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Comprehensive three-dimensional modeling network for a dc glow discharge plasma”. Bogaerts A, Gijbels R, Plasma physics reports 24, 573 (1998)
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Quantitative determination of C60 and C70 in soot extracts by high performance liquid chromatography and mass spectrometric characterization”. van Cleempoel A, Gijbels R, Zhu D, Claeys M, Richter H, Fonseca A, Fullerene science and technology 4, 1001 (1996). http://doi.org/10.1080/10641229608001158
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Investigation of 50 Hz pulsed DC nitrogen plasma with active screen cage by trace rare gas optical emission spectroscopy”. Saeed A, Khan AW, Shafiq M, Jan F, Abrar M, Zaka-ul-Islam M, Zakaullah M, Plasma science &, technology 16, 324 (2014). http://doi.org/10.1088/1009-0630/16/4/05
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The mode-deviation effect of trapped spinor bose gas beyond mean field theory”. Xu Y, Jia D-J, Chen Z, Gao Y, Li F-S, International journal of modern physics: B: condensed matter physics, statistical physics, applied physics 18, 1339 (2004). http://doi.org/10.1142/S0217979204024719
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Molecular dynamics simulation of temperature effects on CF(3)(+) etching of Si surface”. Jian-Ping N, Xiao-Dan L, Cheng-Li Z, You-Min Q, Ping-Ni H, Bogaerts A, Fu-Jun G, Wuli xuebao 59, 7225 (2010)
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Numerical simulation on particle density and reaction pathways in methane needle-plane discharge plasma at atmospheric pressure”. Yue-Feng Z, Chao W, Wang W-Z, Li L, Hao S, Tao S, Jie P, Wuli xuebao 67, 085202 (2018). http://doi.org/10.7498/APS.67.20172192
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Trial solution and critical frequency to the singly quantized vortex in big Bose-Einstein condensates”. Xu Y, Jia DJ, Chen ZY, Modern physics letters B 20, 995 (2006). http://doi.org/10.1142/S0217984906011104
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What modeling reveals about the properties of an inductively coupled plasma”. Bogaerts A, Aghaei M, Spectroscopy 31, 52 (2016)
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Analysis of silver halide microcrystals using different modes of a scanning transmission electron microscope and digital image processing”. Geuens I, Gijbels R, Jacob WA, Verbeeck A, de Keyzer R, The journal of imaging science and technology 36, 534 (1992)
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Unveiling the composition of sulphur sensitization specks by their interactions with TAI”. Charlier E, van Doorselaer M, Gijbels R, de Keyzer R, Geuens I, Journal Of Imaging Science And Technology 44, 235 (2000)
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Aerosol synthesis and characterization of ultrafine fullerene particles”. van Cleempoel A, Joutsensaari J, Kauppinen E, Gijbels R, Claeys M, Fullerene science and technology 6, 599 (1998). http://doi.org/10.1080/10641229809350223
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Alternative metals for advanced interconnects”. Adelmann C, Wen LG, Peter AP, Pourtois G, et al, 2014 Ieee International Interconnect Technology Conference / Advanced Metallization Conference (iitc/amc) , 173 (2014)
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Analysis of C60 and C70 oxides by HPLC and low- and high-energy collision-induced dissocation tandem mass spectrometry”. van Cleempoel A, Gijbels R, van den Heuvel H, Claeys M, Proceedings Symposium on Recent Advances in the Chemistry and Physics of Fullerenes and Related Materials, 191th Meeting of the Electrochemical Society, Montreal, Canada, 4-9 May 1997 4, 783 (1997)
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Analysis of nonconducting materials by dc glow discharge spectrometry”. Bogaerts A, Schelles W, van Grieken R Wiley, Chichester, page 293 (2003).
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Yusupov M (2014) Atomic scale simulations for a better insight in plasma medicine. Antwerpen
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Capabilities of TOF-SIMS to study the influence of different oxidation conditions on metal contamination redistribution”. de Witte H, de Gendt S, Douglas M, Conard T, Kenis K, Mertens PW, Vandervorst W, Gijbels R s.n., Leuven, page 147 (1999).
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Characterization of nano-crystalline diamond films grown under continuous DC bias during plasma enhanced chemical vapor deposition”. Mortet V, Zhang L, Echert M, Soltani A, d' Haen J, Douheret O, Moreau M, Osswald S, Neyts E, Troadec D, Wagner P, Bogaerts A, Van Tendeloo G, Haenen K, Materials Research Society symposium proceedings (2009). http://doi.org/10.1557/PROC-1203-J05-03
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Chemical surface characterization of complex AgX microcrystals by imaging TOF-SIMS and dual beam depth profiling”. Verlinden G, Gijbels R, Geuens I, de Keyzer R, , 213 (2000)
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Cluster issue on plasma modelling”. van Dijk J, Kroesen GMW, Bogaerts A London (2009).
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Colloquium Spectroscopicum Internationale 34: a collection of papers presented at the Colloquium Spectroscopicum Internationale, Antwerp, Belgium, 4-9 September 2005”. Janssens K, Bogaerts A, van Grieken R Elsevier, Amsterdam (2006).
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Colloquium Spectroscopicum Internationale 34 (CSI 34), Antwerp, Belgium, 4-9 September 2005”. Bogaerts A, Janssens K, van Grieken R Elsevier, Amsterdam (2006).
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Eckert M (2010) Combined molecular dynamics and Monte Carlo simulations for the deposition of (ultra)nanocrystalline diamond. Antwerpen
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Aghaei M (2014) Computational study of inductively coupled plasma mass spectroscopy (ICP-MS). Antwerpen
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Setareh M (2014) Computational study of CH4 and CF4 conversion in presence of N2 and O2 in plasma discharges applied. Antwerpen
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Computer simulations of laser ablation, plume expansion and plasma formation”. Bogaerts A, Aghaei M, Autrique D, Lindner H, Chen Z, Wendelen W Trans Tech, Aedermannsdorf, page 1 (2011).
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Cryo-analytical electron microscopy: new insight into understanding of crystalline and electronic structure of silver halides”. Oleshko V, Gijbels R, Jacob W Spie, Washington, D.C., page 326 (1998).
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Cryo-electron spectroscopic imaging, electron energy-loss spectroscopy and energy-dispersive X-ray analysis of Ag(Br,I) nano- and microcrystals”. Oleshko V, Gijbels R, Jacob W, van Daele A, Mikrochimica acta: supplementum 15, 87 (1998)
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The dawn of surface analysis that stands by the side users: ultra-thin film analysis by rf-GDOES”. Shimizu K, Habazaki H, Bender H, Gijbels R, Engineering materials 52, 97 (2004)
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Description of the plasma chemistry in an atmospheric pressure CH4 dielectric barrier discharge using a two dimensional fluid model”. De Bie C, Martens T, van Dijk J, van der Mullen JJAM, Bogaerts A, , 13 (2009)
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Design and development of a new program for data processing of mass spectra acquired by means of a high-resolution double-focusing glow-discharge mass spectrometer”. Robben J, Dufour D, Gijbels R, Fresenius' journal of analytical chemistry 370, 663 (2001). http://doi.org/10.1007/s002160100881
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