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Hydrogenated cation vacancies in semiconducting oxides”. Varley JB, Peelaers H, Janotti A, van de Walle CG, Journal of physics : condensed matter 23, 334212 (2011). http://doi.org/10.1088/0953-8984/23/33/334212
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Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications”. Mao M, Wang YN, Bogaerts A, Journal of physics: D: applied physics 44, 435202 (2011). http://doi.org/10.1088/0022-3727/44/43/435202
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