Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
Kolev, I.; Bogaerts, A. |
Numerical models of the planar magnetron glow discharges |
2004 |
Contributions to plasma physics |
44 |
22 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Comprehensive three-dimensional modeling network for a dc glow discharge plasma |
1998 |
Plasma physics reports |
24 |
8 |
UA library record; WoS full record; WoS citing articles |
Kong, M.; Ferreira, W.P.; Partoens, B.; Peeters, F.M. |
Magnetic field dependence of the normal mode spectrum of a planar complex plasma cluster |
2004 |
IEEE transactions on plasma science |
32 |
4 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A.; Shamiryan, D. |
Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma |
2011 |
Plasma processes and polymers |
8 |
5 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A. |
Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model |
2006 |
Plasma sources science and technology |
15 |
35 |
UA library record; WoS full record; WoS citing articles |
Saeed, A.; Khan, A.W.; Shafiq, M.; Jan, F.; Abrar, M.; Zaka-ul-Islam, M.; Zakaullah, M. |
Investigation of 50 Hz pulsed DC nitrogen plasma with active screen cage by trace rare gas optical emission spectroscopy |
2014 |
Plasma science & technology |
16 |
5 |
UA library record; WoS full record; WoS citing articles |
Gorbanev, Y.; Golda, J.; Gathen, V.S.; Bogaerts, A |
Applications of the COST Plasma Jet: More than a Reference Standard |
2019 |
Plasma |
2 |
|
UA library record |
Belov, I.; Paulussen, S.; Bogaerts, A. |
Analysis and comparison of the co2 and co dielectric barrier discharge solid products |
2016 |
Hakone Xv: International Symposium On High Pressure Low Temperature Plasma Chemistry: With Joint Cost Td1208 Workshop: Non-equilibrium Plasmas With Liquids For Water And Surface Treatment |
|
|
UA library record; WoS full record |
Bogaerts, A.; Snoeckx, R.; Berthelot, A.; Heijkers, S.; Wang, W.; Sun, S.; Van Laer, K.; Ramakers, M.; Michielsen, I.; Uytdenhouwen, Y.; Meynen, V.; Cool, P. |
Plasma based co2 conversion: a combined modeling and experimental study |
2016 |
Hakone Xv: International Symposium On High Pressure Low Temperature Plasma Chemistry: With Joint Cost Td1208 Workshop: Non-equilibrium Plasmas With Liquids For Water And Surface Treatment |
|
|
UA library record; WoS full record |
Bogaerts, A.; Bultinck, E.; Eckert, M.; Georgieva, V.; Mao, M.; Neyts, E.; Schwaederlé, L. |
Computer modeling of plasmas and plasma-surface interactions |
2009 |
Plasma processes and polymers |
6 |
18 |
UA library record; WoS full record; WoS citing articles |
Ranieri, P.; Shrivastav, R.; Wang, M.; Lin, A.; Fridman, G.; Fridman, A.A.; Han, L.-H.; Miller, V. |
Nanosecond-pulsed dielectric barrier dischargeinduced antitumor effects propagate through depth of tissue via intracellular signaling |
2017 |
Plasma medicine |
7 |
|
UA library record |
Vandenbroucke, A.M.; Aerts, R.; Van Gaens, W.; De Geyter, N.; Leys, C.; Morent, R.; Bogaerts, A. |
Modeling and experimental study of trichloroethylene abatement with a negative direct current corona discharge |
2015 |
Plasma chemistry and plasma processing |
35 |
9 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A. |
Comprehensive modelling network for dc glow discharges in argon |
1999 |
Plasma sources science and technology |
8 |
27 |
UA library record; WoS full record; WoS citing articles |
Fridman, A.; Lin, A.; Miller, V.; Bekeschus, S.; Wende, K.; Weltmann, K.-D. |
The plasma treatment unit : an attempt to standardize cold plasma treatment for defined biological effects |
2018 |
Plasma medicine |
8 |
|
UA library record |
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. |
Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux |
2005 |
Plasma sources science and technology |
14 |
9 |
UA library record; WoS full record; WoS citing articles |
Neyts, E.C. |
Plasma-Surface Interactions in Plasma Catalysis |
2016 |
Plasma chemistry and plasma processing |
36 |
66 |
UA library record; WoS full record; WoS citing articles |
Yusupov, M.; Neyts, E.C.; Verlackt, C.C.; Khalilov, U.; van Duin, A.C.T.; Bogaerts, A. |
Inactivation of the endotoxic biomolecule lipid A by oxygen plasma species : a reactive molecular dynamics study |
2015 |
Plasma processes and polymers |
12 |
18 |
UA library record; WoS full record; WoS citing articles |
Yan, M.; Bogaerts, A.; Gijbels, R. |
Evolution of charged particle densities after laser-induced photodetachment in a strongly electronegative RF discharge |
2002 |
IEEE transactions on plasma science |
30 |
|
UA library record; WoS full record |
Teodorescu, V.S.; Mihailescu, I.N.; Dinescu, M.; Chitica, N.; Nistor, L.C.; van Landuyt, J.; Barborica, A. |
Laser induced phase transition in iron thin films |
1994 |
Journal de physique: 3: applied physics, materials science, fluids, plasma and instrumentation |
4 |
2 |
UA library record; WoS full record; WoS citing articles |
Kolev, I.; Bogaerts, A. |
PIC – MCC numerical simulation of a DC planar magnetron |
2006 |
Plasma processes and polymers |
3 |
27 |
UA library record; WoS full record; WoS citing articles |
Laroussi, M.; Bekeschus, S.; Keidar, M.; Bogaerts, A.; Fridman, A.; Lu, X.; Ostrikov, K.; Hori, M.; Stapelmann, K.; Miller, V.; Reuter, S.; Laux, C.; Mesbah, A.; Walsh, J.; Jiang, C.; Thagard, S.M.; Tanaka, H.; Liu, D.; Yan, D.; Yusupov, M. |
Low-Temperature Plasma for Biology, Hygiene, and Medicine: Perspective and Roadmap |
2022 |
IEEE transactions on radiation and plasma medical sciences |
6 |
|
UA library record; WoS full record; WoS citing articles |
Privat-Maldonado, A.; Gorbanev, Y.; O'Connell, D.; Vann, R.; Chechik, V.; van der Woude, M.W. |
Nontarget biomolecules alter macromolecular changes induced by bactericidal low-temperature plasma |
2018 |
IEEE transactions on radiation and plasma medical sciences |
2 |
|
UA library record; WoS full record; WoS citing articles |
Truong, B.; Siegert, K.; Lin, A.; Miller, V.; Krebs, F.C. |
Apical application of nanosecond-pulsed dielectric barrier discharge plasma causes the basolateral release of adenosine triphosphate as a damage-associated molecular pattern from polarized HaCaT cells |
2017 |
Plasma medicine |
7 |
|
UA library record |
Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Kolev, I.; Madani, M.; Neyts, E. |
Computer simulations for processing plasmas |
2006 |
Plasma processes and polymers |
3 |
8 |
UA library record; WoS full record; WoS citing articles |
Lin, A.; Truong, B.; Fridman, G.; Friedman, A.A.; Miller, V. |
Immune cells enhance selectivity of nanosecond-pulsed DBD plasma against tumor cells |
2017 |
Plasma medicine |
7 |
|
UA library record |
Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. |
Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation |
2014 |
Plasma processes and polymers |
11 |
1 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; van de Sanden, R. |
Special Issue of Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5–10 July 2015, Antwerp, Belgium: Introduction |
2016 |
Plasma chemistry and plasma processing |
36 |
|
UA library record; WoS full record |