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  Author Title Year Publication Volume Times cited Additional Links Links
Schattschneider, P.; Ennen, I.; Stoger-Pollach, M.; Verbeeck, J. Circular dichroism in the electron microscope: progress and applications (invited) 2010 Journal of applied physics 107 28 UA library record; WoS full record; WoS citing articles pdf doi
Resta, V.; Siegel, J.; Bonse, J.; Gonzalo, J.; Afonso, C.N.; Piscopiello, E.; Van Tenedeloo, G.; Sharpening the shape distribution of gold nanoparticles by laser irradiation 2006 Journal of applied physics 100 36 UA library record; WoS full record; WoS citing articles pdf doi
Shapoval, O.; Huehn, S.; Verbeeck, J.; Jungbauer, M.; Belenchuk, A.; Moshnyaga, V. Interface-controlled magnetism and transport of ultrathin manganite films 2013 Journal of applied physics 113 7 UA library record; WoS full record; WoS citing articles pdf doi
Baguer, N.; Bogaerts, A.; Gijbels, R. Study of a hollow cathode glow discharge in He: Monte Carlo-fluid model combined with a transport model for the metastable atoms 2003 Journal of applied physics 93 24 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R.; Vlcek, J. Collisional-radiative model for an argon glow discharge 1998 Journal of applied physics 84 138 UA library record; WoS full record; WoS citing articles doi
Teodorescu, V.; Nistor, L.; Bender, H.; Steegen, A.; Lauwers, A.; Maex, K.; van Landuyt, J. In situ transmission electron microscopy study of Ni silicide phases formed on (001) Si active lines 2001 Journal of applied physics 90 97 UA library record; WoS full record; WoS citing articles pdf doi
Herrebout, D.; Bogaerts, A.; Yan, M.; Goedheer, W.; Dekempeneer, E.; Gijbels, R. 1D fluid model for an rf methane plasma of interest in deposition of diamond-like carbon layers 2001 Journal of applied physics 90 83 UA library record; WoS full record; WoS citing articles doi
Chu, D.P.; Peeters, F.M.; Kolodinski, S.; Roca, E. Theoretical investigation of CoSi2/Si1-xGex detectors: influence of a Si tunneling barrier on the electro-optical characteristics 1996 Journal of applied physics 79 3 UA library record; WoS full record; WoS citing articles
Croitoru, M.D.; Gladilin, V.N.; Fomin, V.M.; Devreese, J.T.; Magnus, W.; Schoenmaker, W.; Sorée, B. Quantum transport in a nanosize silicon-on-insulator metal-oxide-semiconductor field effect transistor 2003 Journal of applied physics 93 16 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model 1996 Journal of applied physics 79 81 UA library record; WoS full record; WoS citing articles doi
Das, A.; Gordon, I.; Wagner, P.; Cannaerts, M.; Moshchalkov, V.V.; Bruynseraede, Y.; Schuddinck, W.; Van Tendeloo, G.; Borghs, G. Influence of the morphology on the magneto-transport properties of laser-ablated ultrathin La0.7Ba0.3MnO3 films 2001 Journal of applied physics 90 2 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, M.-L.; March, N.H.; Peeters, A.; van Alsenoy, C.; Howard, I.; Lamoen, D.; Leys, F. Loss rate of a plasticizer in a nylon matrix calculated using macroscopic reaction-diffusion kinetics 2003 Journal Of Applied Physics 93 UA library record; WoS full record; doi
Bogaerts, A.; van Straaten, M.; Gijbels, R. Description of the thermalization process of the sputtered atoms in a glow discharge using a 3-dimensional Monte Carlo method 1995 Journal of applied physics 77 87 UA library record; WoS full record; WoS citing articles doi
Cornelissens, Y.G.; Peeters, F.M. Response function of a Hall magnetosensor in the diffusive regime 2002 Journal of applied physics 92 24 UA library record; WoS full record; WoS citing articles doi
Buschmann, V.; Rodewald, M.; Fuess, H.; Van Tendeloo, G.; Schäffer, C. High resolution electron microscopy study of molecular beam epitaxy grown CoSi2/Si1-xGex/Si(100) heterostructurs 1999 Journal of applied physics 85 6 UA library record; WoS full record; WoS citing articles doi
Milants, K.; Verheyden, J.; Barancira, T.; Deweerd, W.; Pattyn, H.; Bukshpan, S.; Williamson, D.L.; Vermeiren, F.; Van Tendeloo, G.; Vlekken, C.; Libbrecht, S.; van Haesendonck, C. Size distribution and magnetic behavior of lead inclusions in silicon single crystals 1997 Journal of applied physics 81 8 UA library record; WoS full record; WoS citing articles
Baguer, N.; Bogaerts, A.; Gijbels, R. Role of the fast Ar atoms, Ar+ ions and metastable Ar atoms in a hollow cathode glow discharge: study by a hybrid model 2003 Journal of applied physics 94 19 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R.; Goedheer, W. Hybrid Monte Carlo-fluid model of a direct current glow discharge 1995 Journal of applied physics 78 117 UA library record; WoS full record; WoS citing articles doi
Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model 2002 Journal of applied physics 92 15 UA library record; WoS full record; WoS citing articles doi
Croitoru, M.D.; Gladilin, V.N.; Fomin, V.M.; Devreese, J.T.; Magnus, W.; Schoenmaker, W.; Sorée, B. Quantum transport in a nanosize double-gate metal-oxide-semiconductor field-effect transistor 2004 Journal of applied physics 96 14 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Bogaerts, A.; Gijbels, R. Particle-in-cell/Monte Carlo simulation of a capacitively coupled radio frequency Ar/Cf4 discharge: effect of gas composition 2003 Journal of applied physics 93 57 UA library record; WoS full record; WoS citing articles doi
Gryse, O.D.; Clauws, P.; van Landuyt, J.; Lebedev, O.; Claeys, C.; Simoen, E.; Vanhellemont, J. Oxide phase determination in silicon using infrared spectroscopy and transmission electron microscopy techniques 2002 Journal of applied physics 91 27 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge 1999 Journal of applied physics 86 18 UA library record; WoS full record; WoS citing articles doi
de Witte, H.; Vandervorst, W.; Gijbels, R. Modeling of bombardment induced oxidation of silicon 2001 Journal of applied physics 89 16 UA library record; WoS full record; WoS citing articles doi
Okhrimovskyy, A.; Bogaerts, A.; Gijbels, R. Incorporating the gas flow in a numerical model of rf discharges in methane 2004 Journal of applied physics 96 11 UA library record; WoS full record; WoS citing articles doi
Bernaerts, D.; Van Tendeloo, G.; Amelinckx, S.; Hevesi, K.; Gensterblum, G.; Yu, L.M.; Pireaux, J.J.; Grey, F.; Bohr, J. Structural defects and epitaxial rotation of C60 and C70 (111) films on GeS(001) 1996 Journal of applied physics 80 6 UA library record; WoS full record; WoS citing articles pdf doi
Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4 2000 Journal of applied physics 87 14 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Bogaerts, A.; Gijbels, R. Numerical study of Ar/CF4/N2 discharges in single and dual frequency capacitively coupled plasma reactors 2003 Journal of applied physics 94 90 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description 1999 Journal of applied physics 86 50 UA library record; WoS full record; WoS citing articles doi
Ignatova, V.A.; Lebedev, O.I.; Watjen, U.; van Vaeck, L.; van Landuyt, J.; Gijbels, R.; Adams, F. Metal and composite nanocluster precipitate formation in silicon dioxide implanted with Sb+ ions 2002 Journal of applied physics 92 5 UA library record; WoS full record; WoS citing articles pdf doi
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