Number of records found: 747
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Hybrid Monte Carlo: fluid model for studying the effects of nitrogen addition to argon glow discharges”. Bogaerts A, Spectrochimica acta: part B : atomic spectroscopy 64, 126 (2009). http://doi.org/10.1016/j.sab.2008.11.004
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Hybrid Monte-Carlo-fluid modeling network for an argon/hydrogen direct current glow discharge”. Bogaerts A, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 57, 1071 (2002). http://doi.org/10.1016/S0584-8547(02)00047-2
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Laser ablation for analytical sampling: what can we learn from modeling?”.Bogaerts A, Chen Z, Gijbels R, Vertes A, Spectrochimica acta: part B : atomic spectroscopy 58, 1867 (2003). http://doi.org/10.1016/j.sab.2003.08.004
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Modeling of glow discharge optical emission spectrometry: calculation of the argon atomic optical emission spectrum”. Bogaerts A, Gijbels R, Vlcek J, Spectrochimica acta: part B : atomic spectroscopy 53, 1517 (1998). http://doi.org/10.1016/S0584-8547(98)00139-6
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Monte Carlo analysis of the electron thermalization process in the afterglow of a microsecond dc pulsed glow discharge”. Martín A, Bordel N, Pereiro R, Bogaerts A, Spectrochimica acta: part B : atomic spectroscopy 63, 1274 (2008). http://doi.org/10.1016/j.sab.2008.09.012
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Multi-element model for the simulation of inductively coupled plasmas : effects of helium addition to the central gas stream”. Lindner H, Bogaerts A, Spectrochimica acta: part B : atomic spectroscopy 66, 421 (2011). http://doi.org/10.1016/j.sab.2011.04.007
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Multiplicity and contiguity of ablation mechanisms in laser-assisted analytical micro-sampling”. Bleiner D, Bogaerts A, Spectrochimica acta: part B : atomic spectroscopy 61, 421 (2006). http://doi.org/10.1016/j.sab.2006.02.007
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Optimization of operating parameters for inductively coupled plasma mass spectrometry : a computational study”. Aghaei M, Lindner H, Bogaerts A, Spectrochimica acta: part B : atomic spectroscopy 76, 56 (2012). http://doi.org/10.1016/j.sab.2012.06.006
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Three-dimensional density profiles of sputtered atoms and ions in a direct current glow discharge: experimental study and comparison with calculations”. Bogaerts A, Wagner E, Smith BW, Winefordner JD, Pollmann D, Harrison WW, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 52, 205 (1997)
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Three-dimensional density profiles of the argon metastable atoms in a direct current glow discharge: experimental study and comparison with calculations”. Bogaerts A, Guenard RD, Smith BW, Winefordner JD, Harrison WW, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 52, 219 (1997)
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Laser-induced excitation mechanisms and phase transitions in spectrochemical analysis &ndash, Review of the fundamentals”. Vanraes P, Bogaerts A, Spectrochimica Acta Part B-Atomic Spectroscopy 179, 106091 (2021). http://doi.org/10.1016/j.sab.2021.106091
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Parametrization and Molecular Dynamics Simulations of Nitrogen Oxyanions and Oxyacids for Applications in Atmospheric and Biomolecular Sciences”. Cordeiro RM, Yusupov M, Razzokov J, Bogaerts A, Journal Of Physical Chemistry B 124, 1082 (2020). http://doi.org/10.1021/acs.jpcb.9b08172
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A 2D model for a gliding arc discharge”. Kolev S, Bogaerts A, Plasma sources science and technology 24, 015025 (2015). http://doi.org/10.1088/0963-0252/24/1/015025
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Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model”. Bultinck E, Bogaerts A, Plasma sources science and technology 20, 045013 (2011). http://doi.org/10.1088/0963-0252/20/4/045013
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Comprehensive modelling network for dc glow discharges in argon”. Bogaerts A, Plasma sources science and technology 8, 210 (1999). http://doi.org/10.1088/0963-0252/8/2/003
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Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition”. Tinck S, Bogaerts A, Plasma sources science and technology 20, 015008 (2011). http://doi.org/10.1088/0963-0252/20/1/015008
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Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges”. Paulussen S, Verheyde B, Tu X, De Bie C, Martens T, Petrovic D, Bogaerts A, Sels B, Plasma sources science and technology 19, 034015 (2010). http://doi.org/10.1088/0963-0252/19/3/034015
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Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations”. De Bie C, Martens T, van Dijk J, Paulussen S, Verheyde B, Corthals S, Bogaerts A, Plasma sources science and technology 20, 024008 (2011). http://doi.org/10.1088/0963-0252/20/2/024008
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Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis”. Peerenboom K, Parente A, Kozák T, Bogaerts A, Degrez G, Plasma sources science and technology 24, 025004 (2015). http://doi.org/10.1088/0963-0252/24/2/025004
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The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 21, 025008 (2012). http://doi.org/10.1088/0963-0252/21/2/025008
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Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges”. Liu Y-X, Zhang Q-Z, Liu L, Song Y-H, Bogaerts A, Wang Y-N, Plasma sources science and technology 22, 025012 (2013). http://doi.org/10.1088/0963-0252/22/2/025012
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation”. Van Laer K, Tinck S, Samara V, de Marneffe JF, Bogaerts A, Plasma sources science and technology 22, 025011 (2013). http://doi.org/10.1088/0963-0252/22/2/025011
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Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model”. Kozák T, Bogaerts A, Plasma sources science and technology 24, 015024 (2015). http://doi.org/10.1088/0963-0252/24/1/015024
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Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 22, 015017 (2013). http://doi.org/10.1088/0963-0252/22/1/015017
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Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas”. Zhang Q-Z, Liu Y-X, Jiang W, Bogaerts A, Wang Y-N, Plasma sources science and technology 22, 025014 (2013). http://doi.org/10.1088/0963-0252/22/2/025014
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Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux”. Bogaerts A, Okhrimovskyy A, Baguer N, Gijbels R, Plasma sources science and technology 14, 191 (2005). http://doi.org/10.1088/0963-0252/14/1/021
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The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
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Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating”. Tinck S, Boullart W, Bogaerts A, Plasma sources science and technology 20, 045012 (2011). http://doi.org/10.1088/0963-0252/20/4/045012
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Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model”. Georgieva V, Bogaerts A, Plasma sources science and technology 15, 368 (2006). http://doi.org/10.1088/0963-0252/15/3/010
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