Number of records found: 52
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Citations
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The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 21, 025008 (2012). http://doi.org/10.1088/0963-0252/21/2/025008
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Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating”. Tinck S, Boullart W, Bogaerts A, Plasma sources science and technology 20, 045012 (2011). http://doi.org/10.1088/0963-0252/20/4/045012
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Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model”. Bultinck E, Bogaerts A, Plasma sources science and technology 20, 045013 (2011). http://doi.org/10.1088/0963-0252/20/4/045013
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Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations”. De Bie C, Martens T, van Dijk J, Paulussen S, Verheyde B, Corthals S, Bogaerts A, Plasma sources science and technology 20, 024008 (2011). http://doi.org/10.1088/0963-0252/20/2/024008
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Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition”. Tinck S, Bogaerts A, Plasma sources science and technology 20, 015008 (2011). http://doi.org/10.1088/0963-0252/20/1/015008
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Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges”. Paulussen S, Verheyde B, Tu X, De Bie C, Martens T, Petrovic D, Bogaerts A, Sels B, Plasma sources science and technology 19, 034015 (2010). http://doi.org/10.1088/0963-0252/19/3/034015
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Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model”. Georgieva V, Bogaerts A, Plasma sources science and technology 15, 368 (2006). http://doi.org/10.1088/0963-0252/15/3/010
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Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux”. Bogaerts A, Okhrimovskyy A, Baguer N, Gijbels R, Plasma sources science and technology 14, 191 (2005). http://doi.org/10.1088/0963-0252/14/1/021
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The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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Comprehensive modelling network for dc glow discharges in argon”. Bogaerts A, Plasma sources science and technology 8, 210 (1999). http://doi.org/10.1088/0963-0252/8/2/003
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Investigation of O atom kinetics in O2plasma and its afterglow”. Albrechts M, Tsonev I, Bogaerts A, Plasma Sources Science and Technology 33, 045017 (2024). http://doi.org/10.1088/1361-6595/ad3f4a
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Low-pressure inductively coupled plasmas in hydrogen : impact of gas heating on the spatial distribution of atomic hydrogen and vibrationally excited states”. Smith GJ, Diomede P, Gibson AR, Doyle SJ, Guerra V, Kushner MJ, Gans T, Dedrick JP, Plasma sources science and technology 33, 025002 (2024). http://doi.org/10.1088/1361-6595/AD1ECE
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Coupling the COST reference plasma jet to a microfluidic device: a computational study”. Bissonnette-Dulude J, Heirman P, Coulombe S, Bogaerts A, Gervais T, Reuter S, Plasma sources science and technology 33, 015001 (2024). http://doi.org/10.1088/1361-6595/ad1421
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Assessing neutral transport mechanisms in aspect ratio dependent etching by means of experiments and multiscale plasma modeling”. Vanraes P, Parayil Venugopalan S, Besemer M, Bogaerts A, Plasma Sources Science and Technology 32, 064004 (2023). http://doi.org/10.1088/1361-6595/acdc4f
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Power concentration determined by thermodynamic properties in complex gas mixtures : the case of plasma-based dry reforming of methane”. Biondo O, Hughes A, van der Steeg A, Maerivoet S, Loenders B, van Rooij G, Bogaerts A, Plasma sources science and technology 32, 045001 (2023). http://doi.org/10.1088/1361-6595/ACC6EC
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Disruption of self-organized striated structure induced by secondary electron emission in capacitive oxygen discharges”. Wang L, Wen D-Q, Zhang Q-Z, Song Y-H, Zhang Y-R, Wang Y-N, Plasma sources science and technology 28, 055007 (2019). http://doi.org/10.1088/1361-6595/AB17AE
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Importance of surface charging during plasma streamer propagation in catalyst pores”. Zhang Q-Z, Wang W-Z, Bogaerts A, Plasma sources science and technology 27, 065009 (2018). http://doi.org/10.1088/1361-6595/aaca6d
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Enhancement of plasma generation in catalyst pores with different shapes”. Zhang Y-R, Neyts EC, Bogaerts A, Plasma sources science and technology 27, 055008 (2018). http://doi.org/10.1088/1361-6595/aac0e4
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Propagation of a plasma streamer in catalyst pores”. Zhang Q-Z, Bogaerts A, Plasma sources science and technology 27, 035009 (2018). http://doi.org/10.1088/1361-6595/aab47a
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Foundations of modelling of nonequilibrium low-temperature plasmas”. Alves LL, Bogaerts A, Guerra V, Turner MM, Plasma sources science and technology 27, 023002 (2018). http://doi.org/10.1088/1361-6595/aaa86d
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Effect of plasma-induced surface charging on catalytic processes: application to CO2activation”. Bal KM, Huygh S, Bogaerts A, Neyts EC, Plasma sources science and technology 27, 024001 (2018). http://doi.org/10.1088/1361-6595/aaa868
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Revealing the arc dynamics in a gliding arc plasmatron: a better insight to improve CO2conversion”. Ramakers M, Medrano JA, Trenchev G, Gallucci F, Bogaerts A, Plasma sources science and technology 26, 125002 (2017). http://doi.org/10.1088/1361-6595/aa9531
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Modeling of CO2plasma: effect of uncertainties in the plasma chemistry”. Berthelot A, Bogaerts A, Plasma sources science and technology 26, 115002 (2017). http://doi.org/10.1088/1361-6595/aa8ffb
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How bead size and dielectric constant affect the plasma behaviour in a packed bed plasma reactor: a modelling study”. Van Laer K, Bogaerts A, Plasma sources science and technology 26, 085007 (2017). http://doi.org/10.1088/1361-6595/aa7c59
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Plasma–liquid interactions: a review and roadmap”. Bruggeman PJ, Kushner MJ, Locke BR, Gardeniers JGE, Graham WG, Graves DB, Hofman-Caris RCHM, Maric D, Reid JP, Ceriani E, Fernandez Rivas D, Foster JE, Garrick SC, Gorbanev Y, Hamaguchi S, Iza F, Jablonowski H, Klimova E, Kolb J, Krcma F, Lukes P, Machala Z, Marinov I, Mariotti D, Mededovic Thagard S, Minakata D, Neyts EC, Pawlat J, Petrovic ZL, Pflieger R, Reuter S, Schram DC, Schröter S, Shiraiwa M, Tarabová, B, Tsai PA, Verlet JRR, von Woedtke T, Wilson KR, Yasui K, Zvereva G, Plasma sources science and technology 25, 053002 (2016). http://doi.org/10.1088/0963-0252/25/5/053002
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CO2conversion by plasma technology: insights from modeling the plasma chemistry and plasma reactor design”. Bogaerts A, Berthelot A, Heijkers S, Kolev S, Snoeckx R, Sun S, Trenchev G, Van Laer K, Wang W, Plasma sources science and technology 26, 063001 (2017). http://doi.org/10.1088/1361-6595/aa6ada
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Formation of microdischarges inside a mesoporous catalyst in dielectric barrier discharge plasmas”. Zhang Y, Wang H-yu, Zhang Y-ru, Bogaerts A, Plasma sources science and technology 26, 054002 (2017). http://doi.org/10.1088/1361-6595/aa66be
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QDB: a new database of plasma chemistries and reactions”. Tennyson J, Rahimi S, Hill C, Tse L, Vibhakar A, Akello-Egwel D, Brown DB, Dzarasova A, Hamilton JR, Jaksch D, Mohr S, Wren-Little K, Bruckmeier J, Agarwal A, Bartschat K, Bogaerts A, Booth J-P, Goeckner MJ, Hassouni K, Itikawa Y, Braams BJ, Krishnakumar E, Laricchiuta A, Mason NJ, Pandey S, Petrovic ZL, Pu Y-K, Ranjan A, Rauf S, Schulze J, Turner MM, Ventzek P, Whitehead JC, Yoon J-S, Plasma sources science and technology 26, 055014 (2017). http://doi.org/10.1088/1361-6595/aa6669
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Investigations of discharge and post-discharge in a gliding arc: a 3D computational study”. Sun SR, Kolev S, Wang HX, Bogaerts A, Plasma sources science and technology 26, 055017 (2017). http://doi.org/10.1088/1361-6595/aa670a
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