt rods originating
from the straight mesopores (11 nm) of the host structure and linking features resulting from Pt
replication of the interconnecting mesopore segments (2–4 nm) present in the silica host structure.
Electron tomography of partial replicas, made by incomplete infilling of Zeotile-4 material with Pt,
provided insight in the connectivity and formation mechanism of the Pt nanostructure by ALD. The Pt
replica was evaluated for its potential use as electrocatalyst for the hydrogen evolution reaction, one of
the half-reactions of water electrolysis, and as microelectrode for biomedical sensing. The Pt replica
showed high activity for the hydrogen evolution reaction and electrochemical characterization revealed
a large impedance improvement in comparison with reference Pt electrodes.
Keywords: A1 Journal article; Engineering sciences. Technology; Electron microscopy for materials research (EMAT)
Impact Factor: 8.867
Times cited: 9
DOI: 10.1039/C7TA03257A
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“Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition”. Dendooven J, Ramachandran RK, Solano E, Kurttepeli M, Geerts L, Heremans G, Ronge J, Minjauw MM, Dobbelaere T, Devloo-Casier K, Martens JA, Vantomme A, Bals S, Portale G, Coati A, Detavernier C, Nature communications 8, 1074 (2017). http://doi.org/10.1038/S41467-017-01140-Z
Abstract: Synthetic methods that allow for the controlled design of well-defined Pt nanoparticles are highly desirable for fundamental catalysis research. In this work, we propose a strategy that allows precise and independent control of the Pt particle size and coverage. Our approach exploits the versatility of the atomic layer deposition (ALD) technique by combining two ALD processes for Pt using different reactants. The particle areal density is controlled by tailoring the number of ALD cycles using trimethyl(methylcyclopentadienyl) platinum and oxygen, while subsequent growth using the same Pt precursor in combination with nitrogen plasma allows for tuning of the particle size at the atomic level. The excellent control over the particle morphology is clearly demonstrated by means of in situ and ex situ X-ray fluorescence and grazing incidence small angle X-ray scattering experiments, providing information about the Pt loading, average particle dimensions, and mean center-to-center particle distance.
Keywords: A1 Journal article; Engineering sciences. Technology; Electron microscopy for materials research (EMAT)
Impact Factor: 12.124
Times cited: 88
DOI: 10.1038/S41467-017-01140-Z
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“Kinetics of lifetime changes in bimetallic nanocatalysts revealed by quick X-ray absorption spectroscopy”. Filez M, Poelman H, Redekop EA, Galvita VV, Alexopoulos K, Meledina M, Ramachandran RK, Dendooven J, Detavernier C, Van Tendeloo G, Safonova OV, Nachtegaal M, Weckhuysen BM, Marin GB, Angewandte Chemie: international edition in English 57, 12430 (2018). http://doi.org/10.1002/ANIE.201806447
Abstract: Alloyed metal nanocatalysts are of environmental and economic importance in a plethora of chemical technologies. During the catalyst lifetime, supported alloy nanoparticles undergo dynamic changes which are well-recognized but still poorly understood. High-temperature O-2-H-2 redox cycling was applied to mimic the lifetime changes in model Pt13In9 nanocatalysts, while monitoring the induced changes by insitu quick X-ray absorption spectroscopy with one-second resolution. The different reaction steps involved in repeated Pt13In9 segregation-alloying are identified and kinetically characterized at the single-cycle level. Over longer time scales, sintering phenomena are substantiated and the intraparticle structure is revealed throughout the catalyst lifetime. The insitu time-resolved observation of the dynamic habits of alloyed nanoparticles and their kinetic description can impact catalysis and other fields involving (bi)metallic nanoalloys.
Keywords: A1 Journal article; Electron microscopy for materials research (EMAT)
Impact Factor: 11.994
Times cited: 4
DOI: 10.1002/ANIE.201806447
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“Direct Imaging of ALD Deposited Pt Nanoclusters inside the Giant Pores of MIL-101”. Meledina M, Turner S, Filippousi M, Leus K, Lobato I, Ramachandran RK, Dendooven J, Detavernier C, Van Der Voort P, Van Tendeloo G, Particle and particle systems characterization 33, 382 (2016). http://doi.org/10.1002/ppsc.201500252
Abstract: MIL-101 giant-pore metal-organic framework (MOF) materials have been loaded with Pt nanoparticles using atomic layer deposition. The final structure has been investigated by aberration-corrected annular dark-field scanning transmission electron microscopy under strictly controlled low dose conditions. By combining the acquired experimental data with image simulations, the position of the small clusters within the individual pores of a metal-organic framework has been determined. The embedding of the Pt nanoparticles is confirmed by electron tomography, which shows a distinct ordering of the highly uniform Pt nanoparticles. The results show that atomic layer deposition is particularly well-suited for the deposition of individual nanoparticles inside MOF framework pores and that, upon proper regulation of the incident electron dose, annular dark-field scanning transmission electron microscopy is a powerful tool for the characterization of this type of materials at a local scale.
Keywords: A1 Journal article; Engineering sciences. Technology; Electron microscopy for materials research (EMAT)
Impact Factor: 4.474
Times cited: 11
DOI: 10.1002/ppsc.201500252
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“Shuffling atomic layer deposition gas sequences to modulate bimetallic thin films and nanoparticle properties”. Filez M, Feng J-Y, Minjauw MM, Solano E, Poonkottil N, Van Daele M, Ramachandran RK, Li C, Bals S, Poelman H, Detavernier C, Dendooven J, Filez M, Minjauw M, Solano E, Poonkottil N, Li C, Bals S, Dendooven J, Chemistry of materials (2022). http://doi.org/10.1021/acs.chemmater.2c01304
Abstract: Atomic layer deposition (ALD) typically employs metal precursors and co-reactant pulses to deposit thin films in a layer-by-layer fashion. While conventional ABAB-type ALD sequences implement only two functionalities, namely, a metal source and ligand exchange agent, additional functionalities have emerged, including etching and reduction agents. Herein, we construct gas-phase sequences-coined as ALD+-with complex-ities reaching beyond the classic ABAB-type ALD by freely combining multiple functionalities within irregular pulse schemes, e.g., ABCADC. The possibilities of such combinations are explored as a smart strategy to tailor bimetallic thin films and nanoparticle (NP) properties. By doing so, we demonstrate that bimetallic thin films can be tailored with target thickness and through the full compositional range, while the morphology can be flexibly modulated from thin films to NPs by shuI 1ing the pulse sequence. These complex pulse schemes are expected to be broadly applicable but are here explored for Pd-Ru bimetallic thin films and NPs.
Keywords: A1 Journal article; Electron microscopy for materials research (EMAT)
Times cited: 2
DOI: 10.1021/acs.chemmater.2c01304
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“Chemical and Structural Configuration of Pt Doped Metal Oxide Thin Films Prepared by Atomic Layer Deposition”. Ramachandran RK, Filez M, Solano E, Poelman H, Minjauw MM, Van Daele M, Feng J-Y, La Porta A, Altantzis T, Fonda E, Coati A, Garreau Y, Bals S, Marin GB, Detavernier C, Dendooven J, Chemistry of materials 31, 9673 (2019). http://doi.org/10.1021/acs.chemmater.9b03066
Abstract: Pt doped semiconducting metal oxides and Pt metal clusters embedded in an oxide matrix are of interest for applications such as catalysis and gas sensing, energy storage and memory devices. Accurate tuning of the dopant level is crucial for adjusting the properties of these materials. Here, a novel atomic layer deposition (ALD) based method for doping Pt into In2O3 in specific, and metals in metal oxides in general, is demonstrated. This approach combines alternating exposures of Pt and In2O3 ALD processes in a single ‘supercycle’, followed by supercycle repetition leading to multilayered nanocomposites. The atomic level control of ALD and its conformal nature make the method suitable for accurate dopant control even on high surface area supports. Oxidation state, local structural environment and crystalline phase of the embedded Pt dopants were obtained by means of X-ray characterization methods and high angle annular dark-field scanning transmission electron microscopy (HAADF-STEM). In addition, this approach allows characterization of the nucleation stages of metal ALD processes, by stacking those states multiple times in an oxide matrix. Regardless of experimental conditions, a few Pt ALD cycles leads to the formation of oxidized Pt species due to their highly dispersed nature, as proven by X-ray absorption spectroscopy (XAS). Grazing-incidence small-angle X-ray scattering (GISAXS) and highresolution scanning transmission electron microscopy, combined with energy dispersive X-ray spectroscopy (HR-STEM/EDXS) show that Pt is evenly distributed in the In2O3 metal oxide matrix without the formation of clusters. For a larger number of Pt ALD
cycles, typ. > 10, the oxidation state gradually evolves towards fully metallic, and metallic Pt clusters are obtained within the In2O3 metal oxide matrix. This work reveals how tuning of the ALD supercycle approach for Pt doping allows controlled engineering of the Pt compositional and structural configuration within a metal oxide matrix.
Keywords: A1 Journal article; Engineering sciences. Technology; Electron microscopy for materials research (EMAT); Applied Electrochemistry & Catalysis (ELCAT)
Impact Factor: 9.466
Times cited: 6
DOI: 10.1021/acs.chemmater.9b03066
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“Plasma-enhanced atomic layer deposition of silver using Ag(fod)(PEt3) and NH3-plasma”. Minjauw MM, Solano E, Sree SP, Asapu R, Van Daele M, Ramachandran RK, Heremans G, Verbruggen SW, Lenaerts S, Martens JA, Detavernier C, Dendooven J, Chemistry of materials 29, 7114 (2017). http://doi.org/10.1021/ACS.CHEMMATER.7B00690
Abstract: A plasma-enhanced atomic layer deposition (ALD) process using the Ag(fod)(PEt3) precursor [(triethylphosphine)(6,6,7,7,8,8,8-heptafluoro-2,2-dimethy1-3,5-octanedionate)silver(I)] in combination with NH3-plasma is reported. The steady growth rate of the reported process (0.24 +/- 0.03 nm/cycle) was found to be 6 times larger than that of the previously reported Ag ALD process based on the same precursor in combination with H-2-plasma (0.04 +/- 0.02 nm/cycle). The ALD characteristics of the H-2-plasma and NH3-plasma processes were verified. The deposited Ag films were polycrystalline face-centered cubic Ag for both processes. The film morphology was investigated by ex situ scanning electron microscopy and grazing-incidence small-angle X-ray scattering, and it was found that films grown with the NH3-plasma process exhibit a much higher particle areal density and smaller particle sizes on oxide substrates compared to those deposited using the H-2-plasma process. This control over morphology of the deposited Ag is important for applications in catalysis and plasmonics. While films grown with the H-2-plasma process had oxygen impurities (similar to 9 atom %) in the bulk, the main impurity for the NH3-plasma process was nitrogen (similar to 7 atom %). In situ Fourier transform infrared spectroscopy experiments suggest that these nitrogen impurities are derived from NH surface groups generated during the NH3-plasma, which interact with the precursor molecules during the precursor pulse. We propose that the reaction of these surface groups with the precursor leads to additional deposition of Ag atoms during the precursor pulse compared to the H-2-plasma process, which explains the enhanced growth rate of the NH3-plasma process.
Keywords: A1 Journal article; Sustainable Energy, Air and Water Technology (DuEL)
Impact Factor: 9.466
Times cited: 9
DOI: 10.1021/ACS.CHEMMATER.7B00690
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